公开(公告)号：US20100002176A1

公开(公告)日：2010-01-07

申请号：US12375894

申请日：2007-07-17

申请人： Yoshikazu Kondo ,  Yoshiro Toda ,  Wataru Mizuno

发明人： Yoshikazu Kondo ,  Yoshiro Toda ,  Wataru Mizuno

IPC分类号： G02F1/1333 ,  G02F1/13

CPC分类号： G02F1/134363 ,  G02F2202/22

摘要： Provided are a method of manufacturing liquid crystal display device possessing transparent conductive layer exhibiting excellent optical transparency, resistance characteristic, evenness, adhesion to substrate, and hardness, and liquid crystal display device thereof. The liquid crystal display device possessing liquid crystal display panel and backlight unit, wherein liquid crystal display panel has a structure in which display electrode and reference electrode are provided on surface of region corresponding to unit pixel on liquid crystal layer side of one transparent substrate or each of both transparent substrates provided facing to each other via liquid crystal layer, and light transmitting liquid crystal layer is modulated by electric field generated parallel to transparent substrate between reference electrode and display electrode, wherein the method of manufacturing liquid crystal display device possesses the step of forming transparent conductive layer in pixel region by atmospheric pressure plasma method employing nitrogen gas as thin film forming gas.

摘要翻译： 本发明提供一种液晶显示装置的制造方法，该液晶显示装置具有优异的透光性，电阻特性，均匀性，与基板的粘附性和硬度的透明导电层及其液晶显示装置。 具有液晶显示面板和背光单元的液晶显示装置，其中液晶显示面板具有将显示电极和参考电极设置在与一个透明基板或每个透明基板的液晶层侧的单位像素对应的区域的表面上的结构 通过液晶层彼此面对的两个透明基板，透光性液晶层通过与参照电极和显示电极之间的透明基板平行地产生的电场来调制，其中液晶显示装置的制造方法具有以下步骤： 通过使用氮气作为薄膜形成气体的大气压等离子体法在像素区域中形成透明导电层。

公开(公告)号：US08045109B2

公开(公告)日：2011-10-25

申请号：US12375894

申请日：2007-07-17

申请人： Yoshikazu Kondo ,  Yoshiro Toda ,  Wataru Mizuno

发明人： Yoshikazu Kondo ,  Yoshiro Toda ,  Wataru Mizuno

IPC分类号： G02F1/1333 ,  G02F1/1343

CPC分类号： G02F1/134363 ,  G02F2202/22

摘要： Provided are a method of manufacturing liquid crystal display device possessing transparent conductive layer exhibiting excellent optical transparency, resistance characteristic, evenness, adhesion to substrate, and hardness, and liquid crystal display device thereof. The liquid crystal display device possessing liquid crystal display panel and backlight unit, wherein liquid crystal display panel has a structure in which display electrode and reference electrode are provided on surface of region corresponding to unit pixel on liquid crystal layer side of one transparent substrate or each of both transparent substrates provided facing to each other via liquid crystal layer, and light transmitting liquid crystal layer is modulated by electric field generated parallel to transparent substrate between reference electrode and display electrode, wherein the method of manufacturing liquid crystal display device possesses the step of forming transparent conductive layer in pixel region by atmospheric pressure plasma method employing nitrogen gas as thin film forming gas.

摘要翻译： 本发明提供一种液晶显示装置的制造方法，该液晶显示装置具有优异的透光性，电阻特性，均匀性，与基板的粘附性和硬度的透明导电层及其液晶显示装置。 具有液晶显示面板和背光单元的液晶显示装置，其中液晶显示面板具有将显示电极和参考电极设置在与一个透明基板或每个透明基板的液晶层侧的单位像素对应的区域的表面上的结构 通过液晶层彼此面对的两个透明基板，透光性液晶层通过与参照电极和显示电极之间的透明基板平行地产生的电场来调制，其中液晶显示装置的制造方法具有以下步骤： 通过使用氮气作为薄膜形成气体的大气压等离子体法在像素区域中形成透明导电层。

公开(公告)号：US07632550B2

公开(公告)日：2009-12-15

申请号：US10364551

申请日：2003-02-11

申请人： Wataru Mizuno ,  Kazuhiro Fukuda ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi ,  Akira Nishiwaki

发明人： Wataru Mizuno ,  Kazuhiro Fukuda ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi ,  Akira Nishiwaki

IPC分类号： C23C16/06 ,  H05H1/24

CPC分类号： C23C16/5096 ,  C23C16/18 ,  C23C16/545

摘要： A film forming method comprising: supplying a reactive gas comprising a compound including a metal atom between facing electrodes; arranging a substrate between the electrodes; making the reactive gas in a plasma state by applying a voltage between the electrodes under atmospheric pressure or under a pressure in a vicinity of the atmospheric pressure and discharging; and forming a metal film on a surface of the substrate by supplying a reducing gas having a reducing property into a plasma atmosphere in which the reactive gas in the plasma state exists.

摘要翻译： 一种成膜方法，包括：在相对电极之间提供包含金属原子的化合物的反应气体; 在电极之间布置基板; 通过在大气压下或在大气压附近的压力下在电极之间施加电压并进行放电，使反应气体处于等离子体状态; 以及通过向具有等离子体状态的反应性气体的等离子体气氛中供给具有还原性的还原气体而在基板的表面上形成金属膜。

公开(公告)号：US06849306B2

公开(公告)日：2005-02-01

申请号：US10222318

申请日：2002-08-16

申请人： Kazuhiro Fukuda ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi ,  Akira Nishiwaki ,  Wataru Mizuno ,  Koji Fukazawa

发明人： Kazuhiro Fukuda ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi ,  Akira Nishiwaki ,  Wataru Mizuno ,  Koji Fukazawa

IPC分类号： H01J37/32 ,  H05H1/24

CPC分类号： H01J37/32009 ,  H01J37/32825

摘要： A plasma treatment method for surface treatment of a substrate with an atmospheric pressure plasma treatment apparatus is disclosed. The apparatus has a first electrode and a second electrode opposed to each other, a discharge space between the opposed electrodes, a voltage application means for applying voltage across the discharge space, a gas supply means for supplying a reactive gas and an inert gas to the discharge space. The method is one wherein the reactive gas at the discharge space is excited at atmospheric pressure or at approximately atmospheric pressure by applying voltage through the voltage application means to generate discharge plasma, and a substrate is exposed to the discharge plasma to be subjected to surface treatment, and wherein the reactive gas is not directly in contact with the discharge surface of the first electrode or the second electrode.

摘要翻译： 公开了一种用大气压等离子体处理装置对衬底进行表面处理的等离子体处理方法。 该装置具有彼此相对的第一电极和第二电极，相对电极之间的放电空间，用于在放电空间上施加电压的电压施加装置，用于向该放电空间供应反应性气体和惰性气体的气体供给装置 放电空间。 该方法是其中放电空间处的反应气体在大气压或大气压下通过施加电压通过电压施加装置激发以产生放电等离子体，并且将衬底暴露于放电等离子体进行表面处理 ，并且其中所述反应性气体不直接与所述第一电极或所述第二电极的放电表面接触。

公开(公告)号：US07166335B2

公开(公告)日：2007-01-23

申请号：US10841115

申请日：2004-05-07

申请人： Kazuhiro Fukuda ,  Yasuo Morohoshi ,  Akira Nishiwaki ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi

发明人： Kazuhiro Fukuda ,  Yasuo Morohoshi ,  Akira Nishiwaki ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi

IPC分类号： C23C16/50

CPC分类号： C23C16/545 ,  C23C16/453 ,  C23C16/505 ,  H05H1/46 ,  H05H2001/466 ,  H05H2001/485 ,  H05H2240/10

摘要： A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency ω2 of the second high frequency electric field is higher than frequency ω1 of the first high frequency electric field, strength V1 of the first high frequency electric field, strength V2 of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V1≧IV>V2 or V1>IV≧V2, and power density of the second high frequency electric field is not less than 1 W/cm2.

摘要翻译： 公开了一种层形成方法，其包括向放电空间供应气体，通过在放电空间上施加高频电场，将基底暴露于激发气体，在大气压或大气压下激发供应的气体，其中， 高频电场是第一高频电场和第二高频电场叠加的电场，第二高频电场的频率ω2 <2>高于频率ω _{1，第二高频电场的强度V SUB> 1，第二高频电场的强度V SUB> 2 < 放电起始电场的强度IV满足关系V 1 = IV> V 2或V 1 IV> = V 2 第二高频电场的功率密度不小于1W / cm 2。}

公开(公告)号：US06759100B2

公开(公告)日：2004-07-06

申请号：US10378695

申请日：2003-03-04

申请人： Kazuhiro Fukuda ,  Yasuo Morohoshi ,  Akira Nishiwaki ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi

发明人： Kazuhiro Fukuda ,  Yasuo Morohoshi ,  Akira Nishiwaki ,  Yoshikazu Kondo ,  Yoshiro Toda ,  Kiyoshi Oishi

IPC分类号： C23C1650

CPC分类号： C23C16/545 ,  C23C16/453 ,  C23C16/505 ,  H05H1/46 ,  H05H2001/466 ,  H05H2001/485 ,  H05H2240/10

摘要： A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency &ohgr;2 of the second high frequency electric field is higher than frequency &ohgr;1 of the first high frequency electric field, strength V1 of the first high frequency electric field, strength V2 of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V1≧IV>V2 or V1>IV≧V2, and power density of the second high frequency electric field is not less than 1 W/cm2.

摘要翻译： 公开了一种层形成方法，其包括向放电空间供应气体，通过在放电空间上施加高频电场，将基底暴露于激发气体，在大气压或大气压下激发供应的气体，其中， 高频电场是第一高频电场和第二高频电场叠加的电场，第二高频电场的频率ω2高于第一高频电场的频率ω1，强度V1 在第一高频电场中，第二高频电场的强度V2和放电起始电场的强度IV满足关系V1> = IV> V2或V1> IV> = V2，第二高频电场的功率密度 场不小于1W / cm 2。

公开(公告)号：US07647887B2

公开(公告)日：2010-01-19

申请号：US10807774

申请日：2004-03-23

申请人： Kikuo Maeda ,  Yoshiro Toda ,  Koji Fukazawa

发明人： Kikuo Maeda ,  Yoshiro Toda ,  Koji Fukazawa

IPC分类号： C23C16/00

CPC分类号： H01J37/32009 ,  C23C16/4401 ,  C23C16/509 ,  C23C16/545 ,  H01J37/32532 ,  H01J37/3277

摘要： A thin film forming apparatus includes: a first electrode having a first discharge surface and a second electrode having a second discharge surface, the first discharge surface facing opposite to the second discharge surface to form a discharge space; a gas supply unit for supplying a gas including a thin film formation gas to the discharge space; a power source for discharging and activating the gas by applying a high frequency electric field across the discharge space; and a film transporting mechanism for transporting a protecting film for preventing at least one of the first electrode and the second electrode from being exposed to the activated gas, wherein a thin film is formed by exposing a substrate to the activated gas and, the protecting film is transported in contact with at least one of the first discharge surface and the second discharge surface and with at least a part of a surface other than the discharge surface which continues to the discharge surface.

摘要翻译： 薄膜形成装置包括：具有第一放电表面的第一电极和具有第二放电表面的第二电极，所述第一放电表面面向第二放电表面相对以形成放电空间; 用于将包括薄膜形成气体的气体供给到所述放电空间的气体供给单元; 用于通过在放电空间上施加高频电场来放电和激活气体的电源; 以及用于输送用于防止第一电极和第二电极中的至少一个暴露于活性气体的保护膜的膜输送机构，其中通过将基板暴露于活性气体而形成薄膜，并且保护膜 与第一排放表面和第二排出表面中的至少一个接触并且与除了排放表面之外的至少一部分表面继续输送到排放表面。

公开(公告)号：US5145706A

公开(公告)日：1992-09-08

申请号：US676303

申请日：1991-03-28

申请人： Takashi Hagi ,  Kouichi Misawa ,  Shuji Saito ,  Yuji Sakamoto ,  Noriaki Kadota ,  Yoshiro Toda ,  Nagataka Yamazaki

发明人： Takashi Hagi ,  Kouichi Misawa ,  Shuji Saito ,  Yuji Sakamoto ,  Noriaki Kadota ,  Yoshiro Toda ,  Nagataka Yamazaki

IPC分类号： A23J1/06 ,  A23J3/12 ,  A23L5/20 ,  A23L13/40

CPC分类号： A23J3/12 ,  A23J1/06 ,  A23L13/424 ,  A23L5/273

摘要： The present invention relates to a method for preparation of plasma powder characterized by catalytic treatment of plasma with colloidal silica and subsequent powdering of the plasma. The plasma powder thus obtained by the present invention is substantially free of malodorous substances.

摘要翻译： 本发明涉及一种用于制备等离子体粉末的方法，其特征在于用胶体二氧化硅催化处理等离子体并随后粉化等离子体。 由本发明得到的等离子体粉末基本上不含恶臭物质。

公开(公告)号：US06652069B2

公开(公告)日：2003-11-25

申请号：US10000888

申请日：2001-11-15

申请人： Yoshiro Toda ,  Kazuhiro Fukuda ,  Akira Nishiwaki

发明人： Yoshiro Toda ,  Kazuhiro Fukuda ,  Akira Nishiwaki

IPC分类号： B41J2135

CPC分类号： B41J2/1606 ,  B05D1/60 ,  B05D3/142 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1632 ,  B41J2/1642 ,  C23C16/513

摘要： In a surface treatment for treating a surface of a subject of treating by a discharge-activated gas, under an atmospheric pressure or a pressure in the neighborhood of it, by arranging a second electrode at a position separated from the discharging section for generating said discharge-activated gas by a first electrode coated with a dielectric substance, and arranging a surface to be treated of a subject of treating between said plasma generating part, serving as a discharging section, and said second electrode, a surface treatment of said subject of treating is practiced.