Optical communication equipment and system
    1.
    发明授权
    Optical communication equipment and system 失效
    光通信设备及系统

    公开(公告)号:US06529304B1

    公开(公告)日:2003-03-04

    申请号:US09381199

    申请日:1999-09-17

    IPC分类号: H04B1000

    摘要: Configurations of a light signal communication apparatus and an optical communication system suitable for speeding-up of the transmission of information based on a light signal and an increase in the capacity for the information transmission are disclosed. On the light signal transmitting side, excitation light is supplied to an active medium in accordance with a transmission signal to cause induced emission within the active medium, thereby generating signal light. The excitation light causes spontaneously-emitted light to fall on a semiconductor layer, and a voltage pulse corresponding to transmission information is applied to modulate the refractive index of the semiconductor layer, thereby Bragg-reflecting a specific wavelength component, after which it is sent to the active medium as the excitation light. The Bragg reflection and induced emission incident to it exhibit excellent response to a voltage signal having a pulse width of 1×10−9 seconds or less. It is therefore possible to implement an optical communication system having a transmission rate up to 100 Gb/s with one light signal.

    摘要翻译: 公开了一种适于基于光信号加速信息传输和信息传输容量增加的光信号通信装置和光通信系统的配置。 在光信号发送侧,根据发送信号将激励光提供给有源介质,以在有源介质内产生感应发射,从而产生信号光。 激发光引起自发发射的光落在半导体层上,施加与透射信息相对应的电压脉冲,以调制半导体层的折射率,由此布拉格反射特定波长分量,之后将其发送到 活性介质作为激发光。 入射到其的布拉格反射和感应发射对脉冲宽度为1×10-9秒或更小的电压信号表现出优异的响应。 因此,可以通过一个光信号实现具有高达100Gb / s的传输速率的光通信系统。

    Semiconductor device and semiconductor substrate
    2.
    发明授权
    Semiconductor device and semiconductor substrate 失效
    半导体器件和半导体衬底

    公开(公告)号:US07579229B2

    公开(公告)日:2009-08-25

    申请号:US12010123

    申请日:2008-01-22

    IPC分类号: H01L21/762

    摘要: In order to provide a semiconductor device having a field effect transistor with a low power consumption and a high speed by use of the combination of Si and an element such as Ge, C or the like of the same group as Si, a strain is applied by a strain applying semiconductor layer 2 to a channel forming layer I having a channel of the field effect transistor formed therein so that the mobility of carriers in the channel is made larger than the mobility of carriers in that material of the channel forming layer which is unstrained.

    摘要翻译: 为了提供一种具有低功耗和高速的场效晶体管的半导体器件,其通过使用Si和诸如与Si相同的组的诸如Ge,C等元素的组合,施加应变 通过将半导体层2施加到其中形成有场效应晶体管的沟道的沟道形成层I的应变,使得沟道中的载流子的迁移率大于沟道形成层的材料中的载流子的迁移率, 无限制

    Semiconductor device and semiconductor substrate
    4.
    发明申请
    Semiconductor device and semiconductor substrate 失效
    半导体器件和半导体衬底

    公开(公告)号:US20080206961A1

    公开(公告)日:2008-08-28

    申请号:US12010123

    申请日:2008-01-22

    IPC分类号: H01L21/20

    摘要: In order to provide a semiconductor device having a field effect transistor with a low power consumption and a high speed by use of the combination of Si and an element such as Ge, C or the like of the same group as Si, a strain is applied by a strain applying semiconductor layer 2 to a channel forming layer I having a channel of the field effect transistor formed therein so that the mobility of carriers in the channel is made larger than the mobility of carriers in that material of the channel forming layer which is unstrained.

    摘要翻译: 为了提供一种具有低功耗和高速的场效晶体管的半导体器件,其通过使用Si和诸如与Si相同的组的诸如Ge,C等元素的组合,施加应变 通过将半导体层2施加到其中形成有场效应晶体管的沟道的沟道形成层I的应变,使得沟道中的载流子的迁移率大于沟道形成层的材料中的载流子的迁移率, 无限制