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    Compositions and antireflective coatings for photolithography
    1.
    发明授权
    Compositions and antireflective coatings for photolithography 有权
    用于光刻的组合物和抗反射涂层

    公开(公告)号：US09011591B2

    公开(公告)日：2015-04-21

    申请号：US13596191

    申请日：2012-08-28

    申请人： Yuanqiao Rao ,  Robert L. Auger ,  John D. Weaver ,  Paul J. Popa ,  Roxanne M. Jenkins ,  Christopher P. Sullivan ,  Jessica P. Evans ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Jeffrey L. Fenton, Jr.

    发明人： Yuanqiao Rao ,  Robert L. Auger ,  John D. Weaver ,  Paul J. Popa ,  Roxanne M. Jenkins ,  Christopher P. Sullivan ,  Jessica P. Evans ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Jeffrey L. Fenton, Jr.

    IPC分类号： C08G77/22 ,  G03F7/075 ,  G03F7/09

    CPC分类号： G03F7/0752 ,  G03F7/091 ,  Y10T428/31663

    摘要： Compositions for use in microelectronic applications: Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene; and R4, R5, R6 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; and R7, R8, R9 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and R10, R11, R12, R13 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl.

    摘要翻译： 用于微电子应用的组合物：Ra包括一个或多个多重键，条件是如果Ra包含多于多个键，则这些多重键不是共轭构型; R 1，R 2，R 3独立地选自烷氧基，羟基，卤素，OC（O）R，OC（O）OR，其中R是烷基或取代的烷基; 并且R b选自H或包含烷基，亚烷基或亚烷基的饱和基团; 和R 4，R 5，R 6独立地是烷氧基，羟基，卤素，OC（O）R，OC（O）OR，其中R是烷基或取代的烷基; 并且R c包含多于一个多重键，并且这些多重键是共轭构型; 并且R 7，R 8，R 9分别是烷氧基，羟基，卤素，OC（O）R，OC（O）OR，其中R是烷基或取代的烷基; R 10，R 11，R 12，R 13分别是烷氧基，羟基，卤素，OC（O）R，OC（O）OR，其中R是烷基或取代的烷基。

    COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY
    3.
    发明申请
    COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY 有权
    用于光刻胶的组合物和抗反射涂层

    公开(公告)号：US20130071561A1

    公开(公告)日：2013-03-21

    申请号：US13596324

    申请日：2012-08-28

    申请人： Yuanqiao Rao ,  Robert L. Auger ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Christopher P. Sullivan

    发明人： Yuanqiao Rao ,  Robert L. Auger ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Christopher P. Sullivan

    IPC分类号： C09D183/06 ,  B05D5/06 ,  C09D143/04

    CPC分类号： G03F7/091 ,  C08G77/08 ,  C08G77/14 ,  C08G77/20 ,  C08G77/80 ,  C08L83/04 ,  G03F7/0751 ,  C08L83/00

    摘要： A composition comprising: A) polymer that comprises: L is CX—CYZ, where X, Y, and Z are independently hydrogen, an alkyl, or a substituted alkyl; and, M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O—W—, where W is an alkylene or a substituted alkylene; and R′, R″, and R′″ are independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R′, R″, and R′″ is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and, p is from 1 to 10,000; and the polymer does not comprise a polyhedral oligomeric silsesquioxane structure; and B) a polymer formed from a composition comprising at least one Si-containing compound as described herein. Compositions are suitable for microelectronic applications, and have improved adhesion to photoresists polymers.

    摘要翻译： 一种组合物，其包含：A）包含：L为CX-CYZ的聚合物，其中X，Y和Z独立地为氢，烷基或取代的烷基; 和M是亚烷基，亚芳基，取代的亚烷基，取代的亚芳基或C（O）O-W-，其中W是亚烷基或取代的亚烷基; 和R'，R“和R”“独立地选自芳族烃，脂族烃或包含O，N，S或Si原子中的一个或多个的取代的烃，条件是R “R”和R“”选自烷氧基，芳氧基，羟基，卤素，羧基或碳酸酯; p为1〜10,000; 聚合物不包含多面体低聚倍半硅氧烷结构; 和B）由包含至少一种本文所述的含Si化合物的组合物形成的聚合物。 组合物适用于微电子应用，并且具有改善的对光致抗蚀剂聚合物的粘附性。

    Compositions and antireflective coatings for photolithography
    4.
    发明授权
    Compositions and antireflective coatings for photolithography 有权
    用于光刻的组合物和抗反射涂层

    公开(公告)号：US09366964B2

    公开(公告)日：2016-06-14

    申请号：US13596324

    申请日：2012-08-28

    申请人： Yuanqiao Rao ,  Robert L. Auger ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Christopher P. Sullivan

    发明人： Yuanqiao Rao ,  Robert L. Auger ,  Cecilia W. Kiarie ,  Yasmin N. Srivastava ,  Christopher P. Sullivan

    IPC分类号： C09D183/06 ,  G03F7/09 ,  C08G77/08 ,  G03F7/075 ,  C08L83/04 ,  C08G77/14 ,  C08G77/20 ,  C08G77/00

    CPC分类号： G03F7/091 ,  C08G77/08 ,  C08G77/14 ,  C08G77/20 ,  C08G77/80 ,  C08L83/04 ,  G03F7/0751 ,  C08L83/00

    摘要： A composition comprising: A) polymer that comprises: L is CX—CYZ, where X, Y, and Z are independently hydrogen, an alkyl, or a substituted alkyl; and, M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O—W—, where W is an alkylene or a substituted alkylene; and R′, R″, and R′″ are independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R′, R″, and R′″ is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and, p is from 1 to 10,000; and the polymer does not comprise a polyhedral oligomeric silsesquioxane structure; and B) a polymer formed from a composition comprising at least one Si-containing compound as described herein. Compositions are suitable for microelectronic applications, and have improved adhesion to photoresists polymers.

    摘要翻译： 一种组合物，其包含：A）包含：L为CX-CYZ的聚合物，其中X，Y和Z独立地为氢，烷基或取代的烷基; 和M是亚烷基，亚芳基，取代的亚烷基，取代的亚芳基或C（O）O-W-，其中W是亚烷基或取代的亚烷基; 和R'，R“和R”“独立地选自芳族烃，脂族烃或包含O，N，S或Si原子中的一个或多个的取代的烃，条件是R “R”和R“”选自烷氧基，芳氧基，羟基，卤素，羧基或碳酸酯; p为1〜10,000; 聚合物不包含多面体低聚倍半硅氧烷结构; 和B）由包含至少一种本文所述的含Si化合物的组合物形成的聚合物。 组合物适用于微电子应用，并且具有改善的对光致抗蚀剂聚合物的粘附性。

    Thermal printing ribbon
    8.
    发明授权
    Thermal printing ribbon 有权
    热敏打印色带

    公开(公告)号：US07226890B2

    公开(公告)日：2007-06-05

    申请号：US10744845

    申请日：2003-12-23

    申请人： Zhanjun Gao ,  Yuanqiao Rao ,  William H. Simpson ,  Debasis Majumdar ,  John F. Corman

    发明人： Zhanjun Gao ,  Yuanqiao Rao ,  William H. Simpson ,  Debasis Majumdar ,  John F. Corman

    IPC分类号： B41M5/035 ,  B41M5/382

    CPC分类号： B41M5/42 ,  B41M5/41 ,  B41M5/426 ,  B41M2205/02 ,  B41M2205/12 ,  B41M2205/36 ,  B41M2205/38

    摘要： A thermal printing ribbon that has reduced or no wrinkling during printing includes inorganic particles in a polymeric host material in at least one layer of the ribbon. The ribbon has improved mechanical and thermal properties as compared to ribbons not incorporating the inorganic particles. The ribbon can be used to form images on a dye-receiver element wherein the images have few or no artifacts caused by wrinkling of the thermal printing ribbon. The ribbon can be used in high speed printing.

    摘要翻译： 在打印期间减少或没有起皱的热敏打印带包括至少一层带中的聚合物主体材料中的无机颗粒。 与不结合无机颗粒的带相比，带具有改善的机械和热性能。 色带可用于在染料 - 接收器元件上形成图像，其中图像具有很少的或没有由热敏打印色带的褶皱引起的伪影。 色带可用于高速打印。

    Ink jet printing process
    10.
    发明授权
    Ink jet printing process 失效
    喷墨打印过程

    公开(公告)号：US06854840B2

    公开(公告)日：2005-02-15

    申请号：US10228689

    申请日：2002-08-27

    申请人： Yuanqiao Rao ,  Robert J. Kress ,  Lawrence P. Demejo ,  Sandra D. Nesbitt

    发明人： Yuanqiao Rao ,  Robert J. Kress ,  Lawrence P. Demejo ,  Sandra D. Nesbitt

    IPC分类号： B41J2/01 ,  B41M5/00 ,  B41M7/00

    CPC分类号： B41M7/0027

    摘要： An ink jet printing process for improving the durability and image quality of an ink jet image having the steps of a) providing an ink jet recording element having a support having thereon an image-receiving layer containing an ink jet image; and b) applying over the surface of the image-receiving layer an overcoat layer of water-dispersible, smectite clay particles.

    摘要翻译： 一种用于改善喷墨图像的耐久性和图像质量的喷墨印刷方法，其具有以下步骤：a）提供具有支撑体的喷墨记录元件，其上具有包含喷墨图像的图像接收层; 和b）在图像接收层的表面上施加水分散蒙脱石粘土颗粒的外涂层。