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公开(公告)号：US12124177B2
公开(公告)日：2024-10-22
申请号：US17782622
申请日：2020-11-18
CPC分类号： G03F7/706851 , G03F7/70633 , G03F7/7085 , G03F9/7046 , G03F9/7088
摘要： A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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公开(公告)号：US20240319608A1
公开(公告)日：2024-09-26
申请号：US18262467
申请日：2022-01-16
申请人： ASML Holding N.V.
IPC分类号： G03F7/00
CPC分类号： G03F7/70141 , G03F7/70075 , G03F7/70133 , G03F7/7015 , G03F7/70191 , G03F7/7085
摘要： Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.
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公开(公告)号：US12066758B2
公开(公告)日：2024-08-20
申请号：US17728608
申请日：2022-04-25
发明人： David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
CPC分类号： G03F1/64 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20240160151A1
公开(公告)日：2024-05-16
申请号：US18280459
申请日：2022-03-04
发明人： Willem Marie Julia Marcel COENE , Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Arie Jeffrrey DEN BOEF , Wouter Dick KOEK , Sergei SOKOLOV , Jeroen Johan Maarten VAN DE WIJDEVEN , Alexander Kenneth RAUB
CPC分类号： G03H1/0486 , G01N21/9501 , G02B21/10 , G02B21/365 , G03H1/0866 , G03H2001/0038 , G03H2001/0044 , G03H2001/005 , G03H2001/0232 , G03H2001/0445 , G03H2001/0473 , G03H2210/62
摘要： A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.
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5.发明授权公开(公告)号：US11966169B2
公开(公告)日：2024-04-23
申请号：US17029845
申请日：2020-09-23
申请人： ASML Holding N.V.
发明人： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
CPC分类号： G03F7/70633 , G01B11/14 , G01B11/272 , G02B6/12007 , G03F7/70575 , G03F7/70616 , G03F7/7085 , G01B2210/56 , G02B6/29301 , G02B6/29395 , G03F7/70608 , H01L21/67259
摘要： A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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公开(公告)号：US11892779B2
公开(公告)日：2024-02-06
申请号：US17772201
申请日：2020-10-21
申请人： ASML HOLDING N.V.
CPC分类号： G03F7/70891 , G02B7/1815 , G03F7/7015
摘要： An optical element and a lithographic apparatus including the optical element. The optical element includes a first member having a curved optical surface and a heat transfer surface, and a second member that comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface. In an embodiment, one or more regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface.
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公开(公告)号：US20240036485A1
公开(公告)日：2024-02-01
申请号：US18269191
申请日：2021-12-02
发明人： Arjan Johannes Anton BEUKMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX , Sergel SOKOLOV , Filippo ALPEGGIANI
CPC分类号： G03F9/7065 , G03F7/70625 , G03F9/7046
摘要： A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号：US20240027913A1
公开(公告)日：2024-01-25
申请号：US18255261
申请日：2021-12-02
发明人： Sergei SOKOLOV , Simon Reinald HUISMAN , Jin LIAN , Sebastianus Adrianus GOORDEN , Muhsin ERALP , Henricus Petrus Maria PELLEMANS , Justin Lloyd KREUZER
IPC分类号： G03F7/00
CPC分类号： G03F7/70091 , G03F7/70625 , G03F7/70633
摘要： A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
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公开(公告)号：US20230400782A1
公开(公告)日：2023-12-14
申请号：US18033530
申请日：2021-10-14
申请人： ASML Holding N.V.
发明人： Douglas C. CAPPELLI
IPC分类号： G03F7/00
CPC分类号： G03F7/706849 , G03F7/706845 , G03F7/706847
摘要： An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.
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公开(公告)号：US20230359127A1
公开(公告)日：2023-11-09
申请号：US18026115
申请日：2021-08-24
发明人： Hans BUTLER , Arie Jeffrey DEN BOEF , Mark Constant Johannes BAGGEN , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Richard Carl ZIMMERMAN
IPC分类号： G03F7/00
CPC分类号： G03F7/70625 , G03F7/706835
摘要： A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.
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