摘要:
Disclosed herein is a method for testing a semiconductor device, the method includes: preparing a first semiconductor chip having a first bump electrode and a first driver circuit that drives the first bump electrode, and a second semiconductor chip having a second bump electrode and a second driver circuit that drives the second bump electrode; staking the first and second semiconductor chips so that the first bump electrode and the second bump electrode are electrically connected to each other to form a current path including the first and second bump electrodes; and driving, in a test mode, the current path to a first potential by the first driver circuit while driving the current path to a second potential different from the first potential by the second driver circuit.
摘要:
A plurality of memory chips each have an alert terminal that notifies the outside that the memory chip has detected a predetermined error. The plurality of memory chips are mounted on memory module 100. Memory module 100 has a first transmission line connected to an alert terminal of each of the plurality of memory chips, output terminal 101 being connected to one end of the first transmission line, and a first termination resistor being connected to another end of the first transmission line.
摘要:
A method for reducing the leakage current in DRAM Metal-Insulator-Metal capacitors includes forming a flash layer between the dielectric layer and the first electrode layer. A method for reducing the leakage current in DRAM Metal-Insulator-Metal capacitors includes forming a capping layer between the dielectric layer and the second electrode layer. The flash layer and the capping layer can be formed using an atomic layer deposition (ALD) technique. The precursor materials used for forming the flash layer and the capping layer are selected such they include at least one metal-oxygen bond. Additionally, the precursor materials are selected to also include “bulky” ligands.
摘要:
Provided are MIM DRAM capacitors and methods of forming thereof. A MIM DRAM capacitor may include an electrode layer formed from a high work function material (e.g., greater than about 5.0 eV). This layer may be used to reduce the leakage current through the capacitor. The capacitor may also include another electrode layer having a high conductivity base portion and a conductive metal oxide portion. The conductive metal oxide portion serves to promote the growth of the high k phase of the dielectric layer.
摘要:
A method for accessing a plurality of DRAM devices each having a plurality of banks, the plurality of DRAM devices being interconnected to receive common address and command signals. The method includes receiving a first chip selection address and a first bank address with an active command to activate a first bank in a first DRAM device of the plurality of DRAM devices. A first bank active flag is set, corresponding to the first bank address, in the first DRAM device of the plurality of DRAM devices. A second bank address with a column command is received. A second bank is accessed in a second DRAM device of the plurality of DRAM devices having a set bank active flag corresponding to the second bank address.
摘要:
A semiconductor device is provided with the variable resistance element, and a control circuit that controls a resistance state of the variable resistance element by controlling current between a first end and a second end of the variable resistance element. The control circuit causes the variable resistance element to change from a first resistance state to a second resistance state by having a first current flow from the first end to the second end of the variable resistance element. In addition, after a second current smaller than the first current is made to flow from the first end to the second end of the variable resistance element, the control circuit causes the variable resistance element to change from the second resistance state to the first resistance state by having a third current flow from the second end to the first end thereof.
摘要:
A current source includes a first MOS transistor of a first channel type including a drain connected to an output terminal, and a source directly connected to a first power supply, a second MOS transistor of the first channel type including a drain connected to a gate, the gate of the second MOS transistor being connected to the gate of the first transistor, and a source directly connected to the first power supply, a third MOS transistor of a second channel type opposite the first channel type including a drain connected to the drain of the second MOS transistor, a fourth MOS transistor of the second channel type including a drain connected to the source of the third MOS transistor, a gate connected to a first bias voltage, and a source directly connected to second power supply voltage, and a control voltage generator that detects an output voltage on the output terminal and provides a shifted version of the output voltage to the gate of the third MOS transistor.
摘要:
To include a refresh control circuit that generates a refresh execution signal in response to a refresh command supplied from outside, and a refresh address counter that performs a counting operation in response to activation of the refresh execution signal. The refresh control circuit generates the refresh execution signal 2n times in response to one supply of the refresh command, where n is an integer equal to or larger than 0 and equal to or less than k. The value of n is variable based on a refresh-mode specifying signal supplied from outside in synchronization with the refresh command. With this configuration, for example, a frequency of generation of the refresh execution signal in response to one supply of the refresh command can be changed dynamically, flexible control can be performed by a controller.
摘要:
For example, a semiconductor device includes a first latency counter, which selects whether to give an odd-cycle latency to an internal command signal; and a second latency counter, which gives a latency to an internal command signal at intervals of two cycles. The latency counters are connected in series. Since the number of bits in control information, which is used to set a latency, is smaller than the types of settable latency as a result, it is possible to reduce wiring density.
摘要:
Disclosed herein is a device includes first and second memory mats. The first memory mat includes first and defective memory cells and first local bit lines coupled to a first global bit line. Each of the first local bit lines is coupled to associated ones of the first memory cells, one of the first local bit lines is further coupled to the defective memory cell. The second memory mat includes second and redundant memory cells and second local bit lines coupled to a second global bit line. Each of the second local bit lines is coupled to associated ones of the second memory cells, one of the second local bit lines is further coupled to the redundant memory cell. The device further includes a control circuit accessing the redundant memory cell when the access address information coincides with the defective address information that designates the defective memory cell.