公开(公告)号：US08409785B2

公开(公告)日：2013-04-02

申请号：US10565054

申请日：2003-07-17

申请人： Patrick Gerard ,  Gilbert Machuel ,  Celin Savariar-Hauck

发明人： Patrick Gerard ,  Gilbert Machuel ,  Celin Savariar-Hauck

IPC分类号： G03F7/00 ,  B41M5/00

CPC分类号： B41M7/009 ,  B41C1/1008 ,  B41C1/1075 ,  B41C1/1083 ,  B41C2210/04 ,  B41C2210/06 ,  B41M7/00 ,  B41N3/08 ,  Y10T428/24802

摘要： An apparatus and method for improving the durability of an image on an imaging material, including increasing the press run length or a printing plate. The apparatus and method can involve the use of, as an example but not restricted to, an imaging device, a pre-bake oven, a processor, and a post-process treatment unit that employs infrared lamps adapted to irradiate the image.

公开(公告)号：US07569329B2

公开(公告)日：2009-08-04

申请号：US11573901

申请日：2005-08-25

申请人： Bernd Strehmel ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Harald Baumann

发明人： Bernd Strehmel ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Harald Baumann

IPC分类号： G03F7/26 ,  G03C1/00

CPC分类号： B41C1/10 ,  B41C1/1008 ,  B41C1/1016 ,  B41C1/1058 ,  B41C1/1066 ,  B41C1/1091 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N3/08 ,  G03F7/405

摘要： A process for the post-treatment of an imaged lithographic printing plate comprises (a) Contacting a lithographic printing plate having image areas and non-image areas on a lithographic substrate with a solution comprising at least one phosphono-substituted siloxane of the following general formula (I) that is defined herein and (b) drying.

摘要翻译： 用于后成像平版印刷版的后处理的方法包括（a）在平版印刷基底上与包含至少一种以下通式的膦酰取代的硅氧烷的溶液接触在平版印刷基底上具有图像区域和非图像区域的平版印刷版 （I），（b）干燥。

公开(公告)号：US07781148B2

公开(公告)日：2010-08-24

申请号：US11997564

申请日：2006-08-01

申请人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Horst Glatt ,  Dietmar Frank

发明人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Horst Glatt ,  Dietmar Frank

IPC分类号： G03F7/26

CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

摘要： Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.

摘要翻译： 描述了可热成像的元件，其包括在具有亲水表面的基底上（a）第一层，该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物，并且不溶于低极性的有机溶剂中，和（b）第二层， 其中第一聚合物不同于第二聚合物，第二聚合物包含乙烯基缩醛重复单元和选自COOH，-SO 3 H，-PO 3 H 2，-PO 4 H 2，芳族OH的侧基酸基和具有酸性酰胺的基团或 酰亚胺组。

公开(公告)号：US07615323B2

公开(公告)日：2009-11-10

申请号：US11718809

申请日：2005-11-11

申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

公开(公告)号：US07574959B2

公开(公告)日：2009-08-18

申请号：US10580357

申请日：2004-11-18

申请人： Harald Baumann ,  Udo Dwars ,  Michael Flugel

发明人： Harald Baumann ,  Udo Dwars ,  Michael Flugel

IPC分类号： G03C1/73 ,  B32B17/06 ,  C08J7/04 ,  B41N1/00

CPC分类号： G03F7/031 ,  Y10T428/31591

摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≦number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2′,4,4′,5′5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.

摘要翻译： 辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使 二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用： 异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c） 能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐 和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

公开(公告)号：US07285372B2

公开(公告)日：2007-10-23

申请号：US10536514

申请日：2003-11-28

申请人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

发明人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/027

CPC分类号： B41M5/46 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/029 ,  Y10S430/118

摘要： Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

摘要翻译： 辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物，（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250-1200nm范围内的辐射和（ iii）至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团，以及至少一种能够在基材亲水表面吸附的其它基团。

公开(公告)号：US08119331B2

公开(公告)日：2012-02-21

申请号：US12159287

申请日：2007-01-02

申请人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

发明人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

IPC分类号： G03F7/09 ,  G03F7/30 ,  G03F7/004

CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

摘要翻译： 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

公开(公告)号：US07563556B2

公开(公告)日：2009-07-21

申请号：US11560983

申请日：2006-11-17

申请人： Celin Savariar-Hauck ,  Gerhard Hauck

发明人： Celin Savariar-Hauck ,  Gerhard Hauck

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/322 ,  Y10S430/106

摘要： A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The ink receptive outer layer includes a phenolic polymeric binder that is soluble in a developer having a pH of from about 7 to about 11. The use of this type of polymeric binder reduces residue in the developer as elements are processed.

摘要翻译： 正性可成像元件包括内层和外层以及红外辐射吸收化合物如IR吸收染料。 油墨接收外层包括可溶于pH为约7至约11的显影剂中的酚类聚合物粘合剂。当加工元素时，使用这种聚合粘合剂可减少显影剂中的残余物。

公开(公告)号：US07829261B2

公开(公告)日：2010-11-09

申请号：US11573916

申请日：2005-08-23

申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

IPC分类号： B41N1/00 ,  G03F7/00 ,  G03F7/26

CPC分类号： B41N3/08

摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个pK <5的酸性官能团的单体，其中酸性官能团可以作为游离基 酸基或盐的形式; （c）干燥。

公开(公告)号：US07560221B2

公开(公告)日：2009-07-14

申请号：US10586509

申请日：2005-01-19

申请人： Hans-Joachim Timpe ,  Ursula Muller

发明人： Hans-Joachim Timpe ,  Ursula Muller

IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033

CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

摘要翻译： 包括：a）未处理或预处理的底物和b）辐射敏感性涂层，其包含：（i）至少一种可溶于或溶胀在含水碱性显影剂中的聚合物粘合剂; （ii）至少一种包含分子中至少一个非芳族C-C双键和至少一个SH基团的自由基可聚合单体和/或低聚物; 和（iii）用于自由基聚合的辐射敏感引发剂或引发剂体系，其中组分（ii）具有式（I），其中每个R 1a，R 1b和R 1c独立地选自H，C 1 -C 6烷基，C 2 -C 8 烯基，芳基，卤素，CN和COOR1d，其中R1d是H，C1-C18烷基，C2-C8链烯基，C2-C8炔基或芳基; 并且Z是脂族，杂环或杂芳族间隔基或其两个或多个的组合，其中Z可以任选地包含一个或多个另外的SH基团和/或一个或多个另外的非芳族C-C双键; 并且每个Z 1独立地选自单键，式（Ia），（Ib），（Ic），（Id），（Ie），（If），（Ig），（Ih），（Ij） ），（I 1），（I 1），（I 1），（I 1），（I q），（Ir），（Is），（It），（I u），（Iv） 选自H，C1-C6烷基和芳基，Z2选自单键，O，S和NR2c，Z3为与Z连接的单键，b为1至10的整数，c为 1到3。