MANUFACTURING METHOD FOR SILICON CARBIDE CRYSTAL

    公开(公告)号:US20190106811A1

    公开(公告)日:2019-04-11

    申请号:US15864000

    申请日:2018-01-08

    摘要: A silicon carbide crystal and a manufacturing method for same are provided. A silicon carbide crystal seed used for the silicon carbide crystal has a crystal-growing surface with a surface roughness (Ra) less than 2.0 nm, and a thickness of the silicon carbide crystal seed is less than 700 μm. Therefore, the silicon carbide crystal grown from the silicon carbide crystal seed by sublimation method (which is also a PVT method) may have low basal plane dislocation (BPD) and low micropipe density (MPD).

    SiC single crystal and production method thereof

    公开(公告)号:US09856582B2

    公开(公告)日:2018-01-02

    申请号:US13428395

    申请日:2012-03-23

    IPC分类号: C30B17/00 C30B29/36 C30B9/10

    CPC分类号: C30B29/36 C30B9/10 C30B17/00

    摘要: A method is disclosed with provides stable growth of SiC single crystals, particularly 4H—SiC single crystals, with an effective crystal growth rate for a prolonged time even at a low temperature range of 2000° C. or lower. A raw material containing Si, Ti and Ni is charged into a crucible made of graphite and heat-melted to obtain a solvent. At the same time, C is dissolved out from the crucible into the solvent to obtain a melt. A SiC seed crystal substrate is then brought into contact with the melt such that SiC is supersaturated in the melt in the vicinity of the surface of the SiC seed crystal substrate, thereby allowing growth and production of an SiC single crystal on the SiC seed crystal substrate.

    APPARATUS FOR PRODUCING SiC SINGLE CRYSTALS AND METHOD OF PRODUCING SiC SINGLE CRYSTALS USING SAID PRODUCTION APPARATUS
    10.
    发明申请
    APPARATUS FOR PRODUCING SiC SINGLE CRYSTALS AND METHOD OF PRODUCING SiC SINGLE CRYSTALS USING SAID PRODUCTION APPARATUS 有权
    用于生产SiC单晶的装置和使用生产装置制造SiC单晶的方法

    公开(公告)号:US20160122900A1

    公开(公告)日:2016-05-05

    申请号:US14889463

    申请日:2014-05-19

    IPC分类号: C30B17/00 C30B29/36

    CPC分类号: C30B17/00 C30B15/00 C30B29/36

    摘要: An apparatus for producing SiC single crystals where the quality of the SiC single crystals is improved, and a production method using such an apparatus are provided. The apparatus for producing SiC single crystals according to an embodiment of the present invention is employed to produce an SiC single crystal by the solution growth method. The production apparatus includes a crucible and a support shaft. The crucible accommodates an Si—C solution. The support shaft supports the crucible. The support shaft includes a heat removing portion for removing heat from a bottom portion of the crucible. The heat removing portion includes one of (a) a contact portion having a thermal conductivity not less than that of the bottom portion and contacting at least a portion of the bottom portion and (b) a space adjacent to at least a portion of the contact portion or the bottom portion.

    摘要翻译: 提供了改善SiC单晶质量的SiC单晶的制造装置以及使用这种装置的制造方法。 采用本发明实施方式的SiC单晶的制造装置,通过溶液生长法制造SiC单晶。 制造装置包括坩埚和支撑轴。 坩埚容纳Si-C溶液。 支撑轴支撑坩埚。 支撑轴包括用于从坩埚的底部除去热量的除热部分。 除热部分包括(a)具有不小于底部部分的热导率并且接触底部的至少一部分的接触部分的接触部分和(b)与接触部分的至少一部分相邻的空间 部分或底部。