LOW OPEN AREA AND COUPON ENDPOINT DETECTION

    公开(公告)号:US20240420975A1

    公开(公告)日:2024-12-19

    申请号:US18821843

    申请日:2024-08-30

    Abstract: The disclosure describes apparatus and method for detecting an endpoint in plasma-assisted wafer processing in a chamber. A fiber array comprising a plurality of fibers collects optical emission light from the chamber during the plasma-assisted wafer processing. The fiber array is split into two or more sub-arrays of fibers, each group carrying a portion of the light to a segment of a photodetector. Each segment of photodetector has a corresponding narrowband optical filter designed for a specific range of wavelengths. A computer processor analyzes detected signals from the plurality of segments of the photodetector, and determines, based on the analysis of the detected signals, an endpoint of the plasma-assisted wafer processing as indicated by the presence or the absence of the one or more chemical species in the chamber. The photodetector can be based on photomultiplier tubes (PMT), specifically multi-anode PMT.

    Easily adjustable optical emission spectrometer

    公开(公告)号:US12130178B2

    公开(公告)日:2024-10-29

    申请号:US17774405

    申请日:2020-11-04

    CPC classification number: G01J3/0286 G01J3/0291 G01J3/18 G01J3/36

    Abstract: The invention relates to an optical emission spectrometer (1) being easily adjustable, and to a method (100) to set-up and operate such a spectrometer (1) comprising a plasma stand (2) to establish a light emitting plasma from sample material, and an optical system (3) to measure the spectrum of the light (L) emitted by the plasma being characteristic to the sample material, where the optical system (3) comprises at least one light entrance aperture (31), at least one diffraction grating (32) to split up the light (L) coming from the plasma (A) and one or more detectors (33) to measure the spectrum of the light (L), wherein the plasma stand (2) and the optical system (3) are directly and fixedly mounted on respective a plasma stand flange (2B) and an optical system flange (3B) which are directly and fixedly connected to each other and wherein the optical emission spectrometer (1) further comprises an analyzing unit (34) adapted to analyze the measured spectrum and to compensate for a drift of the spectrum relative to the detector (33) potentially caused by heat transferred from the plasma stand (2) to the optical system (3) considering the thermal expansion of the optical system (3).

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