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    PHOTOSENSITIVE, FLEXO PRINTING ELEMENT AND METHOD FOR THE PRODUCTION OF NEWSPAPER FLEXO PRINTING PLATES
    12.
    发明申请
    PHOTOSENSITIVE, FLEXO PRINTING ELEMENT AND METHOD FOR THE PRODUCTION OF NEWSPAPER FLEXO PRINTING PLATES 审中-公开
    FOTEMPFINDLICHES柔版印刷及其制造方法报纸印刷

    公开(公告)号：WO03014831A2

    公开(公告)日：2003-02-20

    申请号：PCT/EP0207997

    申请日：2002-07-18

    Applicant: BASF DRUCKSYSTEME GMBH ,  KNOELL ROLF ,  SANDIG HARTMUT ,  STEBANI UWE ,  TELSER THOMAS ,  ZWEZ THOMAS

    Inventor： KNOELL ROLF ,  SANDIG HARTMUT ,  STEBANI UWE ,  TELSER THOMAS ,  ZWEZ THOMAS

    IPC: G03F7/032 ,  G03F1/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  G03F7/36 ,  G03F7/38 ,  G03F7/12

    CPC classification number: G03F7/0048 ,  G03F7/027 ,  G03F7/033 ,  Y10S430/145 ,  Y10S430/146

    Abstract: The invention relates to a photosensitive printing element for the production of flexo printing plates for newspaper printing, comprising at lest one flexible metal support, an adhesive layer applied on said support, an organically developable, photopolymerizable layer, a transparent substrate layer and optionally a removable protective foil, wherein the total thickness of the flexo printing element measures 300 to 1000 mu m, the elastomer binding agent has an average weight MW of between 80 000 to 150 000 g/mol and a Shore A hardness of between 50 to 80, wherein the amount of softening agent ranges from 5 to 50 percent by weight in relation to the amount of all components of the photopolymerizable layer. The invention also relates to a method for the production of newspaper flexo printing plates by imagewise exposure of the flexo printing element to actinic light, development and drying at 105 to 160 DEG C.

    Abstract translation: 对于报纸印刷，其包括至少一个柔性的，金属支撑，生产面包车柔性版印刷版的感光性柔性版印刷部件的施加于其上的粘合剂层，有机显影的光致聚合层，透明基材层，以及任选的可去除的保护膜，所述柔性版印刷部件的总厚度为300至1000微米，弹性体 具有粘结剂具有平均MW 80,000重量至150,000克/摩尔，的肖氏50 80他的硬度和增塑剂5重量双第50％的量存在，基于可光聚合层的所有成分的量的方法，以及 生产报纸印刷，通过柔性版印刷部件的成像曝光于光化光，显影和Trock-NEN在105至160℃下干燥。

    USING BLOCK COPOLYMERS AS SUPERCRITICAL FLUID DEVELOPABLE PHOTORESISTS
    13.
    发明申请
    USING BLOCK COPOLYMERS AS SUPERCRITICAL FLUID DEVELOPABLE PHOTORESISTS 审中-公开
    使用嵌段共聚物作为超临界流体发展光电子

    公开(公告)号：WO01031404A1

    公开(公告)日：2001-05-03

    申请号：PCT/US2000/026256

    申请日：2000-10-16

    IPC: G03F7/038 ,  C08F293/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/32 ,  G03F7/36 ,  H01L21/027 ,  G03F7/30

    CPC classification number: G03F7/36 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/325

    Abstract: Block copolymers containing block having pendant fluoro-containing groups and block having pendant hydrolyzable ester containing groups is developed at lower pressures and temperatures than random copolymers of the same monomers. Where the block with ester groups is from polymerization of 2-tetrahydropyranyl methacrylate and the block with pendant fluoro-containing groups is from polymerization of perfluoroalkyl methacrylate or semifluorinated alkyl methacrylate, resolution of sub 0.3 mu m features is enabled.

    Abstract translation: 包含具有侧基含氟基团的嵌段共聚物和具有侧链可水解酯基团的嵌段在比相同单体的无规共聚物低的压力和温度下开发。 如果带有酯基的嵌段来自甲基丙烯酸2-四氢吡喃基酯的聚合，带有含氟基团的嵌段是由甲基丙烯酸全氟烷基酯或甲基丙烯酸半氟代烷基酯的聚合反应而得到的，分辨率为0.3μm以下。

    METHOD FOR PATTERNING THIN FILMS
    14.
    发明申请
    METHOD FOR PATTERNING THIN FILMS 审中-公开
    用于绘制薄膜的方法

    公开(公告)号：WO00042472A1

    公开(公告)日：2000-07-20

    申请号：PCT/US1999/029447

    申请日：1999-12-13

    IPC: G03F7/20 ,  B23K26/00 ,  B23K101/36 ,  B41M5/24 ,  B41M5/26 ,  G02B27/09 ,  G03F1/68 ,  G03F7/30 ,  G03F7/34 ,  H01Q1/22 ,  H01Q7/00 ,  H05K3/02 ,  G03F1/00 ,  G03F7/36 ,  H01Q1/00

    CPC classification number: H01Q1/2225 ,  B41M5/262 ,  G02B19/0014 ,  G02B19/0052 ,  G02B19/009 ,  G02B19/0095 ,  G02B27/09 ,  G02B27/0911 ,  G02B27/0966 ,  G03F1/68 ,  G03F7/30 ,  G03F7/3014 ,  G03F7/34 ,  H01Q1/22 ,  H01Q7/00 ,  H05K3/027

    Abstract: Patterned articles, such as RFID antennas, are made by subablation, a process comprising the steps of: A. providing a substrate having a coating, such as a metal or metal oxide, and an interface comprising the thin region where the coating and the substrate are closest to each other; B. exposing at least one part of the total area of the coating to a flux of electromagnetic energy, such as a focused excimer laser beam, sufficient to disrupt the interface but insufficient to ablate the coating; and C. removing the parts of the coating in registry with the portion of the interface area that was disrupted, by means such as ultrasonic agitation. The process has advantages over photo-resist processes in that there is no residual chemical resist left on the product and no undercutting of the pattern or image. It has advantages over laser ablation processes in that higher throughput is possible at the same energy level and there is no microscopic debris left on the product surface.

    Abstract translation: 图案化的物品，例如RFID天线，通过消融来制造，一种方法包括以下步骤：A.提​​供具有涂层的基底，例如金属或金属氧化物，以及包含薄区域的界面，其中涂层和基底 彼此最接近; B.将涂层的总面积的至少一部分暴露于足以破坏界面但不足以消除涂层的电磁能量（例如聚焦的准分子激光束）; 和C.通过诸如超声波搅拌的方式，将被涂覆的部分与被破坏的界面区域的部分对准。 该方法具有优于光致抗蚀剂工艺的优点，因为在产品上没有残留的化学抗蚀剂，并且没有图案或图像的底切。 它具有优于激光烧蚀工艺的优点，因为在相同的能量水平下可以实现更高的产量，并且在产品表面上没有留下微观碎片。

    WATERLESS LITHOGRAPHIC PRINTING PLATES
    15.
    发明申请
    WATERLESS LITHOGRAPHIC PRINTING PLATES 审中-公开
    无水平版印刷版

    公开(公告)号：WO99059826A1

    公开(公告)日：1999-11-25

    申请号：PCT/US1999/011313

    申请日：1999-05-21

    IPC: B41C1/10 ,  B41N1/00 ,  B41N1/14 ,  B41N1/04 ,  G03F7/004 ,  G03F7/36 ,  G03F7/38

    CPC classification number: B41C1/1033 ,  B41C1/1066 ,  B41C2210/16 ,  Y10S430/145 ,  Y10S430/146

    Abstract: Provided is a media-fluid material set for use in preparing a waterless lithographic printing plate. The media fluid material set comprises a media with a support that bears a hydrophilic receiving surface having ink-receiving properties, together with a fluid material comprising a liquid carrier medium and a reactive transition metal complex of a fluorinated organic acid. After an application of the fluid material to the hydrophilic recieving surface, the reactive complex reacts to form a durable ink-releasing layer. Such a media-fluid material set can be advantageously used in preparing waterless lithographic printing plates with ink-releasing layers comprising such fluorinated reaction products. Also provided are imaged waterless lithographic printing plates with such ink-releasing layers made by an ink jet printing application or by laser-induced thermal ablation, and methods of making such waterless lithographic printing plates.

    Abstract translation: 提供了一种用于制备无水平版印刷版的介质流体材料。 介质流体材料组包括具有带有具有油墨接收性质的亲水性接收表面的支撑物的介质，以及包含液体载体介质和氟化有机酸的反应性过渡金属络合物的流体材料。 在将流体材料施加到亲水接收表面之后，反应性配合物反应形成持久的油墨释放层。 这种介质流体材料组可以有利地用于制备具有包含这种氟化反应产物的油墨释放层的无水平版印刷版。 还提供了具有通过喷墨印刷应用或通过激光诱导的热消融制成的这种油墨释放层的成像的无水平版印刷版，以及制造这种无水平版印刷版的方法。

    RADIATION SENSITIVE TERPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND 193 nm BILAYER SYSTEMS
    17.
    发明申请
    RADIATION SENSITIVE TERPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND 193 nm BILAYER SYSTEMS 审中-公开
    辐射敏感性三聚体，其光电子组合物和193 nm双层体系

    公开(公告)号：WO99042903A1

    公开(公告)日：1999-08-26

    申请号：PCT/US1999/003861

    申请日：1999-02-23

    IPC: C08F220/16 ,  C08F220/18 ,  G03F7/004 ,  G03F7/075 ,  C08F230/08 ,  G03F7/039 ,  G03F7/30 ,  G03F7/36 ,  G03F7/40

    CPC classification number: G03F7/0045 ,  C08F220/16 ,  C08F220/18 ,  G03F7/0758

    Abstract: A terpolymer with chemically amplified (acid labile) moieties and organosilicon moieties suitable for use as the binder resin for a photoimageable resist photoresist composition suitable for use in 193 nm photolithographic processes. The terpolymers have structural units: (I), (II), (III), where R is a methyl or hydroxyethyl group, R is a hydrogen atom, a methyl group or a -CH2COOCH3 group and R and R are each independently a hydrogen atom or a methyl group.

    Abstract translation: 具有化学扩增（酸不稳定）部分和有机硅部分的三元共聚物，其适合用作适用于193nm光刻工艺的可光致成像抗蚀剂光刻胶组合物的粘合剂树脂。 三元共聚物具有结构单元：（I），（II），（III），其中R是甲基或羟乙基，R 1是氢原子，甲基或-CH 2 COOCH 3基团，R 2和 R 3各自独立地为氢原子或甲基。

    DRY RESIST SYSTEM AND METHOD OF USING
    19.
    发明申请
    DRY RESIST SYSTEM AND METHOD OF USING 审中-公开

    公开(公告)号：WO2022265874A1

    公开(公告)日：2022-12-22

    申请号：PCT/US2022/032328

    申请日：2022-06-06

    Applicant: TOKYO ELECTRON LIMITED ,  TOKYO ELECTRON U.S. HOLDINGS, INC.

    Inventor： TAPILY, Kandabara

    IPC: H01L21/67 ,  G03F7/16 ,  G03F7/36 ,  G03F7/40 ,  G03F7/004

    Abstract: A method of operating a manufacturing platform includes moving a substrate through the manufacturing platform using one or more transfer modules. A dry resist is deposited on the substrate using a resist deposition module of the manufacturing platform. The substrate is examined for distortion with a metrology system that is part of a transfer module. The dry resist is exposed to UV or EUV radiation using an exposure tool of the manufacturing platform. Exposed or unexposed portions of the dry resist are removed using an etch module of the manufacturing platform.

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