Abstract:
In one embodiment, a method of forming a multi-die semiconductor device is provided. A plurality of dice (402 and 404) is mounted on a semiconductor substrate (426), and neighboring ones of the dice are separated by a distance (420) at which a first one of the neighboring dice (404) will contact a meniscus (406) of a flange (416) of the neighboring die during underfill to form a capillary bridge between the neighboring dice (402 and 404). Solder bumps are reflowed to electrically connect contact terminals of the plurality of dice to contact terminals on a top surface of the substrate (512). Underfill is deposited along one or more edges of one or more of the plurality of dice (516). As a result of the capillary bridge formed between neighboring dice, flow of underfill is induced between the bottom surfaces of the neighboring dice and the top surface of the substrate. The dispensed underfill is cured (518).
Abstract:
A semiconductor device includes a substrate (105) having a top surface (109) and a bottom surface (1 10), and a through-silicon via (TSV) (103) extending from the top surface (109) of the substrate (105) to the bottom surface (1 10) of the substrate (105), the TSV (103) having a height and a side profile extending along a longitudinal axis (200), where the side profile has an upper segment (201, 21 1, 301, 401, 501, 601 ) forming a first angle relative to the longitudinal axis (200), and a lower segment (202, 212, 302, 402, 502, 603) forming a second angle relative to the longitudinal axis (200), where the second angle is different than the first angle, and where the lower segment (202, 212, 302, 402, 502, 603) has a height that is less than 20% of the height of the TSV (103).
Abstract:
Semiconductor assemblies having reduced thermal spreading resistance and methods of making the same are described. In an example, a semiconductor device (101) includes a primary integrated circuit (IC) die (102) and at least one secondary IC die (104) mounted on the primary IC die (102). A heat extraction element (110) includes a base (109) mounted to the semiconductor device (101) such that each of the at least one secondary IC die (104) is between the primary IC die (102) and the heat extraction element (110). At least one dummy fill (106) is adjacent the at least one secondary IC die (104), and each thermally couples the primary IC die (102) to the heat extraction element (110).
Abstract:
In an integrated circuit (IC) structure, the positioning of through silicon vias (TSVs) in terms of the physical layout of circuitry is described. An IC structure can include a plurality of first circuit elements (D1, G1, & S; 702, 706, 710, & 714; or 702, 706, 704, & 708); a plurality of second circuit elements (D2, G2, & S; 704, 708, 712, & 716; or 710, 714, 712, & 716); a plurality of first TSVs (410 & 510; 605-620; or 720-734); and a plurality of second TSVs (415 & 505; 625-640; or 736-750). The first and second circuit elements and the first and second TSVs together comprise a circuit block configuration. The circuit block configuration is symmetric with respect to at least one axis of symmetry. At least one of the first TSVs is a dummy TSV without which the circuit block configuration would not be symmetric.
Abstract:
An integrated circuit (100) includes a first die (105, 110), a second die (115) on which the first die may be disposed, a plurality of inter-die connections (205, 205A, 205B) coupling the first die to the second die, and a plurality of probe pads (120, 120A, 120B, 120C, 120D, 120E), where each probe pad is coupled (305, 310, 405, 410) to at least one of the inter-die connections. The first die may be configured to establish an internal connection (315, 415, 420, 515) coupling the first probe pad to the second probe pad. In some embodiments, each probe pad is coupled to a micro-bump (210), and the internal connections couple the micro-bumps one to another. Some embodiments utilize through silicon vias extending through the second die. Methods of testing the described integrated circuits are also disclosed.
Abstract:
A method of circuit design involving an integrated circuit (IC) having an interposer can include identifying an active resource implemented within the IC (200, 500) within a zone (465, 470, 535) of the interposer (205, 505) exposed to an amount of stress that exceeds a normalized amount of stress on the interposer and selectively assigning an element of the circuit design to be implemented within the IC to the active resource according to a stress-aware analysis of the circuit design as implemented within the IC. Another zone (620) is characterized by a substantially normalized stress throughout the other zone.
Abstract:
A composite integrated circuit (IC, 100) combines a first IC die (chip, 102) having a first on-chip interconnect structure (1 14) and a second IC die (104) having a second on-chip interconnect structure (1 15) on a reconstructed wafer base (108). The second IC die is edge-bonded to the first IC die with oxide-to- oxide edge bonding (1 10). A chip-to-chip interconnect structure (1 18) electrically couples the first IC die and the second IC die. Methods of fabricating such a composite IC are also described.
Abstract:
An integrated circuit device includes a stacked die (102) and a base die (101) having probe pads (306, 111 -116) that directly couple to test logic (305, 104) of the base die to implement a scan chain for testing of the integrated circuit device. The base die further includes contacts (107) disposed on a back side of the base die and through-die vias (310, 121 -128) coupled to the contacts and coupled to programmable logic (550, 314, 105) of the base die. The base die also includes a first probe pad (111) configured to couple test input, a second probe pad (112) configured to couple test output, and a third probe pad (113) configured to couple control signals. Test logic (305) of the base die is configured to couple to additional test logic (405) of the stacked die to implement the scan chain. The probe pads (306, 111 -116) are coupled directly to the test logic (305, 104) such that configuration of the programmable logic (550, 314, 105) is not required to implement the scan chain.