Abstract:
An electrode substrate (100) of the present invention includes a first conductive layer (102) made of a first conductive material and a second conductive layer (103) made of a second conductive material formed on a transparent base material (101), wherein the first conductive layer (102) is formed on the transparent base material (101), the second conductive layer (103) is formed on the transparent base material (101) to cover the first conductive layer (102), both the first conductive layer (102) and the second conductive layer (103) form a fine wiring pattern, the second conductive layer (103) has a width (W 2 ) not less than 1.5 times and not more than 300 times that (W 1 ) of the first conductive layer (102), and the second conductive material has a light transmissivity higher than that of the first conductive material, and a conductivity lower than that of the first conductive material.
Abstract:
A flexible film (210) is provided. The flexible film includes a dielectric film (212); and a metal layer (214) disposed on the dielectric film, wherein the ratio of the thickness of the metal layer to the thickness of the dielectric film is about 1:3 to 1:10. Therefore, it is possible to improve the peel strength, dimension stability, and tensile strength of a flexible film by limiting the ratio of the thicknesses of a dielectric film and a metal layer of the flexible film.
Abstract:
To achieve good solder performance with Pd-free solder to a BGA design, a layer assembly comprising first, second and, optionally, third sub-layers is provided, wherein said first sub-layer comprises a first material, said first material comprising nickel and phosphorus and said first sub-layer being in contact with said second sub-layer; said second sub-layer comprises a second material, said second material comprising palladium and phosphorus and said second sub-layer being in contact with said first sub-layer and said third sub-layer and wherein said second sub-layer is at least 0.1 µm thick; and said third sub-layer comprises a third material, said third material consisting of gold or a gold alloy and said third sub-layer being in contact with said second sub-layer. Such layer assembly is coated to the copper structure which is provided on one or on both sides of the carrier corpus of a circuit carrier.
Abstract:
A multilayer printed circuit board comprises a substrate board (101) carrying a lower-layer conductor circuit (104) and, as built up on the substrate board (101) successively and alternately, an interlayer resin insulating layer (102) and an upper-layer conductor circuit (105) in succession. The multilayer printed circuit board further comprises a metal layer (111a) composed of at least one metal selected from among metals having ionization tendencies not lower than tin but not higher than aluminum and noble metals as formed on the surface of said lower-layer conductor circuit (104) and a roughened layer (111b) superimposed on said metal layer (111a).
Abstract:
In a process for manufacturing a multilayer printed circuit board which comprises forming a resin insulating layer (12) and a conductor circuit (19) on a resin substrate (1), a metal layer (14) composed of at least one metal selected from among the metal elements of the 4 th through 7 th periods in Group 4A through Group 1B of the long-form periodic table of the elements, A1 and Sn is formed on the surface of the resin insulating layer (12), the surface of the metal layer (14) is then cleaned with an acid, and thereafter the conductor circuit (19) is constructed on the metal layer (14).
Abstract:
Curved out of plane metal components are formed on PCB substrates (11) by electroplating two layers (13, 14) of the same metal such that each layer has a different internal stress. This produces as curvature of the layer (13, 14) which enables coils, curved cantilever beams and springs to be fabricated. The amplitude and direction of curvature can be controlled by controlling the stress and thickness of each layer. The stress is controlled by controlling the composition of the electroplating bath.
Abstract:
In a process for manufacturing a multilayer printed circuit board which comprises constructing a conductor circuit (104), roughening the conductor circuit (104) to provide a roughened surface (111), forming an interlayer resin insulating layer (102) over the roughened surface (111) of the conductor circuit (104) and forming openings (106) for via holes in a repeated sequence to construct conductor circuits comprised a plurality of layers isolated by interlayer resin insulating layers, an oxidation treatment is carried out after forming the roughened surface (111) on the conductor circuit (104) to provide an oxide film on the entire roughened surface (111), and thereafter the interlayer resin insulating layer (102) is constructed.
Abstract:
A layered wiring line of silver or silver alloy includes a silver or silver alloy conductor layer (32) including silver or silver alloy; and a protective conductor layer (31) layered on and covering the silver or silver alloy conductor layer. A method for forming the layered wiring line includes steps of: layering the silver or silver alloy conductor layer and the protective conductor layer on a substrate in turn; making the protective conductor layer in contact with a liquid etchant common to the silver or silver alloy conductor layer and the protective conductor layer by a predetermined pattern. The protective conductor layer has a thickness satisfying a relationship in that a ratio of (the protective conductor layer's thickness) / (the silver or silver alloy conductor layer's thickness) is less than that of (a solution velocity of the protective conductor layer in the liquid etchant) / (a solution velocity of the silver or silver alloy conductor layer in the liquid etchant).
Abstract:
Curved out of plane metal components are formed on PCB substrates (11) by electroplating two layers (13, 14) of the same metal such that each layer has a different internal stress. This produces as curvature of the layer (13, 14) which enables coils, curved cantilever beams and springs to be fabricated. The amplitude and direction of curvature can be controlled by controlling the stress and thickness of each layer. The stress is controlled by controlling the composition of the electroplating bath.
Abstract:
Methods for roll-to-roll deposition of optically transparent and high conductivity metallic thin films are disclosed. In general, a method according to the present invention comprises: (1) providing a flexible plastic substrate; (2) depositing a multi-layered conductive metallic film on the flexible plastic substrate by a thin-film deposition technique to form a composite film; and (3) collecting the composite film in continuous rolls. Typically, the thin conductive metallic film is an InCeO-Ag-InCeO film. Typically, the thin-film deposition technique is DC magnetron sputtering. Another aspect of the invention is a composite film produced by a method according to the present invention. Still another aspect of the invention is a composite film comprising InCeO-Ag-InCeO film formed on a flexible plastic substrate, wherein the composite fillm has a combination of properties including: transmittance of at least 90% throughout the visible region; an electrical resistance of no greater than about 10 ohm/square; a root-mean-square roughness of no greater than about 2.5 nm; and an interlayer adhesion between the InCeO/Ag/InCeO metallic film and the remainder of the composite film that is sufficiently great to survive a 180° peel adhesion test.