摘要:
Methods, systems, and apparatus, including a photonic integrated circuit package, including a photonic integrated circuit chip, including multiple electrodes configured to receive the electrical signal, where at least one characteristics of a segment of the traveling wave active optical element is changed based on the electrical signal received by a corresponding electrode of the multiple electrodes; a ground electrode; and multiple bond contacts; and an interposer bonded to at least a portion of the photonic integrated circuit chip, the interposer including a conductive trace formed on a surface of the interposer, the conductive trace electrically coupled to a source of the electrical signal; a ground trace; and multiple conductive vias electrically coupled to the conductive trace, where each conductive via of the multiple conductive vias is bonded with a respective bond contact of the multiple bond contacts of the photonic integrated circuit chip.
摘要:
A combination underfill-dam and electrical-interconnect structure for an opto-electronic engine. The structure includes a first plurality of electrical-interconnect solder bodies. The first plurality of electrical-interconnect solder bodies includes a plurality of electrical interconnects. The first plurality of electrical-interconnect solder bodies, is disposed to inhibit intrusion of underfill material into an optical pathway of an opto-electronic component for the opto-electronic engine. A system and an opto-electronic engine that include the combination underfill-dam and electrical interconnect structure are also provided.
摘要:
Disclosed herein is a method of making an apparatus suitable for detecting x-ray, the method comprising: obtaining a substrate having a first surface and a second surface, wherein the substrate comprises an electronics system in or on the substrate, wherein the substrate comprises a plurality of electric contacts are on the first surface; obtaining a first chip comprising a first X-ray absorption layer, wherein the first X-ray absorption layer comprises an electrode; bonding the first chip to the substrate such that the electrode of the first X-ray absorption layer is electrically connected to at least one of the electrical contacts.
摘要:
A through hole 7 is a vertical hole. When attention is paid to regions on both sides of a center line CL of the through hole 7 in a plane including the center line CL of the through hole, it is assumed that a segment that connects a first point X1 corresponding to the edge of an opening 10a of an insulating layer 10 and a second point X2 corresponding to the edge of a second opening 7b is a first segment S1, a segment that connects the second point X2 and a third point X3 corresponding to an intersection point between the second opening 7b and a surface 10b of the insulating layer 10 is a second segment S2, and a segment that connects the third point X3 and the first point X1 is a third segment S3. In this case, the first area A1 of the insulating layer 10 that is located on one side with respect to the first segment S1 is larger than the sum of the second area A2 of the insulating layer 10 that is surrounded by the first segment S1, the second segment S2, and the third segment S3 and the third area A3 of the insulating layer 10 that is located on the other side with respect to the third segment S3.
摘要:
A semiconductor substrate IN includes a first region RS1 in which a plurality of pixels are disposed and a second region RS2 located inside the first region RS1 to be surrounded by the first region RS1 when viewed from a direction in which a principal surface INa and a principal surface 1Nb oppose each other. A through-hole TH penetrating through the semiconductor substrate IN is formed in the second region RS2 of the semiconductor substrate 1N. An electrode E3 disposed on a side of the principal surface INa of the semiconductor substrate IN and electrically connected to the plurality of pixels and an electrode E5 disposed on a side of a principal surface 20a of a mount substrate 20 are connected to each other via a bonding wire W1 inserted through the through-hole TH.
摘要:
A semiconductor device, for example a drift detector, comprises a piece of semiconductor material. On a surface of said piece of semiconductor material, a number of electrodes (1013, 1014) exist and are configured to assume different electric potentials. A guard structure comprises a two-dimensional array of conductive patches (1012), at least some of which are left to assume an electric potential under the influence of electric potentials existing at said electrodes. The guard structure controllably lowers an electric potential on the surface of the semiconductor material, which is advantageous from the manufacturing point of view and offers versatility in designing the other features of the semiconductor device.
摘要:
High-voltage solid-state transducer (SST) devices and associated systems and methods are disclosed herein. An SST device in accordance with a particular embodiment of the present technology includes a carrier substrate, a first terminal, a second terminal and a plurality of SST dies connected in series between the first and second terminals. The individual SST dies can include a transducer structure having a p-n junction, a first contact and a second contact. The transducer structure forms a boundary between a first region and a second region with the carrier substrate being in the first region. The first and second terminals can be configured to receive an output voltage and each SST die can a forward junction voltage less than the output voltage.
摘要:
The present invention provides a radiation detector UBM electrode structure body and a radiation detector which suppress the degradation of metal electrode layers at the time of formation of UBM layers and achieve sufficient electric characteristics, and a method of manufacturing the same. A radiation detector UBM electrode structure body according to the present invention includes a substrate made of CdTe or CdZnTe, comprising a Pt or Au electrode layer formed on the substrate by electroless plating, an Ni layer formed on the Pt or Au electrode layer by sputtering, and an Au layer formed on the Ni layer by sputtering.