公开(公告)号：US20100148087A1

公开(公告)日：2010-06-17

申请号：US12635140

申请日：2009-12-10

Applicant: Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

Inventor： Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

IPC: G21K5/10

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0492

Abstract: The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (91) with a plurality of individually shaped, controllable particle beamlets (118) which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility. According to the invention, this object is met in that a first aperture diaphragm array and a second aperture diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets (118) with different beam cross sections, and at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets (118) are associated with the first multiple-format diaphragm array (41) and with the second multiple-format diaphragm array (42), wherein at least one multibeam deflector array (51) is arranged between the first multiple-format diaphragm array (41) and the second multiple-format diaphragm array (42) in order to generate different cross sections of the particle beamlets (118), at least a second multibeam deflector array (52) is arranged in the vicinity of the second multiple-format diaphragm array (42) in order to blank or deflect individual particle beamlets (118) into individual crossovers, and at least a third multibeam deflector array (53) is arranged downstream of the second multiple-format diaphragm array (42) at a distance of 10-20% of the distance to the next crossover (112) in order to generate different positions of the particle beamlets (118) on the substrate (91).

公开(公告)号：US07349106B2

公开(公告)日：2008-03-25

申请号：US10777162

申请日：2004-02-13

Applicant: Matthias Slodowski

Inventor： Matthias Slodowski

IPC: G01B11/28 ,  G01B11/06 ,  G01B11/08 ,  G01B11/04 ,  G01B11/02 ,  G01N21/00 ,  G06K9/00

CPC classification number: H01L21/67207 ,  H01L21/67253

Abstract: An apparatus (1) and a method for thin-layer metrology of semiconductor substrates (16) are disclosed. The semiconductor substrates (16) are delivered or transported to the apparatus (1) by means of at least one cassette element. A measurement unit (5) for thin-layer micrometrology is provided in the apparatus (1), the semiconductor substrates being conveyed by means of a transport mechanism (7) from the cassette element (3) to the measurement unit (5) for thin-layer micrometrology. A measurement unit (9) for thin-layer macrometrology is provided in the region of the transport mechanism (7) after the cassette element (3). By means of the measurement unit (9) for thin-layer macrometrology, measurement locations (22) on the semiconductor substrate that require more detailed examination in the measurement unit (5) for thin-layer micrometrology can rapidly be identified.

Abstract translation: 公开了一种用于半导体衬底（16）的薄层计量的装置（1）和方法。 半导体衬底（16）通过至少一个盒式元件被输送或传送到设备（1）。 在装置（1）中提供用于薄层微观测量的测量单元（5），半导体衬底通过传送机构（7）从盒式元件（3）传送到测量单元（5），用于薄型 层微观学。 在盒式元件（3）之后，在传送机构（7）的区域中设置用于薄层宏观测量的测量单元（9）。 通过用于薄层宏观测量的测量单元（9），可以快速地识别半导体衬底上需要在用于薄层微观测量的测量单元（5）中进行更详细检查的测量位置（22）。

公开(公告)号：US06618154B2

公开(公告)日：2003-09-09

申请号：US09846331

申请日：2001-05-02

Applicant: Horst Engel ,  Hakon Mikkelsen ,  Lambert Danner ,  Matthias Slodowski ,  Kuno Backhaus ,  Joachim Wienecke

Inventor： Horst Engel ,  Hakon Mikkelsen ,  Lambert Danner ,  Matthias Slodowski ,  Kuno Backhaus ,  Joachim Wienecke

IPC: G01B902

CPC classification number: G01B11/0625

Abstract: The invention refers to an optical measurement arrangement, in particular for layer thickness measurement and for ascertaining optical material properties such as refractive index, extinction factor, etc. of a specimen (P), having an illumination device (1) for emitting a measurement light beam (6), a beam splitter (8) for dividing the measurement light beam (6) into a specimen light beam (10) and a reference light beam (9), a measurement objective for directing the specimen light beam (10) onto a measurement location (M) on the surface of the specimen (P) and for acquiring the light reflected from the measurement location (M), and an analysis device (11) into which the reference light beam (9) and the specimen light beam (10) reflected from the specimen (P) are coupled in order to obtain information about the specimen (P), in particular about layer thicknesses present thereon. Light-guiding devices (23, 25) having a plurality of light-guiding fibers are provided for coupling the specimen light beam (10) and the reference light beam (9) into the analysis device (11). The result is to create a compact optical measurement arrangement that can be flexibly set up and is insensitive to disturbance, which is suitable in particular for automatic monitoring of continuous production processes, in particular in semiconductor chip manufacture.

公开(公告)号：US07277190B2

公开(公告)日：2007-10-02

申请号：US10780759

申请日：2004-02-19

Applicant: Matthias Slodowski ,  Detlef Wolter

Inventor： Matthias Slodowski ,  Detlef Wolter

IPC: G01B11/28 ,  G01N21/86 ,  G01V8/00 ,  B60Q3/04 ,  F21V1/00 ,  F21V11/00 ,  F21V15/00

CPC classification number: G01N21/8806 ,  G01B11/0625 ,  G01N21/9501

Abstract: The invention concerns an optical measurement arrangement, in particular for the examination of layer systems, and can include an illumination device having at least one illumination source for delivering a measurement light beam and coupling the measurement light beam into the beam path of a layer thickness measuring instrument. In such a measurement arrangement, the illumination device can be housed in a lamp housing that may be detachably connected to the remaining portion of the measurement arrangement via an installation element wherein illumination sources can be prealigned with respect to the beam path.

Abstract translation: 本发明涉及光学测量装置，特别是用于层系统的检查，并且可以包括具有至少一个照明源的照明装置，用于传送测量光束并将测量光束耦合到层厚测量的光束路径中 仪器。 在这种测量装置中，照明装置可以被容纳在灯壳体中，该灯壳体可经由安装元件可拆卸地连接到测量装置的其余部分，其中照明源可以相对于光束路径预先对准。

公开(公告)号：US06775583B2

公开(公告)日：2004-08-10

申请号：US09900457

申请日：2001-07-09

Applicant: Matthias Slodowski ,  Karl-Heinz Irmer

Inventor： Matthias Slodowski ,  Karl-Heinz Irmer

IPC: G06F1900

CPC classification number: G01N21/956 ,  C02F1/441 ,  G01N21/9501 ,  G01N2021/213 ,  G05B19/00 ,  G05B2219/37212 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method, apparatus, and software for guiding users during optical inspection and measurement of coated and noncoated substrates with an optical measurement system is provided. The optical measurement system incorporates an integrated recipe and data browser with sortable features to facilitate the optical inspection and measurement by the user.

Abstract translation: 提供了一种用于在使用光学测量系统的光学检查和测量涂覆和非涂覆的基板期间引导用户的方法，装置和软件。 光学测量系统结合了综合配方和数据浏览器，具有可排序的特征，便于用户进行光学检测和测量。

公开(公告)号：US08148702B2

公开(公告)日：2012-04-03

申请号：US12635140

申请日：2009-12-10

Applicant: Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

Inventor： Hans-Joachim Doering ,  Thomas Elster ,  Joachim Heinitz ,  Matthias Slodowski

IPC: G03F7/00 ,  G21K5/04 ,  H01J29/00 ,  H01J37/147

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0492

Abstract: The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate with a plurality of individually shaped, controllable particle beamlets which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility.

Abstract translation: 本发明涉及用于照射具有多个单独成形的可控粒子束的衬底的布置，特别是用于半导体工业中的电子束光刻。 本发明的目的是找到用多个单独成形的可控粒子束照射衬底的新型可能性，其允许具有高衬底生产能力的衬底的高分辨率结构化而不限制适用结构图案的柔性， 由于所需的灵活性，限制了高的基板产量。

公开(公告)号：US06456373B1

公开(公告)日：2002-09-24

申请号：US09705931

申请日：2000-11-06

Applicant: Joachim Wienecke ,  Kuno Backhaus ,  Detlef Wolter ,  Matthias Slodowski ,  Horst-Dieter Jaritz

Inventor： Joachim Wienecke ,  Kuno Backhaus ,  Detlef Wolter ,  Matthias Slodowski ,  Horst-Dieter Jaritz

IPC: G01J142

CPC classification number: H05B37/03

Abstract: In a method for monitoring the measurement light emitted from an illumination apparatus for an optical measuring instrument, a continuous sensing of measurement light parameters is performed. The sensed measurement light parameters are compared to predefined setpoints. Any deviation from the predefined parameter ranges associated with the setpoints is signaled. This signal is used to initiate a lamp exchange on the illumination apparatus, which has multiple lamps that can be selectively switched on and off individually or in groups. Also described is a corresponding illumination apparatus that preferably performs a lamp exchange automatically. The result is to identify a point in time for a lamp change that is optimal with regard to measurement accuracy and the longest possible utilization of the lamps, so that a measurement light quality that remains consistent during continuous operation can reliably be maintained within predefined tolerance ranges.

Abstract translation: 在用于监测从光学测量仪器的照明装置发射的测量光的方法中，执行测量光参数的连续感测。 将感测的测量光参数与预定义的设定值进行比较。 发出与设定值相关联的预定义参数范围的任何偏差。 该信号用于在照明装置上启动灯交换，其具有可以单独或分组地选择性地打开和关闭的多个灯。 还描述了一种相应的照明装置，其优选地自动执行灯交换。 其结果是识别关于测量精度和灯的最长可能利用最佳的灯变化的时间点，使得在连续操作期间保持一致的测量光质量可以可靠地保持在预定义的公差范围内 。