EXCIPIENT COMPATIBILITY WITH EZATIOSTAT
    1.
    发明申请
    EXCIPIENT COMPATIBILITY WITH EZATIOSTAT 审中-公开
    与EZATIOSTAT的特殊兼容性

    公开(公告)号:US20120283325A1

    公开(公告)日:2012-11-08

    申请号:US13449432

    申请日:2012-04-18

    申请人: Robert T. Lum

    发明人: Robert T. Lum

    IPC分类号: A61K31/216 A61P7/00

    CPC分类号: A61K31/222 A61K9/2018

    摘要: Disclosed herein is the surprising and unexpected discovery that mannitol inhibits the growth of impurities and enhances shelf life of ezatiostat hydrochloride formulations.

    摘要翻译: 本文公开了令人惊讶和意想不到的发现,即甘露醇抑制杂质生长并增加盐酸还原剂制剂的保质期。

    Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching
    4.
    发明授权
    Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching 失效
    钨CMP具有改进的对准标记完整性,边缘残留减少,并且减少保持环凹口

    公开(公告)号:US06468136B1

    公开(公告)日:2002-10-22

    申请号:US09606666

    申请日:2000-06-30

    IPC分类号: B24B100

    摘要: Tungsten CMP is conducted with improved alignment mark integrity and reduced edge residue by employing a retaining ring having a mechanical hardness greater than about 85 durometer and a relatively soft polishing pad. Embodiments of the present invention include conducting CMP employing a carrier comprising a retaining ring additionally having a wear rate during CMP of less than about 1 mil per hour and a polishing pad having a hardness less than about 60 durometer. Suitable retaining ring materials include ceramics, quartz, polymers and fiber reinforced polymers.

    摘要翻译: 通过采用具有大于约85硬度的机械硬度的保持环和相对柔软的抛光垫,进行钨CMP的改进的对准标记完整性和降低的边缘残余。 本发明的实施例包括使用载体的CMP进行导电,该载体包括另外在CMP期间磨损率小于约1密耳/小时的保持环和硬度小于约60硬度的抛光垫。 合适的保持环材料包括陶瓷,石英,聚合物和纤维增强聚合物。