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公开(公告)号：US5609988A
公开(公告)日：1997-03-11
申请号：US229746
申请日：1994-04-19
IPC分类号： G02B5/20 , G03F7/004 , G03F7/038 , H01L21/027 , G03C1/492
CPC分类号： G03F7/038 , G03F7/0045
摘要： A radiation sensitive resin composition useful as a negative type resist which can form a resist pattern having a good shape, has so high acid resistance as not to be affected by an etchant and a high adhesion to the substrate, and is endowed with so high a strippability as to be easily dissolved in a stripping solution consisting of an organoalkali. Said composition comprises (1) 100 parts by weight of an alkali-soluble novolak resin having a polystyrene reduced weight average molecular weight of 1,000 to 10,000, (2) 1 to 10 parts by weight of a compound having a methylol group and/or an alkoxymethyl group and being capable of cross-linking the alkali-soluble novolak resin (1) in the presence of an acid, and (3) 0.01 to 5 parts by weight of a radiation sensitive acid-generating agent represented by formula (I): ##STR1##
摘要翻译： 作为能够形成具有良好形状的抗蚀剂图案的负型抗蚀剂的辐射敏感性树脂组合物具有如此高的耐酸性，不受蚀刻剂的影响和与基材的高粘合性，并且具有如此高的 剥离性易于溶解在由有机碱组成的剥离溶液中。 所述组合物包含（1）100重量份的聚苯乙烯换算的重均分子量为1,000至10,000的碱溶性酚醛清漆树脂，（2）1至10重量份的具有羟甲基和/或 并且能够在酸存在下交联碱溶性酚醛清漆树脂（1），和（3）0.01至5重量份由式（I）表示的辐射敏感性酸产生剂： （一）
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公开(公告)号：US5580695A
公开(公告)日：1996-12-03
申请号：US339289
申请日：1994-11-10
申请人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
发明人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
CPC分类号： G03F7/0045 , Y10S430/118 , Y10S430/121
摘要： A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist. Said resist is superior in developability, pattern form, resolution, focus tolerance and yield of residual film thickness, has good process stability, and can be suitably used even in irradiation with, in particular, a radiation having a wavelength equal to or smaller than far ultraviolet rays, for example, an excimer laser or the like.
摘要翻译： 一种化学放大抗蚀剂，其包含碱溶性树脂或具有至少一种酸解离基团的树脂，所述酸解离基团是由于酸而导致的所述酸解离基团的解离时为碱不溶性或易溶性但是变得碱溶性的; 辐射敏感的酸产生剂; 以及任选的组分，其中抗辐射敏感的酸产生剂在照射部分中的辐射照射时产生酸，并且树脂组分和任选组分在显影溶液中的溶解度在照射部分中变化 由酸的催化作用引起的化学反应，由此形成图案，其特征在于在抗蚀剂中含有具有含氮碱性基团的化合物。 所述抗蚀剂的显影性，图案形式，分辨率，聚焦容限和残留膜厚度的产率优异，具有良好的工艺稳定性，并且可以适用于特别是具有等于或小于远的波长的辐射 紫外线，例如准分子激光等。
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公开(公告)号：US5494777A
公开(公告)日：1996-02-27
申请号：US229677
申请日：1994-04-19
申请人： Shinji Shiraki , Hidetoshi Miyamoto , Masaaki Inoue , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
发明人： Shinji Shiraki , Hidetoshi Miyamoto , Masaaki Inoue , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
CPC分类号： G03F7/038 , G03F7/0045
摘要： A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.
摘要翻译： 适合用作具有高灵敏度，高分辨率，高残留膜厚度和高耐热性的负型抗蚀剂的辐射敏感性树脂组合物，其包含（A）碱溶性酚醛清漆树脂（ B）具有标准聚苯乙烯换算的重均分子量为10,000以下的酚类化合物，例如聚乙烯基苯酚，（C）能够在（A）成分和/或（B）成分的存在下交联的化合物 酸和（D）辐射敏感性酸产生剂，例如具有卤代甲基的三嗪化合物。
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公开(公告)号：US5482816A
公开(公告)日：1996-01-09
申请号：US263421
申请日：1994-06-21
申请人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
发明人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, develop-ability, adhesiveness, heat resistance and yield of residual film thickness.
摘要翻译： 一种辐射敏感性组合物，其包含（A）具有由式（1）表示的重复单元的聚合物：其中R1表示取代的甲基，取代的乙基，甲硅烷基，甲锗烷基或 烷氧基羰基，R 2表示-OR 3或-NR 4 R 5，其中R 3为氢原子，直链烷基，环烷基，芳基，芳烷基，取代甲基，取代乙基， 甲硅烷基，甲锗烷基或烷氧基羰基，R 4和R 5可以相同或不同，为氢原子，直链烷基，环烷基，芳烷基或芳基，（B）辐射 敏感性酸形成剂。 所述辐射敏感性组合物可以适当地用作能够进行可靠的精细加工的抗蚀剂组合物，其具有高灵敏度和高分辨度，并且其耐干蚀刻性，显影性，粘合性，耐热性和残留膜的产率优异 厚度。
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5.发明授权Reflection preventing film and process for forming resist pattern using the same 失效防反射膜和使用其形成抗蚀剂图案的工艺
公开(公告)号：US5410005A
公开(公告)日：1995-04-25
申请号：US105622
申请日：1993-08-13
申请人： Hiroaki Nemoto , Takayoshi Tanabe , Yoshiji Yumoto , Takao Miura
发明人： Hiroaki Nemoto , Takayoshi Tanabe , Yoshiji Yumoto , Takao Miura
CPC分类号： G03F7/091
摘要： A reflection preventing film comprising a copolymer, its salt or both of them, the copolymer having at least one recurring unit selected from the group consisting of recurring units represented by formulas (1) and (2) and at least one recurring unit represented by formula (3): ##STR1## wherein R.sup.1 -R.sup.4 which may be the same as or different from one another, represent hydrogen atoms or organic groups and X represents a carboxyl group or a sulfo group, ##STR2## wherein R.sup.5 represents a hydrogen atom or an organic group, A represents a fluoroalkyl group and Y represents an alkylene group or a fluoroalkylene group. The reflection preventing film is formed on a resist film before irradiation in the formation of a resist pattern, thereby preventing the radiation reflected on the substrate from re-reflecting at the upper interface of the resist film to provide a resist pattern excellent in resolution, developability and pattern form.
摘要翻译： 一种包含共聚物，其盐或两者的防反射膜，所述共聚物具有至少一个选自由式（1）和（2）表示的重复单元的重复单元和至少一个由式 （3）：其中可以相同或不同的R 1 -R 4表示氢原子或有机基团，X表示羧基或磺基， （3）其中，R5表示氢原子或有机基团，A表示氟代烷基，Y表示亚烷基或氟代亚烷基。 防反射膜在形成抗蚀剂图案的照射之前形成在抗蚀剂膜上，从而防止反射在基板上的辐射在抗蚀剂膜的上界面处再反射，从而提供分辨率，显影性优异的抗蚀剂图案 和图案形式。
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6.发明授权Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same 失效溶剂可溶性有机倍半硅氧烷，其制造方法和使用其的半导体
公开(公告)号：US4626556A
公开(公告)日：1986-12-02
申请号：US779617
申请日：1985-09-25
CPC分类号： H01L21/02137 , C08G77/06 , C08G77/20 , C08K5/0025 , G03F7/0757 , H01B3/465 , H01L21/02282 , H01L21/02345 , H01L21/3122
摘要： A novel raddery organopolysilsesquioxane having lower alkyl groups and alkenyl groups as the side chains and, if necessary, having aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalogenosilane, an alkenyltrihalogenosilane, and, if necessary, an aryltrihalogenosilane and/or a trihalogenosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, in the form of a mixture with a compound which generates crosslinking-reaction-active species upon irradiation with light or an ionizing radiation.
摘要翻译： 具有低级烷基和烯基作为侧链的新型有机聚硅氧烷倍半硅氧烷，如果需要，可以通过将低级烷基三卤代硅烷，链烯基三卤代硅烷 ，如果需要，在有机溶剂中加入芳基三卤代硅烷和/或三卤代硅烷，并加热所得混合物。 上述有机聚倍半硅氧烷可以用于形成用于半导体器件的图案化表面保护层或绝缘层，其形式为与在光照射或电离辐射下产生交联反应活性物质的化合物的混合物。
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公开(公告)号：US6048659A
公开(公告)日：2000-04-11
申请号：US165096
申请日：1998-10-02
申请人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
发明人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
CPC分类号： G03F7/0048 , G03F7/022
摘要： A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.
摘要翻译： 提供了包含（1）碱溶性树脂，（2）醌二叠氮化合物和（3）含有7-14个碳原子的单酮和烷氧基丙酸烷基酯的混合溶剂的辐射敏感性树脂组合物。 组合物可以以小的涂层重量以均匀的厚度涂覆。 该组合物具有高灵敏度和高分辨率，并且还能够形成具有较少图案缺陷的优异图案形状的抗蚀剂图案。 因此，它适合作为正性抗蚀剂。
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公开(公告)号：US5958645A
公开(公告)日：1999-09-28
申请号：US917727
申请日：1997-08-27
CPC分类号： G03F7/0226
摘要： A radiation-sensitive resin composition comprising:(i) an alkali-soluble resin;(ii) a phenol compound represented by the following formula (1): ##STR1## wherein R.sub.1 to R.sub.4 each represent halogen, alkyl, alkoxyl, aryl, nitro, cyano, hydroxyalkyl, hydroxyalkoxyl or hydroxyl; a, b, c and d each represent an integer of 0 to 4 and satisfying 0.ltoreq.a+b.ltoreq.4 and 0.ltoreq.c+d.ltoreq.4, provided that when a+b is 1 and c+d is 1 at least one of R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) is alkyl, hydroxyalkyl or hydroxyalkoxyl; R.sub.5 to R.sub.10 each represent hydrogen, alkyl or aryl; and X.sub.1 and X.sub.2 each represent oxygen or sulfur atom; and(iii) a 1,2-quinonediazide compound. This composition has good resolution, sensitivity and developability, as well as has as a positive resist good focal latitude and heat resistance. The patterns formed have good shapes, and the composition may cause no fine particles during storage.
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公开(公告)号：US5332650A
公开(公告)日：1994-07-26
申请号：US941264
申请日：1992-09-04
申请人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
发明人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5 which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, developability, adhesiveness, heat resistance and yield of residual film thickness.
摘要翻译： 一种辐射敏感性组合物，其包含（A）具有由式（1）表示的重复单元的聚合物：其中R1表示取代的甲基，取代的乙基，甲硅烷基，甲锗烷基或 烷氧基羰基，R 2表示-OR 3或-NR 4 R 5，其中R 3为氢原子，直链烷基，环烷基，芳基，芳烷基，取代甲基，取代乙基， 甲硅烷基，甲锗烷基或烷氧基羰基，R 4和R 5可以相同或不同，为氢原子，直链烷基，环烷基，芳烷基或芳基，（B） 敏感的酸成型剂。 所述辐射敏感性组合物可以适当地用作能够进行可靠的精细加工的抗蚀剂组合物，其具有高灵敏度和高分辨度，并且其耐干蚀刻性，显影性，粘合性，耐热性和残留膜厚度的产率优异。
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公开(公告)号：US5893861A
公开(公告)日：1999-04-13
申请号：US817538
申请日：1997-04-23
申请人： Yoshiji Yumoto
发明人： Yoshiji Yumoto
IPC分类号： A61B17/32
CPC分类号： A61B17/32 , A61B17/320036
摘要： A surgical knife of the present invention can be safely and correctly used for cutting open tendon sheaths so as to treat trigger fingers, so the surgical knife comprises: a shaft section (12) being extended from a grip section (10); a blade section (14) being sidewardly extended from a side face of the shaft section (12); and a guide section (16) being sidewardly extended, in the direction the same as the extended direction of the blade section (14), from a lower part of the blade section (14), wherein the blade section (14) includes: an arc blade (K) being provided in a connecting part to the guide section (16) and being formed into an arc shape which is smoothly connected to the guide section (16); and a linear blade (J, H) being linearly formed and parallel to the shaft section (12).
摘要翻译： PCT No.PCT / JP96 / 02668 Sec。 371日期1997年4月23日 102（e）日期1997年4月23日PCT提交1996年9月17日PCT公布。 公开号WO97 / 10761 日期1997年3月27日本发明的手术刀可以安全地和正确地用于切割开放的肌腱鞘以便治疗触发指，因此外科手术刀包括：轴部分（12），其从握持部分（10 ）; 叶片部分（14），其从所述轴部分（12）的侧面向侧面延伸; 以及从所述叶片部分（14）的下部沿与叶片部分（14）的延伸方向相同的方向向侧延伸的引导部分（16），其中所述叶片部分（14）包括： 弧形刀片（K）设置在与引导部分（16）的连接部分中并且形成为平滑地连接到引导部分（16）的弧形; 和线性叶片（J，H）线性地形成并平行于轴部分（12）。
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