公开(公告)号：US09005874B2

公开(公告)日：2015-04-14

申请号：US13449727

申请日：2012-04-18

Applicant: Yoshitaka Komuro ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Masatoshi Arai

Inventor： Yoshitaka Komuro ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Masatoshi Arai

IPC: G03F7/029 ,  G03F7/039 ,  C07C69/533 ,  C08F220/18 ,  C07C381/12 ,  C07C309/12 ,  C07C309/19 ,  C07C309/42 ,  C07C309/43 ,  C07C311/09 ,  C07C311/48 ,  C07D307/93 ,  C07D493/18 ,  C08F220/28 ,  C08F228/02 ,  G03F7/004 ,  G03F7/20

CPC classification number: C07C381/12 ,  C07C309/12 ,  C07C309/19 ,  C07C309/42 ,  C07C309/43 ,  C07C311/09 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D307/93 ,  C07D493/18 ,  C08F220/28 ,  C08F228/02 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S522/904

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,

Abstract translation: 提供了一种新型化合物，高分子化合物，抗蚀剂组合物，酸产生剂和由通式（1-1）表示的化合物形成抗蚀剂图案的方法：其中R 1和R 3各自独立地表示单键或 二价连接基团; A表示二价连接基团; R2和R4各自独立地表示羟基，可以具有取代基的烃基或由通式（1-an1），（1-an2）或（1-an3）表示的基团），条件是至少一个 R 2和R 4表示由通式（1-an1），（1-an2）或（1-an3）表示的基团。 n0优选为0或1，并且其中Y1表示单键或-SO2-; R5表示1〜10个碳原子的直链或支链一价烃基，3〜20个碳原子的环状一价烃基或具有可被氟原子取代的环状部分结构的3〜20个碳原子的一价烃基; M +表示有机阳离子或金属阳离子，

公开(公告)号：US20120282551A1

公开(公告)日：2012-11-08

申请号：US13402820

申请日：2012-02-22

Applicant: Kensuke MATSUZAWA ,  Jun IWASHITA ,  Yoshitaka KOMURO ,  Masatoshi ARAI

Inventor： Kensuke MATSUZAWA ,  Jun IWASHITA ,  Yoshitaka KOMURO ,  Masatoshi ARAI

IPC: C08F228/06 ,  C08F228/02 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  C08F228/06 ,  C08F2220/382 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2039 ,  G03F7/38

Abstract: A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.

Abstract translation: 一种抗蚀剂组合物，其包含在曝光后产生酸的树脂组分，并且在酸的作用下在显影液中显示出改变的溶解性，所述树脂组分包括具有由通式（a0-0-1）表示的结构单元的树脂组分 其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基，R 0-1表示单键或二价连接基团，R 2，R 3和R 4各自 独立地表示可以具有非芳香族取代基的直链状，支链状或环状的烷基，或者R3和R4可以与硫原子一起形成环，X表示非芳香族二价连接基团或 单一债券。

公开(公告)号：US20120015299A1

公开(公告)日：2012-01-19

申请号：US13179864

申请日：2011-07-11

Applicant: Yoshitaka Komuro ,  Yoshiyuki Utsumi

Inventor： Yoshitaka Komuro ,  Yoshiyuki Utsumi

IPC: G03F7/039 ,  C07D313/06 ,  G03F7/30

CPC classification number: C07D313/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2041

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) [in the formula, Y0 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group, R0 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group or an oxygen atom (═O); p represents 0 or 1; and Z+ represents an organic cation.

Abstract translation: 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）表示的化合物（b1）[式中，Y0表示碳原子数为1〜4的亚烷基或氟化亚烷基，R0表示烷基，烷氧基，卤素原子，卤代 烷基，羟基或氧原子（= O）; p表示0或1; Z +表示有机阳离子。

公开(公告)号：US20120148956A1

公开(公告)日：2012-06-14

申请号：US13313990

申请日：2011-12-07

Applicant: Yoshiyuki UTSUMI ,  Masaru TAKESHITA ,  Hiroaki SHIMIZU ,  Syo ABE ,  Yoshitaka Komuro

Inventor： Yoshiyuki UTSUMI ,  Masaru TAKESHITA ,  Hiroaki SHIMIZU ,  Syo ABE ,  Yoshitaka Komuro

IPC: G03F7/20 ,  G03F7/004 ,  G03F7/027

CPC classification number: G03F7/0397 ,  G03F7/0045

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).

Abstract translation: 一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸 发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的 或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。

公开(公告)号：US20100297560A1

公开(公告)日：2010-11-25

申请号：US12781540

申请日：2010-05-17

Applicant: Takehiro SESHIMO ,  Yoshiyuki UTSUMI ,  Yoshitaka KOMURO ,  Takeyoshi MIMURA ,  Daichi TAKAKI

Inventor： Takehiro SESHIMO ,  Yoshiyuki UTSUMI ,  Yoshitaka KOMURO ,  Takeyoshi MIMURA ,  Daichi TAKAKI

IPC: G03F7/004 ,  G03F7/20 ,  C08F216/12

CPC classification number: G03F7/0045 ,  C08F8/34 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F220/18 ,  C08F220/28 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/14 ,  C08F212/32

Abstract: A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein represents an anion moiety represented by one of general formulas (1) to (5)).

Abstract translation: 一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包含具有结构单元的聚合物（A1'） 由通式（a5-1）表示的（a5-1），由通式（a0-1）表示的结构单元（a0-1）和曝光时产生酸的结构单元（a0-2），结构单元 （a0-2'）表示的基团（a0-2）（其中，表示由通式（1）〜（5）中的一个表示的阴离子部分）。

公开(公告)号：US09104101B2

公开(公告)日：2015-08-11

申请号：US13402820

申请日：2012-02-22

Applicant: Kensuke Matsuzawa ,  Jun Iwashita ,  Yoshitaka Komuro ,  Masatoshi Arai

Inventor： Kensuke Matsuzawa ,  Jun Iwashita ,  Yoshitaka Komuro ,  Masatoshi Arai

IPC: G03F7/004 ,  G03F7/38 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  C08F228/06 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  C08F228/06 ,  C08F2220/382 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2039 ,  G03F7/38

Abstract: A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.

Abstract translation: 一种抗蚀剂组合物，其包含在曝光后产生酸的树脂组分，并且在酸的作用下在显影液中显示出改变的溶解性，所述树脂组分包括具有由通式（a0-0-1）表示的结构单元的树脂组分 其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基，R 0-1表示单键或二价连接基团，R 2，R 3和R 4各自 独立地表示可以具有非芳香族取代基的直链状，支链状或环状的烷基，或者R3和R4可以与硫原子一起形成环，X表示非芳香族二价连接基团或 单一债券。

公开(公告)号：US08497395B2

公开(公告)日：2013-07-30

申请号：US13313993

申请日：2011-12-07

Applicant: Yoshiyuki Utsumi ,  Masaru Takeshita ,  Yoshitaka Komuro

Inventor： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Yoshitaka Komuro

IPC: C07C211/00

CPC classification number: C07C311/09 ,  C07C381/12 ,  C07C2601/08 ,  C07C2603/74 ,  C07D307/33 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0397

Abstract: A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).

Abstract translation: 由通式（c1）表示的化合物（R1表示可以具有取代基的碳原子数为5以上的脂环式基团; X表示二价连接基团; Y表示直链状，支链状或环状的亚烷基或亚芳基） 表示含氟原子的烃基; M +表示有机阳离子或金属阳离子）。

公开(公告)号：US07858287B2

公开(公告)日：2010-12-28

申请号：US11947850

申请日：2007-11-30

Applicant: Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

Inventor： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  G08F12/30

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X−represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

Abstract translation: 感光性树脂可以形成具有良好形状的图案，而不会导致酸产生剂和具有酸解离基团的光致抗蚀剂初级组分聚合物之间的相容性差，以及含有感光性树脂的感光性组合物。 光敏树脂包括由式（1）表示的重复单元：（其中R1表示C2-C9直链或支链二价烃基; R2至R5各自表示氢原子或C1-C3直链或支链烃基; R6和R7表示有机基团，其中R6和R7可以一起形成二价有机基团; X代表阴离子）; 由式（2）表示的重复单元中的至少一种：其中R8表示C2-C9直链或支链烃基）和由式（3）表示的重复单元：式（4）表示的重复单元：任选地 ，式（5）表示的重复单元。

公开(公告)号：US09017919B2

公开(公告)日：2015-04-28

申请号：US13282920

申请日：2011-10-27

Applicant: Yoshiyuki Utsumi ,  Akiya Kawaue ,  Yoshitaka Komuro ,  Kenichiro Miyashita

Inventor： Yoshiyuki Utsumi ,  Akiya Kawaue ,  Yoshitaka Komuro ,  Kenichiro Miyashita

IPC: G03F7/004 ,  C07D307/00 ,  C07D327/02 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07D307/00 ,  C07D327/02 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/115

Abstract: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.

Abstract translation: 一种抗蚀剂组合物，其含有在酸的作用下在显影液中显示出改变的溶解性的碱成分（A）和暴露时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸发生剂 （B1）在阳离子部分具有下述通式（b1-1）表示的基团。

公开(公告)号：US08298748B2

公开(公告)日：2012-10-30

申请号：US12781540

申请日：2010-05-17

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Takeyoshi Mimura ,  Daichi Takaki

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Takeyoshi Mimura ,  Daichi Takaki

IPC: G03F7/004 ,  C08F228/02

CPC classification number: G03F7/0045 ,  C08F8/34 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F220/18 ,  C08F220/28 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/14 ,  C08F212/32

Abstract: A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein X− represents an anion moiety represented by one of general formulas (1) to (5)).

Abstract translation: 一种正性抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出增加的溶解性并在曝光时产生酸的基础组分（A'），所述基础组分（A'）包含具有结构单元的聚合物（A1'） 由通式（a5-1）表示的（a5-1），由通式（a0-1）表示的结构单元（a0-1）和曝光时产生酸的结构单元（a0-2），结构单元 （a0-2'）表示的基团（a0-2）（式中，X表示由通式（1）〜（5）中的一个表示的阴离子部分）。