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公开(公告)号：US08866110B2
公开(公告)日：2014-10-21
申请号：US14199261
申请日：2014-03-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor V. Fomenkov , Daniel J. W. Brown
IPC: H05G2/00
Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
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公开(公告)号：US10966308B2
公开(公告)日：2021-03-30
申请号：US15208548
申请日：2016-07-12
Applicant: ASML NETHERLANDS B.V.
Inventor： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
IPC: H05G2/00
Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
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公开(公告)号：US09669334B2
公开(公告)日：2017-06-06
申请号：US14674724
申请日：2015-03-31
Applicant: ASML Netherlands B.V.
Inventor： Igor V. Fomenkov , William N. Partlo , Gregory O. Vaschenko , William Oldham
Abstract: A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
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公开(公告)号：US09155179B2
公开(公告)日：2015-10-06
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US20140299791A1
公开(公告)日：2014-10-09
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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Patent Agency Ranking
公开(公告)号：US20180330841A1
公开(公告)日：2018-11-15
申请号：US15593732
申请日：2017-05-12
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , John Tom Stewart, IV , Igor V. Fomenkov , Christianus W.J. Berendsen
Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.
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公开(公告)号：US10128017B1
公开(公告)日：2018-11-13
申请号：US15593732
申请日：2017-05-12
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , John Tom Stewart, IV , Igor V. Fomenkov , Christianus W. J. Berendsen
Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.
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公开(公告)号：US20150257246A1
公开(公告)日：2015-09-10
申请号：US14658417
申请日：2015-03-16
Applicant: ASML Netherlands B.V.
Inventor： Vladimir B. Fleurov , Igor V. Fomenkov
IPC: H05G2/00
Abstract: A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor; and an electronic processor coupled to a computer-readable storage medium, the medium storing instructions that, when executed, cause the processor to: receive data from the first sensor and the second sensor, and determine, based on the received data, a location of the irradiating amplified light beam relative to the target material in more than one dimension.
Abstract translation: 用于极紫外光源的系统包括一个或多个定位成接收反射放大光束并将反射的放大光束引导到第一，第二和第三通道中的光学元件，反射的放大光束至少包括至少 与目标材料相互作用的照射放大光束的一部分; 感测来自第一通道的光的第一传感器; 第二传感器，其感测来自第二通道和第三通道的光，第二传感器具有比第一传感器低的采集速率; 以及耦合到计算机可读存储介质的电子处理器，所述介质存储指令，所述指令在被执行时使得所述处理器：从所述第一传感器和所述第二传感器接收数据，并且基于所接收的数据确定位置 在多于一个维度上相对于目标材料照射放大的光束。
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公开(公告)号：US20150076374A1
公开(公告)日：2015-03-19
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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10.发明授权公开(公告)号：US09832852B1
公开(公告)日：2017-11-28
申请号：US15343768
申请日：2016-11-04
Applicant: ASML Netherlands B.V.
Inventor： Igor V. Fomenkov , Robert Jay Rafac
CPC classification number: H05G2/006 , H01S3/10069 , H01S3/107 , H01S3/11 , H01S3/136 , H01S3/2232 , H01S3/2308 , H01S2301/08 , H05G2/003 , H05G2/008
Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source. Each laser pulse is modulated to be of a width that is determined to be sufficient to allow for extraction of a suitable uniform amount of energy in the laser source gain medium; in some embodiments the suitable uniform amount of energy to be extracted may be selected to avoid self-lasing. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, and a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. The energy of the next pulse is modulated, either by modulating its magnitude or by modulating the amplification of the pulse by one or more amplifiers, but without decreasing the determined width of the laser pulse.
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