公开(公告)号：US20100238311A1

公开(公告)日：2010-09-23

申请号：US12161187

申请日：2007-01-16

申请人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H04N5/228

CPC分类号： G02B27/46 ,  G02B27/58 ,  G06E3/00

摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.

摘要翻译： 用于形成样本物体的图像的成像装置包括光学装置和处理单元。 光学器件捕获对象的傅里叶谱。 处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像 和参考对象。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US07671973B2

公开(公告)日：2010-03-02

申请号：US10596564

申请日：2004-12-16

申请人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G01N33/48

CPC分类号： A61B5/1455 ,  A61B5/14532 ,  A61B5/14546 ,  A61B5/14552 ,  G01J3/36 ,  G01N21/65 ,  G01N33/49

摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.

摘要翻译： 本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。 主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。 光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。 光信号优选分为对应于加权函数的正和负光谱带的两部分。 分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。 光信号的分离和加权由两个多元光学元件实现。

公开(公告)号：US20080212053A1

公开(公告)日：2008-09-04

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/42 ,  G03F7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种装置制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

公开(公告)号：US20080054189A1

公开(公告)日：2008-03-06

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及配置成调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US07105837B2

公开(公告)日：2006-09-12

申请号：US10844577

申请日：2004-05-13

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US07088424B2

公开(公告)日：2006-08-08

申请号：US11034260

申请日：2005-01-13

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

摘要翻译： 光刻投影设备包括被配置成由辐射源发射的辐射形成辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被辐射束照射时，辐射束具有 模式。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US07057190B2

公开(公告)日：2006-06-06

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC分类号： G03F7/20

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

公开(公告)号：US06906788B2

公开(公告)日：2005-06-14

申请号：US10717929

申请日：2003-11-21

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K3/00 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00 ,  G03B27/72 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70941 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于传输从辐射源发射的辐射束的辐射系统，以及构造成保持由光束照射的图案形成结构的支撑结构。 衬底保持器被构造成保持衬底，并且构造和布置投影系统以将图案形成结构的照射部分投影到衬底的目标部分上。 第一屏幕位于辐射系统和光学元件之间的光束的路径中，并且正电压被施加到第一屏幕以将带正电的粒子排斥离开光学元件。 第二屏幕位于第一屏幕的至少一侧上的光束路径中，并且将负电压施加到第二屏幕以排除离开第一屏幕的负面颗粒。

公开(公告)号：US06791665B2

公开(公告)日：2004-09-14

申请号：US10686813

申请日：2003-10-17

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B2742

CPC分类号： G03F7/70983 ,  G03F7/702 ,  G03F7/70233

摘要： A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the electrode. The beam of radiation and the voltage pulse from the voltage source are provided in phase or out of phase. In this way, the object is shielded against secondary electrons generated by radiation beam illumination.