Abstract:
Composite granules of white light quantum dots and manufacture methods, manufacture devices thereof with improved stability and quantum efficiencies of quantum dots materials. The composite granules of white light quantum dots comprise: main body of the granules (1), which is a polymer obtained from light-polymerization of photoinitiator(s) and polymerizable component(s) under ultra-violet irradiation; red light quantum dots (2), green light quantum dots (3) and blue light quantum dots (4) dispersed in the main body of the granules, wherein the concentrations of the red light quantum dots (2), green light quantum dots (3) and blue light quantum dots (4) are different.
Abstract:
Embodiments of the invention relate to a composite film and a fabrication method thereof, a photoelectric element and a photoelectric apparatus. The fabrication method of the composite film includes: preparing a polyfluorene-based compound solution, wherein the polyfluorene-based compound solution includes polyfluorene or polyfluorene derivatives; preparing a quantum dot solution; mixing the polyfluorene-based compound solution and the quantum dot solution together to prepare a mixed solution; removing a solvent in the mixed solution to prepare the composite film.
Abstract:
Disclosed are a light-emitting composite film, its manufacture method, and a white light organic electroluminescent device. Said light-emitting composite film comprises a first light-emitting layer and a second light-emitting layer. The first light-emitting layer comprises polyfluorene or polyfluorene derivatives, and the second light-emitting layer comprises quantum dots. A variety of color gamut and an improved brightness of devices can be achieved by the light-emitting composite film.
Abstract:
The invention refers to quantum dots (QDs) composite particles and their preparation method, photoelectric elements and photoelectric equipment. The preparation method of QDs composite particles comprises: coating the surface of metal nanoparticles (MNPs) with silica; modifying the silica coated MNPs through amination to make the surface of the silica have amino functional groups; and combining the carboxyl-functionalized QDs with amino-functionalized silica coated MNPs, thereby preparing the QDs composite particles. The preparation method can enhance the fluorescent efficiency of QDs.
Abstract:
The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.
Abstract:
An array substrate is provided, wherein a pixel electrode has the same material as a source/drain and has a thickness less than that of the source/drain, or a common electrode has the same material as a gate and has a thickness less than that of the gate, which guarantees transmittance of the array substrate while reducing the process complexity. A display device and a manufacturing method of the array substrate are also provided.
Abstract:
An array substrate, manufacturing method thereof and a display device are provided. The array substrate comprises thin film transistor units (2) arranged in array, and further comprises a quantum dot layer (3) disposed over the thin film transistor units (2). The quantum dot layer includes at least three kinds of quantum dots, any one kind of which emits light of a respective wave band when being irradiated and excited by light from an incident portion of the array substrate. The array substrate can improve color gamut range, transmittance of a display device without increasing the power consumption of the display device.
Abstract:
The invention provides a method for patterning a graphene layer and a method for manufacturing a display substrate. The method for patterning a graphene layer comprises: forming an isolation layer on a graphene layer; forming a photoresist layer on the isolation layer; patterning the photoresist layer; etching the isolation layer according to the patterned photoresist layer to form a patterned isolation layer; etching the graphene layer according to the patterned photoresist layer to form a patterned graphene layer; and removing the patterned isolation layer. In the method of the invention, the unfavorable condition of the prior art may be avoided that a graphene film sloughs off or a photoresist remains on a graphene film when a photoresist material is peeled off, and the product yield can be improved in the case that the production cost is controlled.
Abstract:
Embodiments of the invention relate to a composite film and a fabrication method thereof, a photoelectric element and a photoelectric apparatus. The fabrication method of the composite film includes: preparing a polyfluorene-based compound solution, wherein the polyfluorene-based compound solution includes polyfluorene or polyfluorene derivatives; preparing a quantum dot solution; mixing the polyfluorene-based compound solution and the quantum dot solution together to prepare a mixed solution; removing a solvent in the mixed solution to prepare the composite film.