PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING QUANTUM DOT PATTERN USING THE SAME
    5.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING QUANTUM DOT PATTERN USING THE SAME 审中-公开
    光敏树脂组合物和使用其形成量子图案的方法

    公开(公告)号:US20160011506A1

    公开(公告)日:2016-01-14

    申请号:US14437047

    申请日:2014-06-23

    Abstract: The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.

    Abstract translation: 本公开内容提供了一种光敏树脂组合物和使用其形成量子点图案的方法。 感光性树脂组合物包含分散在感光性树脂组合物中的量子点,各自具有改性层。 形成量子点图案的方法包括涂布,曝光和显影光致抗蚀剂以获得量子点图案,其中光致抗蚀剂是上述感光性树脂组合物。

    METHOD FOR PATTERNING A GRAPHENE LAYER AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE
    8.
    发明申请
    METHOD FOR PATTERNING A GRAPHENE LAYER AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE 有权
    用于绘制石墨层的方法和用于制造显示基板的方法

    公开(公告)号:US20150357239A1

    公开(公告)日:2015-12-10

    申请号:US14513324

    申请日:2014-10-14

    Abstract: The invention provides a method for patterning a graphene layer and a method for manufacturing a display substrate. The method for patterning a graphene layer comprises: forming an isolation layer on a graphene layer; forming a photoresist layer on the isolation layer; patterning the photoresist layer; etching the isolation layer according to the patterned photoresist layer to form a patterned isolation layer; etching the graphene layer according to the patterned photoresist layer to form a patterned graphene layer; and removing the patterned isolation layer. In the method of the invention, the unfavorable condition of the prior art may be avoided that a graphene film sloughs off or a photoresist remains on a graphene film when a photoresist material is peeled off, and the product yield can be improved in the case that the production cost is controlled.

    Abstract translation: 本发明提供一种用于图案化石墨烯层的方法和用于制造显示基板的方法。 图案化石墨烯层的方法包括:在石墨烯层上形成隔离层; 在隔离层上形成光致抗蚀剂层; 图案化光致抗蚀剂层; 根据图案化的光致抗蚀剂层蚀刻隔离层以形成图案化隔离层; 根据图案化的光致抗蚀剂层蚀刻石墨烯层以形成图案化的石墨烯层; 并去除图案化隔离层。 在本发明的方法中,可以避免现有技术的不利条件,当光致抗蚀剂材料被剥离时,石墨烯薄膜脱落或光致抗蚀剂残留在石墨烯薄膜上,并且在以下情况下可提高产品产率: 生产成本受到控制。

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