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1.发明授权Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators 有权使用多个膨胀热等离子体发生器的大面积化学气相沉积装置公开(公告)号：US06397776B1
公开(公告)日：2002-06-04
申请号：US09681820
申请日：2001-06-11
申请人： Barry Lee-Mean Yang , Charles Dominic Iacovangelo , Kenneth Walter Browall , Steven Marc Gasworth , William Arthur Morrison , James Neil Johnson
发明人： Barry Lee-Mean Yang , Charles Dominic Iacovangelo , Kenneth Walter Browall , Steven Marc Gasworth , William Arthur Morrison , James Neil Johnson
IPC分类号： C23C1600
CPC分类号： H01J37/32009 , C23C16/401 , C23C16/513 , H05H1/44
摘要： Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.
摘要翻译： 使用多个膨胀热等离子体产生装置进行化学气相沉积，以在诸如热塑性材料，特别是聚碳酸酯基材的基底上产生涂层。 衬底优选地移动经过发生装置。 包括在基板的两面涂覆或者在单个沉积室中或在用于沉积连续涂层的多个室中采用多组发生装置的方法。 优选地，与发生装置的轴线间隔开的衬底表面被加热以促进涂层均匀性。
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2.发明授权Apparatus and method for large area chemical vapor deposition using multiple expanding thermal plasma generators 有权使用多个膨胀热等离子体发生器的大面积化学气相沉积的装置和方法公开(公告)号：US06872428B2
公开(公告)日：2005-03-29
申请号：US10063094
申请日：2002-03-19
申请人： Barry Lee-Mean Yang , Charles Dominic Iacovangelo , Kenneth Walter Browall , Steven Marc Gasworth , William Arthur Morrison , James Neil Johnson
发明人： Barry Lee-Mean Yang , Charles Dominic Iacovangelo , Kenneth Walter Browall , Steven Marc Gasworth , William Arthur Morrison , James Neil Johnson
IPC分类号： C23C16/40 , C23C16/513 , H01J37/32 , H05H1/44 , C23C16/00
CPC分类号： H01J37/32009 , C23C16/401 , C23C16/513 , H05H1/44
摘要： Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.
摘要翻译： 使用多个膨胀热等离子体产生装置进行化学气相沉积，以在诸如热塑性材料，特别是聚碳酸酯基材的基底上产生涂层。 衬底优选地移动经过发生装置。 包括在基板的两面涂覆或者在单个沉积室中或在用于沉积连续涂层的多个室中采用多组发生装置的方法。 优选地，与发生装置的轴线间隔开的衬底表面被加热以促进涂层均匀性。
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公开(公告)号：US06426125B1
公开(公告)日：2002-07-30
申请号：US09271654
申请日：1999-03-17
IPC分类号： C08F252
CPC分类号： C03C17/42 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C17/347 , C23C14/22 , C23C14/32 , C23C16/513 , Y10T428/24942 , Y10T428/31663
摘要： According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material. The interlayer may comprise a polymerized organosilicon material or a polymerized hydrocarbon material, for example. The second layer may comprise a metal oxide or zinc sulfide, for example. The third layer may comprise an oxidized organosilicon material, for example.
摘要翻译： 根据本发明的示例性实施例，在制品上形成多个层的方法包括以下步骤：通过在阴极和阳极之间形成电弧来产生等离子体; 将包含有机化合物的第一材料注入到所述等离子体中以将第一层沉积在所述制品上; 将包含有机金属材料的第二材料注入所述等离子体中以在所述第一层上形成第二层; 以及将包含含硅有机化合物的第三材料注射到所述等离子体中以在所述第二层上沉积第三层。 本发明还涉及一种包括基底的制品; 设置在基板上的中间层; 设置在所述中间层上的第二层，所述第二层包含无机紫外线吸收材料; 以及设置在所述第二层上的第三层，所述第三层包括耐磨材料。 中间层可以包括例如聚合的有机硅材料或聚合烃材料。 例如，第二层可以包含金属氧化物或硫化锌。 例如，第三层可以包含氧化的有机硅材料。
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4.发明授权公开(公告)号：US06365016B1
公开(公告)日：2002-04-02
申请号：US09271655
申请日：1999-03-17
申请人： Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
发明人： Charles Dominic Iacovangelo , Keith Milton Borst , Elihu Calvin Jerabek , Patrick Peter Marzano , Barry Lee-Mean Yang
IPC分类号： C23C1408
CPC分类号： C23C14/228 , C23C14/32 , C23C16/513 , H01J37/32422
摘要： A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.
摘要翻译： 一种用于在基底上沉积涂层的方法和装置。 涂布基材的方法包括蒸发第一反应物; 将蒸发的反应物引入等离子体; 以及将所述第一反应物沉积在所述衬底的表面上。 例如，该方法可用于在玻璃或聚碳酸酯基底上高速沉积导电的紫外线过滤器涂层。 用于在聚合物基底上沉积UV过滤器涂层的装置包括具有阳极和阴极以形成等离子体的等离子体发生器，以及用于将第一反应物引入等离子体的第一入口，第一反应物包含沉积的蒸发材料 通过等离子体在衬底上。 任选地，可以使用喷嘴来提供第一反应物到等离子体的受控输送。
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公开(公告)号：US06737121B2
公开(公告)日：2004-05-18
申请号：US10046607
申请日：2002-01-16
IPC分类号： C23C1618
CPC分类号： C03C17/42 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C17/347 , C23C14/22 , C23C14/32 , C23C16/513 , Y10T428/24942 , Y10T428/31663
摘要： According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material. The interlayer may comprise a polymerized organosilicon material or a polymerized hydrocarbon material, for example. The second layer may comprise a metal oxide or zinc sulfide, for example. The third layer may comprise an oxidized organosilicon material, for example.
摘要翻译： 根据本发明的示例性实施例，在制品上形成多个层的方法包括以下步骤：通过在阴极和阳极之间形成电弧来产生等离子体; 将包含有机化合物的第一材料注入到所述等离子体中以将第一层沉积在所述制品上; 将包含有机金属材料的第二材料注入所述等离子体中以在所述第一层上形成第二层; 以及将包含含硅有机化合物的第三材料注射到所述等离子体中以在所述第二层上沉积第三层。 本发明还涉及一种包括基底的制品; 设置在基板上的中间层; 设置在所述中间层上的第二层，所述第二层包含无机紫外线吸收材料; 以及设置在所述第二层上的第三层，所述第三层包括耐磨材料。 中间层可以包括例如聚合的有机硅材料或聚合烃材料。 例如，第二层可以包含金属氧化物或硫化锌。 例如，第三层可以包含氧化的有机硅材料。
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公开(公告)号：US07703413B2
公开(公告)日：2010-04-27
申请号：US10881949
申请日：2004-06-28
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H05H1/34 , H05H2001/3452 , H05H2001/3463
摘要： Disclosed herein is an assembly for plasma generation comprising a cathode plate comprising a fixed cathode tip, the cathode tip being integral part of the cathode plate. The assembly further comprises at least one cascade plate, at least one separator plate disposed between the cathode plate and the cascade plate, an anode plate, and an inlet for a gas. The cathode plate, separator plate, cascade plate and anode plate are “electrically isolated” from one another, and the electrically isolated cathode plate, separator plate, and cascade plate define a plasma generation chamber. The cathode tip is disposed within the plasma generation chamber.
摘要翻译： 本文公开了一种用于等离子体生成的组件，其包括阴极板，阴极板包括固定阴极尖端，阴极尖端是阴极板的整体部分。 组件还包括至少一个级联板，设置在阴极板和级联板之间的至少一个分隔板，阳极板和用于气体的入口。 阴极板，隔板，级联板和阳极板彼此“电隔离”，并且电隔离的阴极板，隔板和级联板限定了等离子体产生室。 阴极尖端设置在等离子体产生室内。
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公开(公告)号：US20100062334A1
公开(公告)日：2010-03-11
申请号：US12330714
申请日：2008-12-09
申请人： Michael Alan Vallance , David Bogdan , Hari Nadathur Seshadri , Karthick Vilapakkam Gourishankar , Guruprasad Sundararajan , Charles Dominic Iacovangelo
发明人： Michael Alan Vallance , David Bogdan , Hari Nadathur Seshadri , Karthick Vilapakkam Gourishankar , Guruprasad Sundararajan , Charles Dominic Iacovangelo
IPC分类号： H01M4/00
CPC分类号： H01M4/38 , H01M4/381 , H01M4/661 , H01M4/662 , H01M4/665 , H01M4/808 , H01M10/399 , H01M10/42 , H01M2300/0048 , Y10T29/49108
摘要： A composition includes a cathodic material comprising a support structure. The support structure includes copper and zinc, and has less than 1 weight percent of aluminum, tin, or aluminum and tin. An energy storage device includes a cathodic material having a support structure.
摘要翻译： 组合物包括包含支撑结构的阴极材料。 支撑结构包括铜和锌，并且具有小于1重量％的铝，锡或铝和锡。 能量存储装置包括具有支撑结构的阴极材料。
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8.发明授权公开(公告)号：US06541115B2
公开(公告)日：2003-04-01
申请号：US09793312
申请日：2001-02-26
申请人： David Charles Pender , Charles Dominic Iacovangelo , Mark Philip D'Evelyn , Steven Alfred Tysoe
发明人： David Charles Pender , Charles Dominic Iacovangelo , Mark Philip D'Evelyn , Steven Alfred Tysoe
IPC分类号： B32B900
CPC分类号： C04B41/009 , B22F2998/00 , C04B41/4584 , C04B41/5133 , C04B41/5144 , C04B41/52 , C04B41/81 , C04B41/88 , C04B41/89 , C22C26/00 , Y10T407/27 , Y10T428/25 , Y10T428/252 , Y10T428/30 , Y10T428/31678 , C04B41/4523 , C04B41/4529 , C04B41/4535 , C04B41/5012 , C04B41/5116 , C04B35/52 , B22F7/02
摘要： A metal-infiltrated polycrystalline diamond composite tool comprising a plurality of diamond grains forming a continuous polycrystalline diamond matrix, a metallic phase being substantially palladium-free and contiguous to the continuous polycrystalline diamond matrix, wherein the metallic phase interpenetrates the continuous polycrystalline diamond matrix and substantially wets an outer surface of the continuous polycrystalline diamond matrix; and a working surface. The metallic phase is formed from an infiltrant and a wetting-enhancement layer disposed on the outer surfaces of the diamond particles, with both the infiltrant and wetting-enhancement layer being substantially palladium-free and comprising at least one metal from the group consisting of cobalt, iron, and nickel. The invention also includes a preform for a metal-infiltrated polycrystalline diamond composite tool, the perform comprising a container, a metallic infiltrant source, and a plurality of coated diamonds, each coated with a wetting-enhancement layer and, optionally, an activation layer, both of which are substantially palladium-free. Methods of forming the metal-infiltrated polycrystalline diamond composite tool, the preform, and the coated diamond particles used in the tool are also disclosed.
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公开(公告)号：US06261694B1
公开(公告)日：2001-07-17
申请号：US09271658
申请日：1999-03-17
IPC分类号： B32B2736
CPC分类号： G02B5/282 , Y10T428/26 , Y10T428/31507 , Y10T428/31681
摘要： An infrared radiation reflecting and ultraviolet radiation absorbing coating is formed over a polymeric substrate. Preferably, the substrate is a transparent polycarbonate window, and the coating comprises an IZO/Ag/IZO multilayer film. The layers are preferably deposited by arc plasma deposition or by sputtering.
摘要翻译： 在聚合物基材上形成红外辐射反射和紫外线吸收涂层。 优选地，基底是透明聚碳酸酯窗，涂层包括IZO / Ag / IZO多层膜。 这些层优选通过电弧等离子体沉积或通过溅射沉积。
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公开(公告)号：US08247080B2
公开(公告)日：2012-08-21
申请号：US11249085
申请日：2005-10-12
CPC分类号： C04B41/009 , C04B41/5031 , C04B41/5063 , C04B41/52 , C04B41/87 , C04B41/89 , C23C14/0617 , C23C14/22 , C23C16/303 , C23C16/4404 , C23C16/4581 , C23C16/513 , H01L21/68757 , Y10T428/30 , C04B41/4529 , C04B41/4531 , C04B41/5064 , C04B41/5057 , C04B41/522 , C04B35/522 , C04B35/583
摘要： A coating structure including an outer coating comprising aluminum; and an interlayer disposed between a substrate and the outer coating is provided. The interlayer may include a rare earth metal, a transition metal, or a noble metal. The interlayer may have one or more property of being less responsive to halogen etching relative to the outer coating; having a coefficient of thermal expansion that is greater than the coefficient of thermal expansion of the substrate and less than the coefficient of thermal expansion of the outer coating or vice versa; having a color different from the color of the outer coating; having a electrical conductivity different from the electrical conductivity of the outer coating. A method of making is article is provided. The method may include securing an interlayer to a substrate surface, and securing an outer coating to a surface of the interlayer opposite the substrate.
摘要翻译： 一种涂层结构，包括包含铝的外涂层; 并且设置在基板和外涂层之间的中间层。 中间层可以包括稀土金属，过渡金属或贵金属。 中间层可以具有一个或多个相对于外涂层对卤素蚀刻响应较小的性质; 具有大于衬底热膨胀系数的热膨胀系数小于外涂层的热膨胀系数，反之亦然; 具有与外涂层的颜色不同的颜色; 具有不同于外涂层的导电性的导电性。 制作方法是提供文章。 该方法可以包括将中间层固定到基底表面，以及将外涂层固定到与基底相对的层间表面。
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