Active pen nanolithography
    4.
    发明授权
    Active pen nanolithography 失效
    活性笔纳米光刻

    公开(公告)号:US08261662B1

    公开(公告)日:2012-09-11

    申请号:US11268740

    申请日:2005-11-08

    IPC分类号: H01L21/02

    CPC分类号: G02B21/0008 G02B21/002

    摘要: Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.

    摘要翻译: 改进的适用于扫描探针光刻或显微镜的致动探针,特别是直写式纳米光刻及其制造方法。 在一个实施例中,通过包括低温晶片接合(例如(金))热压接合,共晶或粘合粘合的方法廉价地制造具有氧化物锐化的微型天线的热机械致动悬臂。 还提供了将致动的探针电连接到外部电路并将它们机械耦合到仪器致动器的挠性电路。 可以围绕致动的悬臂和柔性电路构建改进的扫描探针光刻仪器,硬件和软件。 最后,提供了一种改进的微流体电路,用于将化学化合物递送到(致动的)探针的尖端,以及用于高,高纵横比尖端的制造方法。

    COMPACT NANOFABRICATION APPARATUS
    5.
    发明申请
    COMPACT NANOFABRICATION APPARATUS 审中-公开
    紧凑的纳米装置

    公开(公告)号:US20090023607A1

    公开(公告)日:2009-01-22

    申请号:US12116908

    申请日:2008-05-07

    IPC分类号: C40B50/14 C40B60/14

    摘要: An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.

    摘要翻译: 一种用于制造结构并从尖端到表面沉积材料的装置,用于以直写式模式进行图案化,提供行进宏观距离并提供纳米尺度图案化的能力。 适用于小规模制造和纳米光刻。 该仪器可以紧凑,并在实验台或台式机上使用。 一种装置,包括:至少一个多轴组件,其包括多个纳米定位阶段,至少一个笔组件,其中所述笔组件和所述多轴组件适于将材料从所述笔组件传送到定位的衬底 通过多轴组件,至少一个观察组件,至少一个控制器。 通过压电方法和装置和电动机的定位是特别有用的。 该设备可以包括集成的环境室和壳体,以及用于要输送的材料的油墨储存器。 观察组件可以是具有长工作距离的显微镜。 特别适用于制造生物芯片或微阵列。 多轴组件可以是五轴组件。 软件可以促进有效的使用。

    COMPACT NANOFABRICATION APPARATUS
    6.
    发明申请
    COMPACT NANOFABRICATION APPARATUS 审中-公开
    紧凑的纳米装置

    公开(公告)号:US20110195850A1

    公开(公告)日:2011-08-11

    申请号:US13088284

    申请日:2011-04-15

    IPC分类号: C40B30/00 C40B50/14

    摘要: An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.

    摘要翻译: 一种用于制造结构并从尖端到表面沉积材料的装置,用于以直写式模式进行图案化,提供行进宏观距离并提供纳米尺度图案化的能力。 适用于小规模制造和纳米光刻。 该仪器可以紧凑,并在实验台或台式机上使用。 一种装置,包括:至少一个多轴组件,其包括多个纳米定位阶段,至少一个笔组件,其中所述笔组件和所述多轴组件适于将材料从所述笔组件传送到定位的衬底 通过多轴组件,至少一个观察组件,至少一个控制器。 通过压电方法和装置和电动机的定位是特别有用的。 该设备可以包括集成的环境室和壳体,以及用于要输送的材料的油墨储存器。 观察组件可以是具有长工作距离的显微镜。 特别适用于制造生物芯片或微阵列。 多轴组件可以是五轴组件。 软件可以促进有效的使用。

    Nanomanufacturing devices and methods
    7.
    发明授权
    Nanomanufacturing devices and methods 失效
    纳米制造装置和方法

    公开(公告)号:US08261368B2

    公开(公告)日:2012-09-04

    申请号:US12465621

    申请日:2009-05-13

    摘要: Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses.

    摘要翻译: 提供用于进行纳米制造的装置,其提供小体积的反应空间和高反应多功能性。 装置可以包括适于对基底进行纳米尺寸改性的反应室和真空条件; 包围在反应室内的扫描探针头组件; 耦合到所述反应室的用于输送气体的第一端口; 耦合到所述反应室的第二端口,用于施加真空; 以及插入安装到反应室的基板组件。 反应室可以包括具有一个或多个柔性壁和一个或多个支撑物的主体,以防止反应室在真空下塌缩。 该装置还可以包括用于将扫描探针头组件的尖端耦合到反应室外部的电气部件的电导管。 还提供了结合装置的装置和使用装置和装置的方法。

    Polishing apparatus
    8.
    发明授权
    Polishing apparatus 失效
    抛光设备

    公开(公告)号:US6001005A

    公开(公告)日:1999-12-14

    申请号:US71442

    申请日:1998-05-01

    CPC分类号: B24B37/08 B24B7/17 B24B7/228

    摘要: A polishing machine includes a platform assembly mounted within three support columns. The platform assembly includes fluidically pressurized bladders for urging the upper polish plate toward and away from the lower polish plate. In one embodiment a movable support column is suspended from an overlying frame. The support column is engaged with the upper polish plate so as to selectively raise and lower the platform assembly. In another embodiment, the platform is raised and lowered by threaded shafts so as to engage and thereby displace the upper polish plate.

    摘要翻译: 抛光机包括安装在三个支撑柱内的平台组件。 平台组件包括用于将上部抛光板朝向和远离下部抛光板推动的流体加压的气囊。 在一个实施例中,可移动支撑柱从上覆框架悬挂。 支撑柱与上抛光板接合,以便选择性地升高和降低平台组件。 在另一个实施例中,平台通过螺纹轴升高和降低,从而接合并从而使上抛光板移位。

    Polishing apparatus with support columns supporting multiple platform
members
    9.
    发明授权
    Polishing apparatus with support columns supporting multiple platform members 失效
    具有支撑柱的抛光装置支撑多个平台构件

    公开(公告)号:US5957763A

    公开(公告)日:1999-09-28

    申请号:US932578

    申请日:1997-09-19

    CPC分类号: B24B37/08 B24B7/17 B24B7/228

    摘要: A polishing machine includes a platform assembly slidably mounted on three support columns. The platform assembly includes first and second platforms captively joined together so as to be slidably movable toward and away from each other. A lift plate is supported above the uppermost platform by a coil spring and an upper polish plate is suspended from the lift plate by a supporting element which passes through the platform assembly. Drive shafts are suspended from an overlying superstructure and engage the upper platform so as to selectively raise and lower the platform assembly and the upper polish plate. The spring allows adjustment of the pressure applied by the upper polish plate.

    摘要翻译: 抛光机包括可滑动地安装在三个支撑柱上的平台组件。 该平台组件包括第一和第二平台,该第一和第二平台被固定地连接在一起,以便能够相对于彼此和远离彼此可滑动地移动。 升降板通过螺旋弹簧支撑在最上平台上方,并且上抛光板通过穿过平台组件的支撑元件从提升板悬挂。 驱动轴从上层结构悬挂起来,并与上平台接合,以便选择地升高和降低平台组件和上抛光板。 弹簧允许调节由上抛光板施加的压力。

    Force curve analysis method for planar object leveling
    10.
    发明申请
    Force curve analysis method for planar object leveling 审中-公开
    用于平面物体平整的力曲线分析方法

    公开(公告)号:US20110268883A1

    公开(公告)日:2011-11-03

    申请号:US13064926

    申请日:2011-04-26

    IPC分类号: B05D5/00 B05C13/00

    摘要: An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetween, one or more force sensors configured to measure a force between the array and the surface, and a device configured calculate a force curve parameter of the force over the distance or time. The apparatus is configured to level the array relative to the surface by varying a relative tilting between the array and the substrate surface based on the force curve parameter or to measure the relative tilting based on the force curve parameter. Methods and software also are provided.

    摘要翻译: 一种用于相对于衬底表面调平微阵列阵列或测量它们之间的相对倾斜的装置包括致动器,其构造成驱动阵列或衬底之一以改变其间的距离,一个或多个力传感器被配置成测量 阵列和表面,以及配置的装置计算力与力的距离或时间的参数。 该装置被配置为通过基于力曲线参数改变阵列和基板表面之间的相对倾斜度来相对于表面来平坦化阵列,或者基于力曲线参数来测量相对倾斜度。 还提供了方法和软件。