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公开(公告)号：US09956524B2
公开(公告)日：2018-05-01
申请号：US14289575
申请日：2014-05-28
Applicant: EBARA CORPORATION
Inventor： Toshiharu Nakazawa , Tetsuro Sugiura , Kohtaro Kawamura , Toyoji Shinohara , Takashi Kyotani , Keiichi Ishikawa , Seiji Kashiwagi , Yasuhiko Suzuki , Hideo Arai
CPC classification number: B01D53/74 , B01D53/005 , B01D2257/204 , B01D2257/2066 , B01D2257/553 , B01D2258/0216 , Y10T137/85978
Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.
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Patent Agency Ranking
公开(公告)号：US10978315B2
公开(公告)日：2021-04-13
申请号：US15313990
申请日：2015-05-28
Applicant: EBARA CORPORATION
Inventor： Atsushi Shiokawa , Tetsuro Sugiura , Shinichi Sekiguchi , Takashi Kyotani , Tetsuo Komai , Norio Kimura , Keiichi Ishikawa , Toru Osuga
IPC: C23C16/44 , H01L21/67 , F04B37/16 , H01L21/205 , H01L21/3065 , H01L21/31 , C23C16/52 , F04B37/14 , H01J37/32 , F04B41/00 , C23C14/22 , G05D16/20
Abstract: The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).
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公开(公告)号：US09822974B2
公开(公告)日：2017-11-21
申请号：US14226737
申请日：2014-03-26
Applicant: EBARA CORPORATION
Inventor： Kohtaro Kawamura , Toyoji Shinohara , Tetsuro Sugiura , Hideo Arai , Toshiharu Nakazawa , Keiichi Ishikawa , Seiji Kashiwagi , Yasuhiko Suzuki , Takashi Kyotani
CPC classification number: F23J13/00 , B01D53/68 , B01D53/76 , B01D2251/102 , B01D2257/204 , B01D2257/553 , B01D2258/0216 , F04B37/14 , F04C25/02 , F04C2220/30 , F23G5/32 , F23G7/065 , F23J2219/00 , F23J2900/01007 , F23L17/00
Abstract: A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.
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公开(公告)号：US09364786B2
公开(公告)日：2016-06-14
申请号：US14226741
申请日：2014-03-26
Applicant: EBARA CORPORATION
Inventor： Kohtaro Kawamura , Toyoji Shinohara , Tetsuro Sugiura , Hideo Arai , Takashi Kyotani , Toshiharu Nakazawa , Keiichi Ishikawa , Seiji Kashiwagi , Yasuhiko Suzuki
CPC classification number: B01D53/343 , C23C16/4412 , F04B37/06 , F04B37/14 , F23G7/065 , Y02C20/30
Abstract: A vacuum pump has a discharge port coupled to an abatement chamber for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump is coupled to a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.
Abstract translation: 真空泵具有联接到减排室的排出口，用于处理从制造装置的室排出的排气，使废气无害化。 真空泵联接到热交换器，该热交换器被配置为通过使废气在减排部分被处理成无害化时产生的热量来加热惰性气体。 由热交换器加热的惰性气体被引入真空泵。
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公开(公告)号：US10143964B2
公开(公告)日：2018-12-04
申请号：US14284305
申请日：2014-05-21
Applicant: EBARA CORPORATION
Inventor： Kohtaro Kawamura , Toyoji Shinohara , Tetsuro Sugiura , Hideo Arai , Takashi Kyotani , Toshiharu Nakazawa , Keiichi Ishikawa , Seiji Kashiwagi , Yasuhiko Suzuki
Abstract: A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.
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公开(公告)号：US10040026B2
公开(公告)日：2018-08-07
申请号：US15201923
申请日：2016-07-05
Applicant: EBARA CORPORATION
Inventor： Hiroki Furuta , Tetsuro Sugiura , Tetsuo Komai , Atsushi Oyama , Takashi Kyotani , Shinichi Sekiguchi , Takanori Inada
Abstract: The fan scrubber is provided with a casing having a gas draw-in port and a gas ejection port, a fan disposed in the casing, a nozzle from which a liquid is jetted into the casing, and a canned motor connected to the fan. The canned motor has a main shaft connected to the fan, a rotor which rotates integrally with the main shaft, a stator disposed on the periphery of the rotor, a motor casing in which the rotor and the stator are housed, and a can which partitions the interior of the motor casing into a rotor chamber in which the rotor is disposed and a stator chamber in which the stator is disposed.
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