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    DEFECT DETECTION IN SATURABLE ABSORBERS
    2.
    发明申请
    DEFECT DETECTION IN SATURABLE ABSORBERS 有权
    可饱和吸收器中的缺陷检测

    公开(公告)号：US20140285796A1

    公开(公告)日：2014-09-25

    申请号：US13825492

    申请日：2012-10-10

    Applicant: Empire Technology Development LLC

    Inventor： Thomas A. Yager

    IPC: G01N21/95

    CPC classification number: G01N21/95 ,  G01N21/8422 ,  G01N21/9501 ,  H01L29/1606

    Abstract: Technologies are generally described for identifying defects in saturable absorbers, such as graphene, by the saturable property of decreasing light absorbance with increasing light intensity. For example, a graphene coated substrate may be imaged twice under two distinct incident intensities. At a gap in the graphene, the substrate may reflect light proportional to the incident intensities. The graphene may show a non-linear increase in reflected light as the intensity of illumination increases. A difference between the two incident intensities may reveal the gap in the graphene. Any suitable imaging technique may be employed such as confocal microscopy or linear scanning. The imaging may be scaled up for high volume automated inspection.

    Abstract translation: 通常描述技术用于通过随着光强度增加而减少吸光度的可饱和性来识别饱和吸收剂（例如石墨烯）中的缺陷。 例如，石墨烯涂覆的基底可以在两个不同的入射强度下成像两次。 在石墨烯中的间隙处，衬底可以反射与入射强度成比例的光。 当照明强度增加时，石墨烯可能显示反射光的非线性增加。 两个入射强度之间的差异可能揭示出石墨烯的差距。 可以使用任何合适的成像技术，例如共焦显微镜或线性扫描。 成像可以放大以进行大量自动检查。

    DETECTION OF INTERNAL GAS LEAKAGE
    3.
    发明申请
    DETECTION OF INTERNAL GAS LEAKAGE 审中-公开
    检测内部气体泄漏

    公开(公告)号：US20140200437A1

    公开(公告)日：2014-07-17

    申请号：US13742624

    申请日：2013-01-16

    Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC

    Inventor： Thomas A. Yager ,  Alfred Yager

    IPC: A61M31/00 ,  A61B5/00 ,  A61B5/055

    CPC classification number: A61B5/72 ,  A61B5/004 ,  A61B5/055 ,  A61B5/4255 ,  G01R33/282

    Abstract: A method placing a gas into a first cavity of a patient, where the gas includes hyperpolarized 3-Helium (3-He). At least a portion of the patient is imaged using MRI to detect the gas within the patient. Based at least in part on the imaging, a determination is made regarding whether at least a portion of the gas is present in a second cavity of the patient. Presence of the gas in the second cavity is indicative of a leakage of the first cavity.

    Abstract translation: 将气体放置在患者的第一腔中的方法，其中气体包括超极化3-氦（3-He）。 使用MRI成像患者的至少一部分以检测患者内的气体。 至少部分地基于成像，确定至少一部分气体是否存在于患者的第二腔中。 第二腔中的气体的存在表示第一腔的泄漏。

    Methods and systems for labeling and detecting defects in a graphene layer
    5.
    发明授权
    Methods and systems for labeling and detecting defects in a graphene layer 有权
    在石墨烯层中标记和检测缺陷的方法和系统

    公开(公告)号：US09297768B2

    公开(公告)日：2016-03-29

    申请号：US14118006

    申请日：2013-04-18

    Applicant: Empire Technology Development LLC

    Inventor： Thomas A. Yager ,  Seth Adrian Miller

    IPC: G01N21/64 ,  G01N21/88 ,  G01N21/91 ,  G01N21/77 ,  G01N21/84 ,  C09K11/06

    CPC classification number: G01N21/88 ,  C09K11/06 ,  C09K2211/1011 ,  G01N21/64 ,  G01N21/77 ,  G01N21/8422 ,  G01N21/91 ,  G01N2021/8433

    Abstract: Fluorophores or other indicators can be used to label and identify one or more defects in a graphene layer by localizing at the one or more defects and not at other areas of the graphene layer. A substrate having a surface at least partially covered by the graphene layer may be contacted with the fluorophore such that the fluorophore selectively binds with one or more areas of the surface of the underlying substrate exposed by the one or more defects. The one or more defects can be identified by exposing the substrate to radiation. A detected fluorescence response of the fluorophore to the radiation identifies the one or more defects.

    Abstract translation: 荧光团或其他指示剂可以用于通过在石墨烯层的一个或多个缺陷而不在其它区域定位来标记和识别石墨烯层中的一个或多个缺陷。 具有至少部分地被石墨烯层覆盖的表面的基底可以与荧光团接触，使得荧光团选择性地与由一个或多个缺陷暴露的下面的基底的表面的一个或多个区域结合。 可以通过将衬底暴露于辐射来鉴定一个或多个缺陷。 检测到荧光团对辐射的荧光响应识别出一个或多个缺陷。

    Defect detection in saturable absorbers
    8.
    发明授权
    Defect detection in saturable absorbers 有权
    饱和吸收器中的缺陷检测

    公开(公告)号：US09103803B2

    公开(公告)日：2015-08-11

    申请号：US13825492

    申请日：2012-10-10

    Applicant: Empire Technology Development LLC

    Inventor： Thomas A. Yager

    IPC: G01N21/00 ,  G01N21/95 ,  H01L29/16 ,  G01N21/84

    CPC classification number: G01N21/95 ,  G01N21/8422 ,  G01N21/9501 ,  H01L29/1606

    Abstract: Technologies are generally described for identifying defects in saturable absorbers, such as graphene, by the saturable property of decreasing light absorbance with increasing light intensity. For example, a graphene coated substrate may be imaged twice under two distinct incident intensities. At a gap in the graphene, the substrate may reflect light proportional to the incident intensities. The graphene may show a non-linear increase in reflected light as the intensity of illumination increases. A difference between the two incident intensities may reveal the gap in the graphene. Any suitable imaging technique may be employed such as confocal microscopy or linear scanning. The imaging may be scaled up for high volume automated inspection.

    Abstract translation: 通常描述技术用于通过随着光强度增加而减少吸光度的可饱和性来识别饱和吸收剂（例如石墨烯）中的缺陷。 例如，石墨烯涂覆的基底可以在两个不同的入射强度下成像两次。 在石墨烯中的间隙处，衬底可以反射与入射强度成比例的光。 当照明强度增加时，石墨烯可能显示反射光的非线性增加。 两个入射强度之间的差异可能揭示出石墨烯的差距。 可以使用任何合适的成像技术，例如共焦显微镜或线性扫描。 成像可以放大以进行大量自动检查。

    Optical lithography using graphene contrast enhancement layer
    9.
    发明授权
    Optical lithography using graphene contrast enhancement layer 有权
    使用石墨烯对比增强层进行光刻

    公开(公告)号：US08773636B2

    公开(公告)日：2014-07-08

    申请号：US13950923

    申请日：2013-07-25

    Applicant: Empire Technology Development, LLC

    Inventor： Thomas A. Yager ,  Seth Adrian Miller

    IPC: G03F7/20 ,  G03F7/38 ,  G03B27/52

    CPC classification number: G03F7/26 ,  G03F7/091 ,  G03F7/095 ,  Y10T428/12625 ,  Y10T428/24612 ,  Y10T428/24851

    Abstract: Technologies are generally described for methods, systems, and structures that include patterns formed by optical lithography. In some example methods, a photoresist layer is applied to a substrate, and a grapheme layer can be applied to the photoresist layer. Light can be applied through a mask to the graphene layer, where the mask includes a pattern. The light can form the pattern on the graphene layer such that the pattern forms on the photoresist layer.

    Abstract translation: 通常描述包括通过光学光刻形成的图案的方法，系统和结构的技术。 在一些示例性方法中，将光致抗蚀剂层施加到基板上，并且可以将图形层施加到光致抗蚀剂层。 光可以通过掩模施加到石墨烯层，其中掩模包括图案。 光可以在石墨烯层上形成图案，使得在光致抗蚀剂层上形成图案。

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