公开(公告)号：US20160209746A1

公开(公告)日：2016-07-21

申请号：US15080714

申请日：2016-03-25

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C07D487/04 ,  C07C275/24 ,  C07C233/36 ,  G03F7/32 ,  C07D239/10

CPC classification number: G03F7/038 ,  C07C233/36 ,  C07C271/16 ,  C07C271/24 ,  C07C271/34 ,  C07C275/10 ,  C07C275/24 ,  C07C275/26 ,  C07C323/60 ,  C07C2601/14 ,  C07D211/26 ,  C07D233/32 ,  C07D233/36 ,  C07D235/26 ,  C07D239/10 ,  C07D251/30 ,  C07D403/12 ,  C07D487/04 ,  G03F1/08 ,  G03F7/0382 ,  G03F7/0387 ,  G03F7/20 ,  G03F7/32

Abstract: There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).

Abstract translation: 提供了含有（A）碱溶性树脂和（C）由以下通式（1-0）表示的交联剂的活性光敏或辐射敏感性树脂组合物。

公开(公告)号：US20140370425A1

公开(公告)日：2014-12-18

申请号：US14472831

申请日：2014-08-29

Applicant: FUJIFILM Corporation

Inventor： Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (I) of general formula (I) below or any of repeating units (II) of general formula (II) below, (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater.

Abstract translation: 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含（A）当被酸作用时分解，从而提高其碱溶性的树脂，该树脂至少包含任何重复单元（I） 下列通式（I）或以下通式（II）的重复单元（II）中的任何一种：（B）鎓盐酸发生剂，当暴露于光化射线或辐射时，产生体积范围为250〜3 小于350Å3，和（C）鎓盐酸发生剂，当暴露于光化射线或辐射时，产生体积为400或更大的磺酸。

公开(公告)号：US20160280675A1

公开(公告)日：2016-09-29

申请号：US15176810

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: C07D307/33 ,  G03F7/32 ,  G03F7/20 ,  G03F1/50 ,  G03F7/038

CPC classification number: C07D307/33 ,  C08F12/22 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/322 ,  C08F212/32 ,  C08F212/08

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物包括具有极性转换基团和碱溶性树脂的交联剂，其中极性转换基团是能够通过碱性水溶液的作用分解的基团，以产生 羧酸或磺酸在具有交联基团的一侧。

公开(公告)号：US20150072274A1

公开(公告)日：2015-03-12

申请号：US14540454

申请日：2014-11-13

Applicant: FUJIFILM CORPORATION

Inventor： Tomotaka TSUCHIMURA ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/30 ,  G03F1/00

CPC classification number: G03F7/0382 ,  C08F212/14 ,  G03F1/00 ,  G03F1/20 ,  G03F1/22 ,  G03F1/50 ,  G03F1/56 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/30 ,  G03F7/322 ,  G03F7/325

Abstract: A chemical amplification resist composition according to the present invention includes (A) a compound including a triarylsulfonium cation having one or more fluorine atoms and capable of generating an acid with a volume of 240 Å3 or higher by irradiation of active rays or radiation; and (B) a compound including a phenolic hydroxyl group.

Abstract translation: 根据本发明的化学增幅抗蚀剂组合物包括（A）包含具有一个或多个氟原子的三芳基锍阳离子并且能够通过活性射线或辐射的照射产生体积为240或更高的酸的化合物; 和（B）包含酚羟基的化合物。

公开(公告)号：US20170351176A1

公开(公告)日：2017-12-07

申请号：US15685499

申请日：2017-08-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Toshiaki FUKUHARA ,  Shuji HIRANO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  G03F7/30 ,  G03F1/50

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US20160320700A1

公开(公告)日：2016-11-03

申请号：US15205250

申请日：2016-07-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  C08F116/10 ,  G03F7/32 ,  C08F224/00 ,  C08F214/18 ,  G03F7/20 ,  C08F216/10 ,  C08F220/16

CPC classification number: G03F7/038 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  C08F12/18 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F112/14 ,  C08F116/10 ,  C08F214/186 ,  C08F216/10 ,  C08F220/16 ,  C08F220/20 ,  C08F220/28 ,  C08F220/30 ,  C08F224/00 ,  C09D125/18 ,  G03F7/0015 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/2065 ,  G03F7/322 ,  G03F7/325 ,  H01L21/0274 ,  C08F212/14 ,  C08F212/32 ,  C08F212/34

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin (A) containing a repeating unit represented by General Formula (4) and a crosslinking agent (C) containing a polar group, in which the crosslinking agent (C) is a compound represented by General Formula (1) or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3).

公开(公告)号：US20170003591A1

公开(公告)日：2017-01-05

申请号：US15267252

申请日：2016-09-16

Applicant: FUJIFILM Corporation

Inventor： Hidehiro MOCHIZUKI ,  Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/26 ,  G03F7/20 ,  G03F1/22

Abstract: A manufacturing method for an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin, an acid generator, an organic acid, and a solvent, includes at least one of (i), (ii), or (iii) below, and a content ratio of the organic acid in the actinic ray-sensitive or radiation-sensitive resin composition is greater than 5% by mass based on a total solid content in the composition; (i) dissolving the organic acid in a solution that does not substantially contain the resin and the acid generator, (ii) dissolving the organic acid in a solution that contains the acid generator and does not substantially contain the resin, and (iii) dissolving the organic acid in a solution that contains the resin and does not substantially contain the acid generator, an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film, a mask blank including the film, a forming method for a photo mask and a pattern, a manufacturing method for an electronic device, and an electronic device.

Abstract translation: 包含树脂，酸产生剂，有机酸和溶剂的光化射线敏感性或辐射敏感性树脂组合物的制造方法包括下述（i），（ii）或（iii）中的至少一种 ，并且相对于组合物中的总固体成分，光化射线敏感性或辐射敏感性树脂组合物中的有机酸的含量比例大于5质量％ （i）将有机酸溶解在基本上不含树脂和酸发生剂的溶液中，（ii）将有机酸溶解在含有酸发生剂的溶液中，基本上不含树脂，和（iii）溶解 含有树脂的溶液中的有机酸，基本上不含酸产生剂，光化射线敏感性或辐射敏感性树脂组合物，光化射线敏感性或辐射敏感性膜，包含该膜的掩模坯料， 光掩模和图案的形成方法，电子设备的制造方法和电子设备。

公开(公告)号：US20160282720A1

公开(公告)日：2016-09-29

申请号：US15176345

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: G03F7/038 ,  G03F7/32 ,  G03F1/78 ,  G03F7/20 ,  G03F1/24 ,  G03F1/50

CPC classification number: G03F7/038 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括具有酚羟基的碱溶性树脂（A）和在分子内总共具有两个或多个羟甲基或烷氧基甲基的交联剂（C），其中 组合物含有分子量为420以上的交联剂（C1），并且在分子内总共具有2〜4个羟甲基或烷氧基甲基，比例为60〜100摩尔％ 包含交联剂（C1）的交联剂（C），其中交联剂（C）的羟甲基或烷氧基甲基的总浓度相对于光化射线敏感或辐射中的固体含量1g 敏感性树脂组合物为0.30mmol / g以上。

公开(公告)号：US20160280621A1

公开(公告)日：2016-09-29

申请号：US15176762

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI ,  Koutarou TAKAHASHI ,  Shuhei YAMAGUCHI

IPC: C07C43/178 ,  G03F1/50 ,  C07C41/14 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  G03F1/76

CPC classification number: C07C43/1788 ,  C07C41/09 ,  C07C41/14 ,  C07C41/22 ,  C07D239/10 ,  G03F1/50 ,  G03F1/76 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322 ,  G03F7/325 ,  C07C43/23

Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

公开(公告)号：US20150010855A1

公开(公告)日：2015-01-08

申请号：US14497560

申请日：2014-09-26

Applicant: FUJIFILM CORPORATION

Inventor： Tomotaka TSUCHIMURA ,  Takuya TSURUTA ,  Takeshi INASAKI ,  Koutarou TAKAHASHI

IPC: G03F7/027 ,  G03F1/00 ,  G03F1/22 ,  G03F7/20 ,  G03F1/20 ,  G03F7/038 ,  G03F7/004

CPC classification number: G03F7/027 ,  C08F12/22 ,  C08F12/24 ,  C08F12/26 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18 ,  G03F1/00 ,  G03F1/20 ,  G03F1/22 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2037 ,  G03F7/2039 ,  C08F212/32 ,  C08F212/08

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供了一种光化射线敏感或辐射敏感性组合物，其包含（α）由式（αI）表示的化合物，其能够产生体积为200或更大的酸的量（＆bgr） 在用光化射线或辐射照射时产生酸，并且式（αI）如本文所定义，并且使用光化射线敏感或辐射敏感组合物形成的抗蚀剂膜，涂覆有抗蚀剂的抗蚀剂涂覆的掩模毛坯 膜，抗蚀剂图案形成方法，包括曝光抗蚀剂膜和显影曝光的膜，通过曝光和显影抗蚀剂涂覆的掩模毛坯获得的光掩模，电子器件的制造方法，包括抗蚀剂图案形成方法和电子器件 通过电子设备的制造方法制造。