NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AND, RESIST-COATED MASK BLANKS, METHOD FOR FORMING RESIST PATTERN, AND PHOTOMASK, EACH USING THE SAME
    3.
    发明申请
    NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AND, RESIST-COATED MASK BLANKS, METHOD FOR FORMING RESIST PATTERN, AND PHOTOMASK, EACH USING THE SAME 审中-公开
    负极化学放大电阻组合物,电阻膜和耐蚀涂层掩模,形成耐蚀图案的方法和使用它们的光刻胶

    公开(公告)号:US20130084518A1

    公开(公告)日:2013-04-04

    申请号:US13633681

    申请日:2012-10-02

    CPC classification number: G03F7/0382 G03F1/56 G03F1/76

    Abstract: Disclosed is a negative chemical amplification resist composition including (A) a polymer compound having a repeating unit (P) represented by the following formula (I) which is stable in acids and alkalis, and a repeating unit (Q) having a phenolic hydroxyl group; (B) a compound capable of generating an acid when irradiated with actinic rays or a radiation; and (C) a cross-linking agent: in which, in the formula (I), R1 represents a hydrogen atom or a methyl group; L1 represents an oxygen atom or —NH—; L2 represents a single bond or an alkylene group; and A represents a polycyclic hydrocarbon group.

    Abstract translation: 公开了一种负极化学增幅抗蚀剂组合物,其包含(A)具有在酸和碱中稳定的由下式(I)表示的重复单元(P)的高分子化合物和具有酚羟基的重复单元(Q) ; (B)当用光化射线或辐射照射时能够产生酸的化合物; 和(C)交联剂:其中,在式(I)中,R 1表示氢原子或甲基; L1表示氧原子或-NH-; L2表示单键或亚烷基; A表示多环烃基。

    PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE-MAKING METHOD

    公开(公告)号:US20180154671A1

    公开(公告)日:2018-06-07

    申请号:US15882019

    申请日:2018-01-29

    Abstract: A planographic printing plate precursor includes: a support; and an image recording layer on the support, and the image recording layer contains a polymer having any group selected from a sulfonamide group, an amide group, an imide group and a carbonate group in a main chain and having a group represented by the following Formula (1): X—Ran  (1) wherein X represents a single bond or an oxygen atom, Ra represents an alkylene group having 6 to 40 carbon atoms in a case where X represents a single bond and Ra represents an alkylene group having 2 to 20 carbon atoms in a case where X represents an oxygen atom, and n represents an integer of 1 to 90

    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER AND PRODUCTION METHOD USING SAME, AND CAMERA MODULE
    7.
    发明申请
    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER AND PRODUCTION METHOD USING SAME, AND CAMERA MODULE 审中-公开
    近红外吸收组合物,近红外线截止滤光片和使用相同的生产方法,以及相机模块

    公开(公告)号:US20160077256A1

    公开(公告)日:2016-03-17

    申请号:US14946105

    申请日:2015-11-19

    CPC classification number: G02B5/208 C08K5/0091 G02B5/22 C08L33/24

    Abstract: Provided are a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near-infrared shielding properties, a near-infrared cut-off filter, a production method using the same, and a camera module.Provided are a near-infrared-absorbing composition including a compound obtained from a reaction between a polymer (A1) having an acid group or a salt thereof and a copper component and a near-infrared-absorbing composition including a compound obtained from a reaction between a polymer (A1) having an acid group or a salt thereof and a copper component and a copper complex obtained from a reaction between a low-molecular-weight compound having a coordination site and a copper component.

    Abstract translation: 本发明提供一种能够形成具有优异的耐热性同时保持高近红外屏蔽性的固化膜的近红外吸收组合物,近红外截止滤光片,使用其的制造方法和相机模块。 提供一种近红外吸收组合物,其包含由具有酸基的聚合物(A1)或其盐与铜成分之间的反应获得的化合物和包含由下列化合物获得的近红外线吸收组合物 具有酸基或其盐的聚合物(A1)和铜成分以及由具有配位部位的低分子量化合物与铜成分之间的反应得到的铜络合物。

    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER
OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT
    10.
    发明申请
    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT 审中-公开
    近红外吸收组合物,使用其获得的近红外切割过滤器,用于生产切割过滤器的过程,相机模块及其生产方法和固体摄影元件

    公开(公告)号:US20160178816A1

    公开(公告)日:2016-06-23

    申请号:US15003208

    申请日:2016-01-21

    CPC classification number: G02B5/208 G02B5/223 G03B11/00

    Abstract: Provided are a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near-infrared-shielding properties, a near-infrared cut filter obtained using the same, a process for producing said cut filter, a camera module and a process for producing the same, and a solid photographing element.The near-infrared-absorbing composition includes a near-infrared-absorbing compound (A1) obtained from a reaction between a low-molecular-weight compound which has two or more coordination sites to a metal component or a coordination site to a metal component and a cross-linking group and has a molecular weight of 1800 or lower or a salt thereof and the metal component and a near-infrared-absorbing compound (B) obtained from a reaction between a high-molecular-weight compound having a repeating unit represented by Formula (II) below or a salt thereof and a metal component.In Formula (II), R2 represents an organic group, Y1 represents a single bond or a divalent linking group, and X2 represents the coordination site to the metal component.

    Abstract translation: 提供一种能够形成具有优异的耐热性同时保持高近红外屏蔽性能的固化膜的近红外吸收组合物,使用其的近红外截止滤光片,制备所述截止滤光片的方法,相机 模块及其制造方法,以及固体拍摄元件。 近红外线吸收组合物包括由与金属成分具有两个以上配位部位的低分子化合物或与金属成分配位的低分子量化合物或与金属成分配位的反应而得到的近红外吸收化合物(A1) 交联基团,分子量为1800以下或其盐,金属成分和近红外线吸收性化合物(B)由具有重复单元的高分子量化合物 (II)或其盐和金属组分。 在式(II)中,R 2表示有机基团,Y 1表示单键或二价连接基团,X 2表示与金属成分的配位点。

Patent Agency Ranking