公开(公告)号：US20160280675A1

公开(公告)日：2016-09-29

申请号：US15176810

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: C07D307/33 ,  G03F7/32 ,  G03F7/20 ,  G03F1/50 ,  G03F7/038

CPC classification number: C07D307/33 ,  C08F12/22 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/322 ,  C08F212/32 ,  C08F212/08

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物包括具有极性转换基团和碱溶性树脂的交联剂，其中极性转换基团是能够通过碱性水溶液的作用分解的基团，以产生 羧酸或磺酸在具有交联基团的一侧。

公开(公告)号：US20160147154A1

公开(公告)日：2016-05-26

申请号：US15011813

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Toru FUJIMORI ,  Wataru NIHASHI ,  Shuji HIRANO ,  Natsumi YOKOKAWA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2065 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40

Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract translation: 提供了图案形成方法，其包括：（1）使用活性光敏或辐射敏感性树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影曝光的膜，其中活性光敏或辐射敏感性树脂组合物含有具有特定重复单元的树脂（A）和交联剂（C）。

公开(公告)号：US20150185610A1

公开(公告)日：2015-07-02

申请号：US14605292

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F212/32 ,  C08F212/14 ,  C08F222/14 ,  G03F7/30 ,  C08F220/28

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F222/14 ,  C08F232/08 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0274 ,  C08F2220/282 ,  C08F220/06 ,  C08F2220/1858 ,  C08F2220/283 ,  C08F2220/301 ,  C08F2220/302 ,  C08F220/10

Abstract: There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，其顺序包括：（1）通过使用含有（Ab）具有特定重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（2）步骤 通过使用电子束或极紫外线曝光膜，以及（3）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

公开(公告)号：US20150293446A1

公开(公告)日：2015-10-15

申请号：US14744872

申请日：2015-06-19

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: G03F7/038 ,  G03F7/20 ,  C08F216/10

CPC classification number: G03F7/0392 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F8/34 ,  C08F8/36 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/18 ,  C08F220/20 ,  C08F220/30 ,  C08F232/08 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  C08F112/14 ,  C08F120/20 ,  C08F2220/283 ,  C08F2220/382 ,  C08F2220/305 ,  C08F2220/301

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

公开(公告)号：US20150140484A1

公开(公告)日：2015-05-21

申请号：US14605631

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F220/28 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 提供一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）含有由第一特定式表示的重复单元的树脂和由第二具体式表示的重复单元，其中所述重复单元的含量 通过第一具体式为基于树脂（A）中的所有重复单元的35摩尔％以上，使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜。

公开(公告)号：US20140272692A1

公开(公告)日：2014-09-18

申请号：US14289718

申请日：2014-05-29

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F8/00 ,  C08F212/00 ,  C08F222/10 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract translation: 提供了光化射线敏感或辐射敏感性组合物，其包含（P）具有酚羟基的化合物和通过用特定式表示的基团取代酚羟基中的氢原子形成的基团，抗蚀剂 使用特定的光化射线敏感或辐射敏感组合物形成的膜，包含曝光和显影抗蚀剂膜的步骤的图案形成方法，包含图案形成方法的电子器件的制造方法和由 电子设备的具体制造方法。

公开(公告)号：US20210362529A1

公开(公告)日：2021-11-25

申请号：US17388761

申请日：2021-07-29

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Kazuaki ENOMOTO ,  Akira SAKAGUCHI

IPC: B41N1/14 ,  B41M1/06 ,  B41C1/10 ,  G03F7/039 ,  G03F7/038 ,  C08F212/08 ,  C08F220/28 ,  C08F220/34

Abstract: Provided are a lithographic printing plate precursor including a support, and an image recording layer on the support, in which the image recording layer contains an infrared absorbing agent, a polymerization initiator, and core-shell particles, a core portion of each core-shell particle contains a resin A containing a functional group A, and a shell portion of the core-shell particle contains a resin B containing a functional group B that is bondable to or interactable with the functional group A and a polymerizable group: a method of preparing a lithographic printing plate using the lithographic printing plate precursor; and a lithographic printing method carried out using the lithographic printing plate precursor.

公开(公告)号：US20160320700A1

公开(公告)日：2016-11-03

申请号：US15205250

申请日：2016-07-08

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  C08F116/10 ,  G03F7/32 ,  C08F224/00 ,  C08F214/18 ,  G03F7/20 ,  C08F216/10 ,  C08F220/16

CPC classification number: G03F7/038 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  C08F12/18 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F112/14 ,  C08F116/10 ,  C08F214/186 ,  C08F216/10 ,  C08F220/16 ,  C08F220/20 ,  C08F220/28 ,  C08F220/30 ,  C08F224/00 ,  C09D125/18 ,  G03F7/0015 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/2065 ,  G03F7/322 ,  G03F7/325 ,  H01L21/0274 ,  C08F212/14 ,  C08F212/32 ,  C08F212/34

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin (A) containing a repeating unit represented by General Formula (4) and a crosslinking agent (C) containing a polar group, in which the crosslinking agent (C) is a compound represented by General Formula (1) or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3).

公开(公告)号：US20150168834A1

公开(公告)日：2015-06-18

申请号：US14625897

申请日：2015-02-19

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  C08F14/18 ,  C08F16/10 ,  G03F7/20 ,  C08F24/00

CPC classification number: G03F7/0388 ,  C08F14/185 ,  C08F16/10 ,  C08F24/00 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/325 ,  H01L21/0273 ,  H01L21/0274

Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).

Abstract translation: 提供了一种图案形成方法，包括：（a）通过使用含有具有由式（1-0）表示的重复单元的树脂（A）的电子束敏感或极紫外线敏感性树脂组合物形成膜和 由式（1-2）表示的重复单元; （b）通过使用电子束或极紫外线曝光该膜; 和（c）通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案，其中由式（1-0）表示的重复单元的含量相对于全部重复单元为45摩尔％以上 树脂（A）。

公开(公告)号：US20150010857A1

公开(公告)日：2015-01-08

申请号：US14476936

申请日：2014-09-04

Applicant: FUJIFILM CORPORATION

Inventor： Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0392 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F8/34 ,  C08F8/36 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/18 ,  C08F220/20 ,  C08F220/30 ,  C08F232/08 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  C08F112/14 ,  C08F120/20 ,  C08F2220/283 ,  C08F2220/382 ,  C08F2220/305 ,  C08F2220/301

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).