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    CVD of metals capable of receiving nickel or alloys thereof using inert contact
    4.
    发明授权
    CVD of metals capable of receiving nickel or alloys thereof using inert contact 失效
    能够使用惰性接触来接收镍的金属或其合金的CVD

    公开(公告)号：US06569496B1

    公开(公告)日：2003-05-27

    申请号：US09050491

    申请日：1998-03-30

    申请人： Donald Rene Wall ,  John Joseph Garant ,  Kevin Michael Prettyman ,  Srinivasa S. N. Reddy

    发明人： Donald Rene Wall ,  John Joseph Garant ,  Kevin Michael Prettyman ,  Srinivasa S. N. Reddy

    IPC分类号： C23C1608

    CPC分类号： H01L21/28556 ,  C23C16/14 ,  C23C16/44

    摘要： The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Ammonium Iodide or Copper Iodide, with at least one inert stand-off in contact with the receiving metal surface. This invention basically allows the CVD of nickel (Ni) on molybdenum (Mo) or tungsten (W) where the nickel source is physically isolated from the refractory metal surface to be plated using at least one inert material that is in floating contact with the refractory metal surface that needs to be coated with at least one layer of nickel or alloy thereof.

    摘要翻译： 本发明公开了一种CVD（化学气相沉积）方法，其中镍或其合金，例如Ni / Cu，Ni / Co沉积在能够使用碘化物源，能够接收镍或其合金的金属表面上，优选地 碘化物盐，例如碘化铵或碘化铜，至少有一个与接收金属表面接触的惰性隔离物。 本发明基本上允许镍（Ni）在钼（Mo）或钨（W）上的CVD，其中镍源与耐火金属表面物理隔离）使用至少一种与耐火材料浮动接触的惰性材料进行电镀 需要涂覆至少一层镍或其合金的金属表面。

    CVD of metals capable of receiving nickel or alloys thereof using inert contact
    6.
    发明授权
    CVD of metals capable of receiving nickel or alloys thereof using inert contact 失效
    能够使用惰性接触来接收镍的金属或其合金的CVD

    公开(公告)号：US06224682B1

    公开(公告)日：2001-05-01

    申请号：US09489976

    申请日：2000-01-21

    申请人： Donald Rene Wall ,  John Joseph Garant ,  Kevin Michael Prettyman ,  Srinivasa S. N. Reddy

    发明人： Donald Rene Wall ,  John Joseph Garant ,  Kevin Michael Prettyman ,  Srinivasa S. N. Reddy

    IPC分类号： C23C1600

    CPC分类号： H01L21/28556 ,  C23C16/14 ,  C23C16/44

    摘要： The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Ammonium Iodide or Copper Iodide, with at least one inert stand-off in contact with the receiving metal surface. This invention basically allows the CVD of nickel (Ni) on molybdenum (Mo) or tungsten (W) where the nickel source is physically isolated from the refractory metal surface to be plated using at least one inert material that is in floating contact with the refractory metal surface that needs to be coated with at least one layer of nickel or alloy thereof.

    摘要翻译： 本发明公开了一种CVD（化学气相沉积）方法，其中镍或其合金，例如Ni / Cu，Ni / Co沉积在能够使用碘化物源，能够接收镍或其合金的金属表面上，优选地 碘化物盐，例如碘化铵或碘化铜，至少有一个与接收金属表面接触的惰性隔离物。 本发明基本上允许镍（Ni）在钼（Mo）或钨（W）上的CVD，其中镍源与耐火金属表面物理隔离）使用至少一种与耐火材料浮动接触的惰性材料进行电镀 需要涂覆至少一层镍或其合金的金属表面。

    Direct brazing of refractory metal features
    8.
    发明授权
    Direct brazing of refractory metal features 失效
    耐火金属特征的直接钎焊

    公开(公告)号：US6131796A

    公开(公告)日：2000-10-17

    申请号：US960563

    申请日：1997-10-30

    申请人： Suryanarayana Kaja ,  Srinivasa N. Reddy ,  Donald Rene Wall

    发明人： Suryanarayana Kaja ,  Srinivasa N. Reddy ,  Donald Rene Wall

    IPC分类号： B23K1/19 ,  B23K35/00 ,  B23K35/30 ,  B23K20/22 ,  B23K31/02 ,  B23K35/24

    CPC分类号： B23K1/19 ,  B23K35/005 ,  B23K35/3006 ,  B23K2201/40

    摘要： A brazing method for the direct bonding of a metallic item to a refractory metal without the need for an adhesion layer. The direct brazing process uses a Cu--Ag--Ni alloy which eliminates the need for the steps of plating a refractory metal to be bonded to a metallic material with a nickel layer (or other nickel-containing adhesion layer) and diffusion annealing the plated refractory metal prior to brazing. The brazed joint produced by the direct brazing method between a refractory metal and a metallic item has a substantially reduced layer of nickel in the as-brazed joint which improves the mechanical properties of the joint.

    摘要翻译： 用于将金属物品直接接合到难熔金属而不需要粘合层的钎焊方法。 直接钎焊工艺使用Cu-Ag-Ni合金，其不需要用镍层（或其它含镍粘合层）将待接合的难熔金属电镀到金属材料上，并且对镀层耐火材料进行扩散退火 钎焊前的金属。 在难熔金属和金属制品之间通过直接钎焊方法制造的钎焊接头在钎焊接头中具有大大降低的镍层，这提高了接头的机械性能。

    Component retainer
    9.
    发明授权
    Component retainer 失效
    部件保持架

    公开(公告)号：US6017025A

    公开(公告)日：2000-01-25

    申请号：US637520

    申请日：1996-04-25

    申请人： James Gregory Balz ,  Mark Joseph LaPlante ,  David Clifford Long ,  Brenda Lee Peterson ,  Donald Rene Wall

    发明人： James Gregory Balz ,  Mark Joseph LaPlante ,  David Clifford Long ,  Brenda Lee Peterson ,  Donald Rene Wall

    IPC分类号： B32B15/06 ,  B23B31/40

    CPC分类号： B32B15/06

    摘要： An apparatus for accurately positioning and retaining at least one component, comprising a substantially rigid frame comprising a side having at least one opening therein that is larger in size than the component, a layer of compliant material attached to the side of the frame and having at least one opening therein, the frame opening and the layer opening cooperating to define a component receiving opening sized for receiving the component, said component receiving opening having an inner sidewall having at least a portion thereof consisting of compliant material, the compliant material being in substantially uniform contact with the side of the frame.

    摘要翻译： 一种用于精确地定位和保持至少一个部件的装置，包括基本刚性的框架，其包括具有尺寸大于所述部件的至少一个开口的侧面;附接到所述框架侧面的柔性材料层， 所述框架开口和所述层开口配合以限定尺寸适于接收所述部件的部件接收开口，所述部件接收开口具有内侧壁，所述内侧壁的至少一部分由柔性材料组成，所述柔性材料基本上 与框架的侧面均匀接触。