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公开(公告)号：US07255844B2
公开(公告)日：2007-08-14
申请号：US10997254
申请日：2004-11-24
IPC分类号： C01B21/06
CPC分类号： C30B29/406 , C01B21/0632 , C01P2002/30 , C01P2002/72 , C01P2002/84 , C01P2002/85 , C01P2004/03 , C01P2004/04 , C01P2004/11 , C01P2004/22 , C01P2004/51 , C01P2004/52 , C01P2004/61 , C01P2004/62
摘要： A method of producing high quality GaN powder by combining high purity gallium and high purity ammonia in a tube reactor under controlled conditions. A reaction between the ammonia and gallium under the controlled conditions produces a porous gallium melt and to a full reaction, yielding high purity crystalline GaN powders with a stoichiometric nitrogen concentration and a hexagonal wurtzite structure.
摘要翻译： 通过在受控条件下在管式反应器中组合高纯度镓和高纯度氨来生产高质量GaN粉末的方法。 在受控条件下，氨和镓之间的反应产生多孔镓熔体并进行完全反应，产生具有化学计量氮浓度和六方纤锌矿结构的高纯度结晶GaN粉末。
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公开(公告)号：US20080025902A1
公开(公告)日：2008-01-31
申请号：US10589541
申请日：2005-04-27
申请人： Fernando A. Ponce , Rafael Garcia , Alan C. Thomas , Abigail Bell
发明人： Fernando A. Ponce , Rafael Garcia , Alan C. Thomas , Abigail Bell
IPC分类号： C09K11/08
CPC分类号： C09K11/62 , C01B21/0602 , C01B21/0632 , C01B21/0722 , C01P2002/20 , C01P2002/52 , C01P2002/84 , C01P2004/03 , C01P2004/10 , C01P2004/22 , C01P2004/53 , C01P2004/61 , C01P2006/80 , C09K11/623 , C09K11/625
摘要： A simple, inexpensive method of producing in bulk a doped metal nitride powder that exhibits a high luminescent efficiency, by first forming a metal-dopant alloy and then reacting the alloy with high purity ammonia under controlled conditions in a reactor. The resulting doped metal nitride powders will exhibit a luminescent efficiency that greatly exceeds that seen in pure undoped GaN powders, doped GaN thin films, and ZnS powders.
摘要翻译： 通过首先形成金属 - 掺杂剂合金，然后使该合金与高纯度氨在控制条件下在反应器中反应，从而大量生产显示出高发光效率的掺杂金属氮化物粉末的简单，便宜的方法。 所得掺杂的金属氮化物粉末将显示出大大超过在纯未掺杂的GaN粉末，掺杂的GaN薄膜和ZnS粉末中看到的发光效率。
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公开(公告)号：US06427090B1
公开(公告)日：2002-07-30
申请号：US09376943
申请日：1999-08-18
IPC分类号： G06F1900
CPC分类号： G05B19/4187 , G05B2219/32233 , G06Q10/06 , Y02P90/205
摘要： A system is provided for controlling the time at which a durable item, such as a reticle used in a lithography process in semiconductor manufacturing, is requalified for use. A counting device counts occurrences of predefined events, such as the number of jobs in which the reticle is used or the number of times it is placed in a lithography tool. The reticle is not removed from use until a limiting number of jobs or tool placements is reached, or the reticle is needed for processing the requalification job. The system also includes a requalification device for the durable item.
摘要翻译： 提供了一种用于控制在半导体制造中的光刻工艺中使用的诸如掩模版之类的耐用物品被重新认证使用的时间的系统。 计数装置计数预定义事件的发生，例如使用掩模版的作业数量或将其放置在光刻工具中的次数。 在达到限定数量的作业或工具布置之前，标线没有被使用，否则需要加工掩模版来处理重新鉴定作业。 该系统还包括用于耐用物品的再鉴定装置。
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4.发明授权Plural interleaved exposure process for increased feature aspect ratio in dense arrays 失效多个交错曝光过程，用于增加密集阵列中的特征长宽比公开(公告)号：US06451508B1
公开(公告)日：2002-09-17
申请号：US09561472
申请日：2000-04-28
IPC分类号： G03F720
CPC分类号： G03F7/70466 , G03F1/70
摘要： A method for exposing a workpiece in a dual exposure step-and-repeat process starts by forming a design for a reticle mask. Deconstruct the design for the reticle mask by removing a set(s) of the features that are juxtaposed. Form unexposed resist on the workpiece. Load the workpiece and the reticle mask into the stepper. Expose the workpiece through the reticle mask. Reposition the workpiece by a nanostep. Then expose the workpiece through the reticle mask after the repositioning. Test whether the plural exposure process is finished. If the result of the test is NO the process loops back to repeat some of the above steps. Otherwise the process has been completed. An overlay mark is produced by plural exposures of a single mark. A dead zone is provided surrounding an array region in which printing occurs subsequent to exposure in an original exposure. Stepper-framing-blades are moved over the dead zone to prevent additional exposures after an initial exposure. Alternatively, the workpiece can be fully exposed first by stepping a series of full steps, then going back to the starting position, making a nanostep to reset the starting position and re-exposing from the reset starting position in the same way with full steps from the nanostepped position.
摘要翻译： 用于在双重曝光步骤和重复过程中曝光工件的方法通过形成掩模版掩模的设计而开始。 通过删除并置的一些特征来解构掩模版掩模的设计。 在工件上形成未曝光的抗蚀剂。 将工件和掩模版掩模装入步进器。 通过掩模掩模将工件暴露。 用纳秒级重新定位工件。 然后在重新定位后将工件暴露在掩模版掩模之外。 测试多次曝光过程是否完成。 如果测试结果为“否”，则过程循环返回以重复上述步骤。 否则该过程已经完成。 通过单个标记的多次曝光产生重叠标记。 围绕阵列区域提供死区，其中在原始曝光中曝光之后发生印刷。 步进框架刀片在死区移动，以防止在初始曝光后的额外曝光。 或者，可以通过步进一系列完整的步骤，然后返回到起始位置，首先完全暴露工件，从而使得纳秒能够以相同的方式从复位起始位置复位起始位置并再次曝光 纳米级位置。
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公开(公告)号：US06268907B1
公开(公告)日：2001-07-31
申请号：US09078288
申请日：1998-05-13
申请人： Donald J. Samuels , Alan C. Thomas
发明人： Donald J. Samuels , Alan C. Thomas
IPC分类号： G03B2754
CPC分类号： G03F7/70191 , G03F7/70091 , G03F7/70583
摘要： The present invention provides a method and an optical lithographic system which eliminates the standing wave effect typically observed in photoresists without the need for altering the thickness of the photoresist, utilizing an anti-reflective coating material, or changing the light source. Specifically, the present invention compensates for standing waves by exposing the photoresist with light from a light source at different phases. That is, in the present invention there is a change in light exposure from a single dose at one phase to a plurality of doses at different phases; therefore dispersing the effects of the standing wave at each of those phases which in turn eliminates the standing wave.
摘要翻译： 本发明提供了一种方法和光学光刻系统，其消除通常在光致抗蚀剂中观察到的驻波效应，而不需要改变光致抗蚀剂的厚度，利用抗反射涂层材料或改变光源。 具体地说，本发明通过用来自不同相位的光源的光使光致抗蚀剂曝光来补偿驻波。 也就是说，在本发明中，在一个阶段的单一剂量到不同阶段的多个剂量的光照变化; 因此将驻波的影响分散在各个阶段，这又消除了驻波。
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公开(公告)号：US20080121899A1
公开(公告)日：2008-05-29
申请号：US11593881
申请日：2006-11-07
CPC分类号： G09G3/32 , G09G2300/0426 , G09G2300/06 , H01L25/0753 , H01L33/42 , H01L2924/0002 , H05K1/0265 , H05K1/0274 , H05K2201/0108 , H05K2201/0326 , H05K2201/0329 , H05K2201/0979 , H05K2201/10106 , H05K2201/10272 , H01L2924/00
摘要： An array of light emitting diodes coupled between a substrate and a transparent electrode include a pair of equipotential bus bars supplying electrical current simultaneously to at least two light emitting diodes, each located in its own area of transparent conductive material. In accordance with another aspect of the invention, a linear array of light emitting diodes has an electrode that includes a conductive island for each light emitting diode and a bus bar interconnecting and surrounding the conductive islands.
摘要翻译： 耦合在基板和透明电极之间的发光二极管阵列包括一对等电位汇流条，同时向至少两个发光二极管提供电流，每个发光二极管位于其自身的透明导电材料区域中。 根据本发明的另一方面，发光二极管的线性阵列具有包括用于每个发光二极管的导电岛的电极和互连并围绕导电岛的汇流条。
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公开(公告)号：US5953128A
公开(公告)日：1999-09-14
申请号：US929341
申请日：1997-08-28
CPC分类号： G03F7/70558 , G03F7/70641
摘要： Focus and exposure parameters may be controlled in a lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate. Corresponding dimensions of the resist shape and space are measured and the adequacy of focus or exposure dose are determined as a function of the measured dimensions. Etching parameters may also be controlled by creating a complementary tone pattern of etched shapes and spaces on a substrate. Corresponding dimensions of the etched shape and space are measured and the adequacy of etching parameters are determined as a function of the measured dimensions.
摘要翻译： 聚焦和曝光参数可以通过在基板上的抗蚀剂膜中产生形状和空间的互补色调图案来制造微电子学的光刻工艺中进行控制。 测量抗蚀剂形状和空间的相应尺寸，并根据所测量的尺寸确定聚焦或曝光剂量的适当性。 也可以通过在衬底上产生蚀刻形状和空间的互补色调图案来控制蚀刻参数。 测量蚀刻形状和空间的相应尺寸，并根据所测量的尺寸确定蚀刻参数的合适性。
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公开(公告)号：US07742125B2
公开(公告)日：2010-06-22
申请号：US11895537
申请日：2007-08-24
申请人： Alan C. Thomas , Walter J. Paciorek
发明人： Alan C. Thomas , Walter J. Paciorek
IPC分类号： G02F1/1333 , G02B26/02
CPC分类号： G09G3/001 , G02F2001/133374 , H04M1/22
摘要： A display includes a light switch overlying a backlight and having at least two light shutters which do not, by themselves, convey information by the shape thereof. The lit area of the backlight is equal to or greater than the sum of the areas of the shutters within the area. The display can also include a graphics layer overlying the light switch. The information content of the display is changed by changing the graphics layer.
摘要翻译： 显示器包括覆盖背光的光开关，并且具有至少两个光闸，其本身不通过其形状传送信息。 背光的点亮面积等于或大于区域内百叶窗面积的总和。 显示器还可以包括覆盖在光开关上的图形层。 通过改变图形层来改变显示的信息内容。
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公开(公告)号：US20090051853A1
公开(公告)日：2009-02-26
申请号：US11895537
申请日：2007-08-24
申请人： Alan C. Thomas , Walter J. Paciorek
发明人： Alan C. Thomas , Walter J. Paciorek
IPC分类号： G02F1/1333 , G02B26/02
CPC分类号： G09G3/001 , G02F2001/133374 , H04M1/22
摘要： A display includes a light switch overlying a backlight and having at least two light shutters which do not, by themselves, convey information by the shape thereof. The lit area of the backlight is equal to or greater than the sum of the areas of the shutters within the area. The display can also include a graphics layer overlying the light switch. The information content of the display is changed by changing the graphics layer.
摘要翻译： 显示器包括覆盖背光的光开关，并且具有至少两个光闸，其本身不通过其形状传送信息。 背光的点亮面积等于或大于区域内百叶窗面积的总和。 显示器还可以包括覆盖在光开关上的图形层。 通过改变图形层来改变显示的信息内容。
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公开(公告)号：US20080185600A1
公开(公告)日：2008-08-07
申请号：US11701987
申请日：2007-02-02
申请人： Alan C. Thomas
发明人： Alan C. Thomas
IPC分类号： H01L33/00
CPC分类号： H01L33/502 , C09K11/025 , C09K11/7731
摘要： A light emitting semiconductor device including a light emitting diode having a cascading phosphor is improved by the particles of phosphor being coated with a moisture barrier layer and a buffer layer. Either the buffer layer overlies the moisture barrier layer or the moisture barrier layer overlies the buffer layer. In the latter case, the particles can further include a buffer layer over the moisture barrier layer. Preferred materials for the buffer layer are silica or alumina, which can include other oxides in the layer.
摘要翻译： 包含具有级联荧光体的发光二极管的发光半导体器件通过被防潮层和缓冲层涂覆的荧光体颗粒而改善。 缓冲层都叠在防潮层上，或者湿气层叠在缓冲层上。 在后一种情况下，颗粒还可以包括在防潮层上的缓冲层。 用于缓冲层的优选材料是二氧化硅或氧化铝，其可以包括该层中的其它氧化物。
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