公开(公告)号：US20100296036A1

公开(公告)日：2010-11-25

申请号：US12805512

申请日：2010-08-03

Applicant: Gen FUJII

Inventor： Gen FUJII

IPC: G02F1/1335

CPC classification number: G02B5/045 ,  G02F1/133555

Abstract: A semi-transparent reflecting plate including plural reflecting surfaces extending substantially over an entire surface of a reflecting plate, not only permitting light to pass therethrough, but also reflecting the light on the reflecting surfaces.

Abstract translation: 一种半透明反射板，包括基本上在反射板的整个表面上延伸的多个反射表面，不仅允许光通过，而且还将光反射在反射面上。

公开(公告)号：US20100090211A1

公开(公告)日：2010-04-15

申请号：US12639274

申请日：2009-12-16

Applicant: Gen FUJII ,  Erika TAKAHASHI

Inventor： Gen FUJII ,  Erika TAKAHASHI

IPC: H01L51/10 ,  H01L33/00

CPC classification number: H01L51/0022 ,  H01L51/0533 ,  H01L51/0545

Abstract: A method of manufacturing a semiconductor device includes steps of forming a gate electrode over a light-transmitting substrate, forming a gate insulating layer containing an inorganic material over the gate electrode and the substrate, forming an organic layer containing a photopolymerizable reactive group over the gate insulating layer, polymerizing selectively the organic layer by irradiating the organic layer with light from back side of the substrate, using the gate electrode as a mask, forming an organic polymer layer by removing a residue of the organic layer, being other than polymerized, forming an organosilane film including a hydrolytic group over the gate insulating layer in a region other than a region in which the organic polymer layer is formed, forming source and drain electrodes by applying a composition containing a conductive material over the organic polymer layer, and forming a semiconductor layer over the gate electrode, the source and drain electrodes.

Abstract translation: 一种制造半导体器件的方法包括以下步骤：在透光衬底上形成栅电极，在栅电极和衬底上形成含有无机材料的栅极绝缘层，在栅极上形成含有可光聚合反应性基团的有机层 通过使用栅电极作为掩模从基板的背面用光照射有机层来选择性地聚合有机层，通过除去除了聚合的有机层的残留物形成有机聚合物层，形成 在除了形成有机聚合物层的区域以外的区域的栅极绝缘层上包含水解基团的有机硅烷膜，通过在有机聚合物层上涂布含有导电性材料的组合物形成源极和漏极，形成 栅电极上的半导体层，源极和漏极。

公开(公告)号：US20080316410A1

公开(公告)日：2008-12-25

申请号：US12133160

申请日：2008-06-04

Applicant: Gen FUJII ,  Erika TAKAHASHI

Inventor： Gen FUJII ,  Erika TAKAHASHI

IPC: G02F1/1343

CPC classification number: H01L51/0021 ,  C09K19/582 ,  G02F1/13439 ,  G02F2202/022 ,  G02F2202/16 ,  H01L51/0025 ,  H01L51/5206 ,  H01L51/5221

Abstract: To provide display devices with improved image quality and reliability or display devices with a large screen at low cost with high productivity, an electrode layer containing a conductive polymer is used as an electrode layer for a display element, and the concentration of ionic impurities contained in the electrode layer containing a conductive polymer is reduced (preferably to 100 ppm or less). Ionic impurities are ionized, and easily become mobile ions, and they deteriorate a liquid crystal layer or an electroluminescent layer, which is used for a display element. Therefore, an electrode layer containing a conductive polymer, in which such ionic impurities are reduced is provided; thus, reliability of the display device can be improved.

Abstract translation: 为了以高生产率以低成本提供具有改进的图像质量和可靠性的显示装置或具有大屏幕的显示装置，使用含有导电聚合物的电极层作为显示元件的电极层，并且包含在 含有导电性聚合物的电极层减少（优选为100ppm以下）。 离子杂质离子化，容易成为移动离子，并且使用于显示元件的液晶层或电致发光层劣化。 因此，提供含有这样的离子性杂质减少的导电性高分子的电极层。 从而能够提高显示装置的可靠性。

公开(公告)号：US20130001560A1

公开(公告)日：2013-01-03

申请号：US13612146

申请日：2012-09-12

Applicant: Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

Inventor： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

IPC: H01L29/786

CPC classification number: G02B5/201 ,  G03F7/0007 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3281 ,  H01L27/3295 ,  H01L29/66757 ,  H01L29/66765 ,  H01L51/56

Abstract: The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.

公开(公告)号：US20120113378A1

公开(公告)日：2012-05-10

申请号：US13347760

申请日：2012-01-11

Applicant: Erika TAKAHASHI ,  Gen FUJII ,  Shuji FUKAI ,  Takeshi NISHI

Inventor： Erika TAKAHASHI ,  Gen FUJII ,  Shuji FUKAI ,  Takeshi NISHI

IPC: G02F1/1339 ,  B32B37/14 ,  B32B37/02

CPC classification number: G02F1/13394 ,  G02F1/13392 ,  G02F2202/28

Abstract: To control the positioning of a spacer more accurately in a liquid crystal display device to prevent display defects due to incorrect positioning in a display region. To provide a liquid crystal display device with higher image quality and reliability, and to provide a method for manufacturing the liquid crystal display device with high yield. In a liquid crystal display device, a region onto which a spherical spacer is discharged is subjected to liquid-repellent treatment in order to reduce the wettability with respect to a liquid in which the spherical spacer is dispersed. The liquid (the droplet) does not spread over the liquid-repellent region and is dried while moving the spherical spacer toward the center of the liquid. Thus, incorrect positioning shortly after discharging, which has been caused by the loss of control in the liquid, can be corrected by moving the spherical spacer while drying the liquid.

Abstract translation: 为了在液晶显示装置中更准确地控制间隔物的定位，以防止由于在显示区域中的不正确定位而引起的显示缺陷。 提供具有更高图像质量和可靠性的液晶显示装置，并且提供一种以高产量制造液晶显示装置的方法。 在液晶显示装置中，为了降低相对于其中分散有球形间隔物的液体的润湿性，对排出球形间隔物的区域进行拒水处理。 液体（液滴）不会在液体排斥区域上扩散，并且在将球形间隔物朝向液体的中心移动的同时被干燥。 因此，可以通过在干燥液体的同时移动球形间隔物来校正由于液体中的失控而引起的放电后不正确的定位。

公开(公告)号：US20090008667A1

公开(公告)日：2009-01-08

申请号：US12135252

申请日：2008-06-09

Applicant: Gen FUJII ,  Erika TAKAHASHI

Inventor： Gen FUJII ,  Erika TAKAHASHI

IPC: H01L21/283 ,  H01L33/00

CPC classification number: H01L51/0005 ,  H01L21/76825 ,  H01L21/76826 ,  H01L27/3246 ,  H01L27/3283 ,  H01L51/0545 ,  H01L51/56 ,  Y02P80/30

Abstract: Oxidation treatment is performed to the surface of a substrate provided with a photocatalytic conductive film and an insulating film; treatment with a silane coupling agent is performed, so that a silane coupling agent film is formed and the surface of the substrate is modified to be liquid-repellent; and the surface of the substrate is irradiated with light of a wavelength (less than to equal to 390 nm) which has energy of greater than or equal to a band gap of a material for forming the photocatalytic conductive film, so that only the silane coupling agent film over the surface of the photocatalytic conductive film is decomposed and the surface of the photocatalytic conductive film can be modified to be lyophilic.

Abstract translation: 对设置有光催化性导电膜和绝缘膜的基板的表面进行氧化处理; 进行硅烷偶联剂的处理，形成硅烷偶联剂膜，将基材的表面改性为疏液性; 并且用能量大于或等于用于形成光催化性导电膜的材料的带隙的能量（小于等于390nm）的光照射衬底的表面，使得只有硅烷偶联 光催化性导电膜的表面上的试剂膜分解，光催化性导电膜的表面可以改性为亲液性的。

公开(公告)号：US20120032159A1

公开(公告)日：2012-02-09

申请号：US13277478

申请日：2011-10-20

Applicant: Shunpei YAMAZAKI ,  Masayuki SAKAKURA ,  Masaharu NAGAI ,  Yutaka MATSUDA ,  Kengo AKIMOTO ,  Gen FUJII ,  Tetsuji YAMAGUCHI

Inventor： Shunpei YAMAZAKI ,  Masayuki SAKAKURA ,  Masaharu NAGAI ,  Yutaka MATSUDA ,  Kengo AKIMOTO ,  Gen FUJII ,  Tetsuji YAMAGUCHI

IPC: H01L51/52

CPC classification number: H01L51/529 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/3246 ,  H01L27/3248 ,  H01L27/3258 ,  H01L27/3276 ,  H01L29/66757 ,  H01L51/5206 ,  H01L51/5246 ,  H01L2251/5315 ,  H01L2251/5323

Abstract: It is an object of the present invention to provide a reliable display device and a method for manufacturing the display device reducing the number of manufacturing steps, and with higher yield. A display device according to the invention includes a plurality of display elements each having a first electrode, a layer containing an organic compound, and a second electrode. The display device further includes a heat-resistant planarizing film over a substrate having an insulating surface, a first electrode over the heat-resistant, planarizing film, a wiring covering an end portion of the first electrode, a partition wall covering the end portion of first electrode and the wiring, a layer containing an organic compound, and a second electrode over the layer containing an organic compound.

Abstract translation: 本发明的目的是提供一种可靠的显示装置和用于制造显示装置的方法，其减少制造步骤的数量，并且以更高的产量。 根据本发明的显示装置包括多个显示元件，每个显示元件具有第一电极，含有有机化合物的层和第二电极。 显示装置还包括在具有绝缘表面的基板上的耐热平面化膜，在耐热平坦化膜上的第一电极，覆盖第一电极的端部的布线，覆盖第一电极的端部的分隔壁 第一电极和布线，含有有机化合物的层，以及包含有机化合物的层上的第二电极。

公开(公告)号：US20100240173A1

公开(公告)日：2010-09-23

申请号：US12792816

申请日：2010-06-03

Applicant: Gen FUJII

Inventor： Gen FUJII

IPC: H01L21/44

CPC classification number: H01L21/288 ,  C23C18/1216 ,  C23C18/14 ,  C23C18/1608 ,  C23C18/165 ,  C23C18/1651 ,  C23C18/1893 ,  H01L27/1285 ,  H01L27/1292 ,  H01L29/458 ,  H01L29/4908

Abstract: The manufacturing method of the present invention includes steps of selectively forming a photocatalyst material or a material including an amino group by discharging a composition including the photocatalyst material or the material including an amino group; immersing the photocatalyst material or the material including an amino group in a solution including a plating catalyst material so as to adsorb or deposit the plating catalyst material onto the photocatalyst material or the material including an amino group; and immersing the plating catalyst material in a plating solution including a metal material so as to form a metal film on a surface of the photocatalyst material or the material including an amino group adsorbing or depositing the plating catalyst material, thereby manufacturing a semiconductor device. The pH of the solution including the plating catalyst material is adjusted in a range of 3 to 6.

Abstract translation: 本发明的制造方法包括通过排出包含光催化剂材料的组合物或包含氨基的材料来选择性地形成光催化剂材料或包含氨基的材料的步骤; 将光催化剂材料或包含氨基的材料浸入包括镀催化剂材料的溶液中，以将镀催化剂材料吸附或沉积到光催化剂材料或包含氨基的材料上; 以及将镀催化剂材料浸渍在包含金属材料的镀液中，以在光催化剂材料的表面上形成金属膜，或者包含吸附或沉积镀催化剂材料的氨基的材料，从而制造半导体器件。 包括电镀催化剂材料的溶液的pH调节在3至6的范围内。

公开(公告)号：US20090291552A1

公开(公告)日：2009-11-26

申请号：US12537005

申请日：2009-08-06

Applicant: Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

Inventor： Shinji MAEKAWA ,  Gen FUJII ,  Hiroko SHIROGUCHI ,  Masafumi MORISUE

IPC: H01L21/28 ,  H01L21/288

CPC classification number: G02B5/201 ,  G03F7/0007 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3281 ,  H01L27/3295 ,  H01L29/66757 ,  H01L29/66765 ,  H01L51/56

Abstract: The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.

Abstract translation: 本发明通过简单的步骤提供了具有包括绝缘膜，半导体膜，导电膜等的膜图案的基板的制造方法，以及低成本，高生产率的半导体器件的制造方法， 产量。 根据本发明，在形成在基材上具有低润湿性的第一保护膜之后，在第一掩模图案的外边缘上施加或排出具有高润湿性的材料，从而形成膜图案和具有膜图案的基板 形成。

公开(公告)号：US20090075476A1

公开(公告)日：2009-03-19

申请号：US12268039

申请日：2008-11-10

Applicant: Gen FUJII ,  Masafumi MORISUE ,  Hironobu SHOJI ,  Junya MARUYAMA ,  Kouji DAIRIKI ,  Tomoyuki AOKI

Inventor： Gen FUJII ,  Masafumi MORISUE ,  Hironobu SHOJI ,  Junya MARUYAMA ,  Kouji DAIRIKI ,  Tomoyuki AOKI

IPC: H01L21/44

CPC classification number: H01L27/12 ,  H01L23/48 ,  H01L23/5227 ,  H01L24/11 ,  H01L27/0629 ,  H01L27/1266 ,  H01L27/1292 ,  H01L27/13 ,  H01L28/10 ,  H01L29/78621 ,  H01L2224/0554 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2924/00014 ,  H01L2924/07811 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15788 ,  H01L2924/3011 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

Abstract: The manufacturing method of a substrate having a conductive layer has the steps of: forming an inorganic insulating layer over a substrate; forming an organic resin layer with a desired shape over the inorganic insulating layer; forming a low wettability layer with respect to a composition containing conductive particles on a first exposed portion of the inorganic insulating layer; removing the organic resin layer; and coating a second exposed portion of the inorganic insulating layer with a composition containing conductive particles and baking, thereby forming a conductive layer.

Abstract translation: 具有导电层的基板的制造方法具有以下步骤：在基板上形成无机绝缘层; 在无机绝缘层上形成具有所需形状的有机树脂层; 在无机绝缘层的第一暴露部分上相对于含有导电颗粒的组合物形成低润湿性层; 去除有机树脂层; 并用含有导电颗粒的组合物涂覆无机绝缘层的第二暴露部分并进行烘烤，由此形成导电层。