LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    1.
    发明申请
    LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    发光装置及其制造方法

    公开(公告)号:US20090291519A1

    公开(公告)日:2009-11-26

    申请号:US12535244

    申请日:2009-08-04

    IPC分类号: H01L33/00

    摘要: Disclosed herein is a light emitting device. The light emitting device includes an n-type nitride semiconductor layer; an active layer on the n-type semiconductor layer, an AlN/GaN layer of a super lattice structure formed by alternately growing an AlN layer and a GaN layer on the active layer, and a p-type nitride semiconductor layer on the AlN/GaN layer of the super lattice structure. At least one of the AlN layer and the GaN layer is doped with a p-type dopant. A method for manufacturing the light emitting device is also provided.

    摘要翻译: 本文公开了一种发光器件。 发光器件包括n型氮化物半导体层; 在n型半导体层上的有源层,通过在有源层上交替生长AlN层和GaN层而形成的超晶格结构的AlN / GaN层和AlN / GaN上的p型氮化物半导体层 层的超晶格结构。 AlN层和GaN层中的至少一个掺杂有p型掺杂剂。 还提供了一种用于制造发光器件的方法。

    Light emitting device and method for manufacturing the same
    2.
    发明授权
    Light emitting device and method for manufacturing the same 有权
    发光元件及其制造方法

    公开(公告)号:US08716048B2

    公开(公告)日:2014-05-06

    申请号:US12775119

    申请日:2010-05-06

    IPC分类号: H01L21/00

    摘要: Disclosed herein is a light emitting device. The light emitting device includes an n-type nitride semiconductor layer; an active layer on the n-type semiconductor layer, an AlN/GaN layer of a super lattice structure formed by alternately growing an AlN layer and a GaN layer on the active layer, and a p-type nitride semiconductor layer on the AlN/GaN layer of the super lattice structure. At least one of the AlN layer and the GaN layer is doped with a p-type dopant. A method for manufacturing the light emitting device is also provided.

    摘要翻译: 本文公开了一种发光器件。 发光器件包括n型氮化物半导体层; 在n型半导体层上的有源层,通过在有源层上交替生长AlN层和GaN层而形成的超晶格结构的AlN / GaN层和AlN / GaN上的p型氮化物半导体层 层的超晶格结构。 AlN层和GaN层中的至少一个掺杂有p型掺杂剂。 还提供了一种用于制造发光器件的方法。

    LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    4.
    发明申请
    LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    发光装置及其制造方法

    公开(公告)号:US20100216272A1

    公开(公告)日:2010-08-26

    申请号:US12775119

    申请日:2010-05-06

    IPC分类号: H01L21/20

    摘要: Disclosed herein is a light emitting device. The light emitting device includes an n-type nitride semiconductor layer; an active layer on the n-type semiconductor layer, an AlN/GaN layer of a super lattice structure formed by alternately growing an AlN layer and a GaN layer on the active layer, and a p-type nitride semiconductor layer on the AlN/GaN layer of the super lattice structure. At least one of the AlN layer and the GaN layer is doped with a p-type dopant. A method for manufacturing the light emitting device is also provided.

    摘要翻译: 本文公开了一种发光器件。 发光器件包括n型氮化物半导体层; 在n型半导体层上的有源层,通过在有源层上交替生长AlN层和GaN层而形成的超晶格结构的AlN / GaN层和AlN / GaN上的p型氮化物半导体层 层的超晶格结构。 AlN层和GaN层中的至少一个掺杂有p型掺杂剂。 还提供了一种用于制造发光器件的方法。

    Method of fabricating light emitting diode
    8.
    发明授权
    Method of fabricating light emitting diode 有权
    制造发光二极管的方法

    公开(公告)号:US08470626B2

    公开(公告)日:2013-06-25

    申请号:US13150759

    申请日:2011-06-01

    IPC分类号: H01L21/00

    CPC分类号: H01L33/007

    摘要: Exemplary embodiments of the present invention relate to a method of fabricating a light emitting diode (LED). According to an exemplary embodiment of the present invention, the method includes growing a first GaN-based semiconductor layer on a substrate at a first temperature by supplying a chamber with a nitride source gas and a first metal source gas, stopping the supply of the first metal source gas and maintaining the first temperature for a first time period after stopping the supply of the first metal source gas, decreasing the temperature of the substrate to the a second temperature after the first time period elapses, growing an active layer of the first GaN-based semiconductor layer at the second temperature by supplying the chamber with a second metal source gas.

    摘要翻译: 本发明的示例性实施例涉及一种制造发光二极管(LED)的方法。 根据本发明的示例性实施例,该方法包括通过向室提供氮化物源气体和第一金属源气体,在第一温度下在衬底上生长第一GaN基半导体层,停止第一 金属源气体,并且在停止第一金属源气体的供给之后保持第一温度第一温度,在第一时间段之后将衬底的温度降低到第二温度,生长第一GaN的有源层 在第二温度下通过向腔室供应第二金属源气体。