METHOD FOR DIRECT INTEGRATION OF MEMORY DIE TO LOGIC DIE WITHOUT USE OF THRU SILICON VIAS (TSV)
    2.
    发明申请
    METHOD FOR DIRECT INTEGRATION OF MEMORY DIE TO LOGIC DIE WITHOUT USE OF THRU SILICON VIAS (TSV) 审中-公开
    无需使用硅橡胶(TSV)将记忆体直接集成到逻辑芯片上的方法

    公开(公告)号:US20170069598A1

    公开(公告)日:2017-03-09

    申请号:US15122630

    申请日:2014-06-16

    Abstract: A method including forming a first substrate including an integrated circuit device layer disposed between a plurality of first interconnects and a plurality of second interconnects; coupling a second substrate including a memory device layer to the first substrate so that the memory device layer is juxtaposed to one of the plurality of first interconnects and the plurality of second interconnects; and removing a portion of the first substrate. An apparatus including a device layer including a plurality of circuit devices disposed between a plurality of first interconnects and a plurality of second interconnects on a substrate; a memory device layer including a plurality of memory devices juxtaposed and coupled to one of the plurality of first interconnects and the plurality of second interconnects; and contacts points coupled to one of ones of the first plurality of interconnects and ones of the second plurality of interconnects.

    Abstract translation: 一种包括形成第一衬底的方法,所述第一衬底包括设置在多个第一互连和多个第二互连之间的集成电路器件层; 将包括存储器件层的第二衬底耦合到所述第一衬底,使得所述存储器件层与所述多个第一互连和所述多个第二互连中的一个并置; 以及去除所述第一基板的一部分。 一种装置,包括:器件层,包括设置在基板上的多个第一互连和多个第二互连之间的多个电路器件; 存储器件层,包括并置并耦合到所述多个第一互连和所述多个第二互连中的一个的多个存储器件; 以及联接到所述第一多个互连中的一个和所述第二多个互连中的一个的接触点。

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