Abstract:
A method including forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein forming ones of the plurality of first interconnects and a plurality of second interconnects includes embedding memory devices therein. An apparatus including a substrate including a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein ones of the plurality of first interconnects and a plurality of second interconnects includes memory devices embedded therein.
Abstract:
A method including forming a first substrate including an integrated circuit device layer disposed between a plurality of first interconnects and a plurality of second interconnects; coupling a second substrate including a memory device layer to the first substrate so that the memory device layer is juxtaposed to one of the plurality of first interconnects and the plurality of second interconnects; and removing a portion of the first substrate. An apparatus including a device layer including a plurality of circuit devices disposed between a plurality of first interconnects and a plurality of second interconnects on a substrate; a memory device layer including a plurality of memory devices juxtaposed and coupled to one of the plurality of first interconnects and the plurality of second interconnects; and contacts points coupled to one of ones of the first plurality of interconnects and ones of the second plurality of interconnects.