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公开(公告)号：US08067578B2
公开(公告)日：2011-11-29
申请号：US12634475
申请日：2009-12-09
申请人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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2.发明授权Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings 失效使用抗反射涂层的光刻合成聚合物阵列的方法公开(公告)号：US08309496B2
公开(公告)日：2012-11-13
申请号：US13273399
申请日：2011-10-14
申请人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20100331217A1
公开(公告)日：2010-12-30
申请号：US12634475
申请日：2009-12-09
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US5959098A
公开(公告)日：1999-09-28
申请号：US634053
申请日：1996-04-17
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , Macdonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , Macdonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C12N15/09 , B01J19/00 , C07B61/00 , C07H21/00 , C07K1/00 , C07K1/04 , C12Q1/68 , C40B40/06 , C40B40/10 , C40B60/14 , G01N33/53 , G01N37/00 , C08G63/48 , G01N33/543
CPC分类号： C07K1/047 , B01J19/0046 , B82Y30/00 , C07H21/00 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , C07B2200/11 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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公开(公告)号：US20120071361A1
公开(公告)日：2012-03-22
申请号：US13273399
申请日：2011-10-14
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20090062148A1
公开(公告)日：2009-03-05
申请号：US11500411
申请日：2006-08-08
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US06706875B1
公开(公告)日：2004-03-16
申请号：US09716507
申请日：2000-11-20
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C07H2100
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量工艺步骤与高分辨率光刻技术相结合 聚合物阵列的制造。
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公开(公告)号：US06307042B1
公开(公告)日：2001-10-23
申请号：US09244568
申请日：1999-02-04
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C12Q168
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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9.发明授权Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays 有权用于高分辨率光刻合成DNA阵列的抗反射涂层公开(公告)号：US08859196B2
公开(公告)日：2014-10-14
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译： 本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。 本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层 试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。
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10.发明申请Antireflective Coatings for High-Resolution Photolithographic Synthesis of DNA Array 有权用于高分辨率光刻合成DNA阵列的抗反射涂层公开(公告)号：US20120035083A1
公开(公告)日：2012-02-09
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
发明人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
IPC分类号： C40B50/18
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译： 本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。 本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层 试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。
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