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1.发明申请公开(公告)号：US20160130383A1
公开(公告)日：2016-05-12
申请号：US14896487
申请日：2014-06-16
发明人： Go HIGASHIHARA , Atsushi OKOSHI
摘要： There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. wherein R represents an organic group having 1 to 10 carbon atoms; l represents an integer of 0 to 2, and m and n represent integers satisfying 1≦m+n≦10, m≧0 and n≧1.
摘要翻译： 提供通过在酸性催化剂的存在下使由下式（1）表示的芳族烃化合物（A）与甲醛（B）反应得到的芳族烃甲醛树脂。 其中R表示具有1-10个碳原子的有机基团; l表示0〜2的整数，m和n表示满足1＆nlE的整数; m + n＆nlE; 10，m≥0，n≥1。
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2.发明申请公开(公告)号：US20160130384A1
公开(公告)日：2016-05-12
申请号：US14896489
申请日：2014-06-16
发明人： Go HIGASHIHARA , Atsushi OKOSHI
摘要： There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. wherein R represents an organic group having 1 to 10 carbon atoms; m and n represent integers satisfying 1≦m+n≦10, m≧0 and n≧1.
摘要翻译： 提供通过在酸性催化剂的存在下使由下式（1）表示的芳族烃化合物（A）与甲醛（B）反应得到的芳族烃甲醛树脂。 其中R表示具有1-10个碳原子的有机基团; m和n表示满足1＆nlE; m + n＆nlE; 10，m≥0和n≥1的整数。
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公开(公告)号：US20180052392A1
公开(公告)日：2018-02-22
申请号：US15555199
申请日：2016-02-19
IPC分类号： G03F7/11 , H01L21/027
CPC分类号： G03F7/11 , C08G14/12 , C08G73/0644 , G03F7/162 , G03F7/20 , G03F7/30 , G03F7/40 , H01L21/027 , H01L21/0276
摘要： The present invention provides a material for forming an underlayer film for lithography, including a cyanic acid ester compound obtained by cyanation of a modified naphthalene formaldehyde resin.
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4.发明申请CYANATE ESTER COMPOUND, CURABLE RESIN COMPOSITION CONTAINING SAID COMPOUND, AND CURED PRODUCT OF SAID COMPOSITION 审中-公开氰酸酯化合物，含有化合物的可固化树脂组合物和固化组合物的固化产物公开(公告)号：US20160115271A1
公开(公告)日：2016-04-28
申请号：US14784128
申请日：2014-06-16
IPC分类号： C08G10/04 , C08L71/00 , B32B27/28 , C09J161/18 , C09D161/18 , B32B15/08 , C08L63/00 , C08L61/18
CPC分类号： C08G10/04 , B32B7/12 , B32B15/08 , B32B15/14 , B32B27/28 , B32B2260/021 , B32B2260/046 , B32B2307/3065 , B32B2457/00 , C08G14/12 , C08G73/0655 , C08J5/24 , C08J2361/34 , C08J2379/04 , C08L61/18 , C08L61/34 , C08L63/00 , C08L71/00 , C08L79/04 , C09D161/18 , C09D161/34 , C09D179/04 , C09J161/18 , C09J161/34 , C09J179/04 , H05K1/0326 , H05K1/0346
摘要： The cyanate ester compound of the present invention is obtained by cyanating a modified naphthalene formaldehyde resin.
摘要翻译： 本发明的氰酸酯化合物通过将改性萘甲醛树脂进行氰化而得到。
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公开(公告)号：US20180101097A1
公开(公告)日：2018-04-12
申请号：US15565064
申请日：2016-04-07
CPC分类号： G03F7/11 , C08G8/28 , C08G10/04 , C08G73/06 , C08G73/0644 , C08G73/0655 , G03F7/094 , G03F7/26 , H01L21/0271 , H01L21/0273
摘要： A material for forming an underlayer film for lithography, including a cyanic acid ester compound obtained by cyanation of a modified xylene formaldehyde resin, a composition including the material, and a pattern forming method using the composition.
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公开(公告)号：US20180101096A1
公开(公告)日：2018-04-12
申请号：US15565018
申请日：2016-04-07
IPC分类号： G03F7/11 , C07C261/02 , C07D311/78 , C07C39/15 , C09D173/00 , C09D165/00 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , G03F7/039 , H01L21/308
CPC分类号： G03F7/11 , C07C39/15 , C07C261/02 , C07D311/78 , C09D165/00 , C09D173/00 , G03F7/039 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38 , H01L21/3081 , H01L21/3086
摘要： A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)
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7.发明申请公开(公告)号：US20170227849A1
公开(公告)日：2017-08-10
申请号：US15502456
申请日：2015-07-31
IPC分类号： G03F7/11 , C09D7/00 , G03F7/16 , G03F7/20 , H01L21/308 , G03F7/38 , G03F7/039 , G03F7/004 , H01L21/027 , H01L21/311 , C09D179/04 , G03F7/32
CPC分类号： G03F7/11 , C07C261/02 , C09D7/20 , C09D179/04 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0752 , G03F7/091 , G03F7/094 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38 , H01L21/027 , H01L21/0274 , H01L21/3081 , H01L21/3086 , H01L21/31116 , H01L21/31144
摘要： The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).
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