摘要:
A power supply, an over voltage protection (OVP) apparatus, and an OVP method are provided. The present invention employs the OVP apparatus for monitoring a core power. When a voltage level of the core power is higher than a reference voltage, the OVP apparatus disables a power supply unit. As such, the present invention is adapted for avoiding damage to a capacitor of a conversion unit or load caused by abnormal boost of the voltage level of the core power.
摘要:
A power supply, an over voltage protection (OVP) apparatus, and an OVP method are provided. The present invention employs the OVP apparatus for monitoring a core power. When a voltage level of the core power is higher than a reference voltage, the OVP apparatus disables a power supply unit. As such, the present invention is adapted for avoiding damage to a capacitor of a conversion unit or load caused by abnormal boost of the voltage level of the core power.
摘要:
A single-ended SRAM including at least one memory cell and a third switch is provided. The memory cell includes a data-latching unit, a first switch, a second switch and a data-transferring unit. The data-latching unit is configured for latching the received input data and provides a storage data and the inverse data of the storage data. The first switch transfers a reference data to the data-latching unit according to a first word-line signal. The second switch transfers the reference data to the data-latching unit according to a second word-line signal. The data-transferring unit decides whether or not to transfer the reference data to the bit-line according to the storage data and a control signal. The third switch receives the reference data and the control signal and transfers the reference data to the first switch, the second switch and the data-transferring unit according to the control signal.
摘要:
The present invention relates to a method for preventing an output device from being damaged, which comprises the steps of: dividing the output value of an output device into a plurality of areas, defining a ratio value to every area, receiving a desired output value, determining the current area where the desired output value device is located, and calculating the desired output value with the ratio value to obtain an actual output volume and output the actual output volume.
摘要:
A multi-processor system and a performance adjustment method thereof are disclosed. The multi-processor system includes a first processing unit and a second processing unit, the performance adjustment method includes: first, detecting the load of each processing unit to obtain corresponding detected data; then, determining whether one of the processing units has the most load; finally, if the first processing unit has the most load, increasing the power supply to the first processing unit.
摘要:
A single-ended SRAM including at least one memory cell and a third switch is provided. The memory cell includes a data-latching unit, a first switch, a second switch and a data-transferring unit. The data-latching unit is configured for latching the received input data and provides a storage data and the inverse data of the storage data. The first switch transfers a reference data to the data-latching unit according to a first word-line signal. The second switch transfers the reference data to the data-latching unit according to a second word-line signal. The data-transferring unit decides whether or not to transfer the reference data to the bit-line according to the storage data and a control signal. The third switch receives the reference data and the control signal and transfers the reference data to the first switch, the second switch and the data-transferring unit according to the control signal.
摘要:
The present invention relates to a method for preventing an output device from being damaged, which comprises the steps of: dividing the output value of an output device into a plurality of areas, defining a ratio value to every area, receiving a desired output value, determining the current area where the desired output value device is located, and calculating the desired output value with the ratio value to obtain an actual output volume and output the actual output volume.
摘要:
A method of measuring dimensional characteristics includes providing a substrate and forming a reflective layer over the substrate. A dielectric layer is then formed over the reflective layer. The dielectric layer includes a grating pattern and a resistivity test line inset in a transparent region. Radiation is then directed onto the dielectric layer so that some of the radiation is transmitted through the transparent region to the reflective layer. A radiation pattern is then detected from the radiation reflected and scattered by the metal grating pattern. The radiation pattern is analyzed to determine a first dimensional information. Then the resistance of the resistivity test line is measured, and that resistance is analyzed to determine a second dimensional information. The first and second dimensional informations are then compared.
摘要:
A multi-processor system and a performance adjustment method thereof are disclosed. The multi-processor system includes a first processing unit and a second processing unit, the performance adjustment method includes: first, detecting the load of each processing unit to obtain corresponding detected data; then, determining whether one of the processing units has the most load; finally, if the first processing unit has the most load, increasing the power supply to the first processing unit.
摘要:
A method of measuring dimensional characteristics includes providing a substrate and forming a reflective layer over the substrate. A dielectric layer is then formed over the reflective layer. The dielectric layer includes a grating pattern and a resistivity test line inset in a transparent region. Radiation is then directed onto the dielectric layer so that some of the radiation is transmitted through the transparent region to the reflective layer. A radiation pattern is then detected from the radiation reflected and scattered by the metal grating pattern. The radiation pattern is analyzed to determine a first dimensional information. Then the resistance of the resistivity test line is measured, and that resistance is analyzed to determine a second dimensional information. The first and second dimensional informations are then compared.