公开(公告)号：US20230176482A1

公开(公告)日：2023-06-08

申请号：US18060629

申请日：2022-12-01

Applicant: SEMES CO., LTD.

Inventor： Hae Kyung KIM ,  Dae Sung Kim ,  Woo Sin Jung

IPC: G03F7/16 ,  B05C11/10

CPC classification number: G03F7/16 ,  B05C11/1026 ,  B05C11/1013 ,  B05C11/1036

Abstract: Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.

公开(公告)号：US11752530B2

公开(公告)日：2023-09-12

申请号：US17073338

申请日：2020-10-17

Applicant: SEMES CO., LTD.

Inventor： Woo Sin Jung ,  Sang Eun Noh ,  Dae Sung Kim

IPC: B08B3/14 ,  B08B3/12 ,  B08B13/00 ,  H01L21/02

CPC classification number: B08B3/14 ,  B08B3/12 ,  B08B13/00 ,  H01L21/02057

Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.

公开(公告)号：US11845090B2

公开(公告)日：2023-12-19

申请号：US16918341

申请日：2020-07-01

Applicant: SEMES CO., LTD.

Inventor： Chang Suk Oh ,  Woo Sin Jung ,  UnKyu Kang

IPC: B05B1/16 ,  B05B7/06 ,  B05B12/00 ,  B05B12/04 ,  B05B14/00 ,  B05B15/555 ,  B05B16/20 ,  B08B3/02 ,  G03F7/16 ,  G03F7/30 ,  H01L21/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: B05B1/16 ,  B05B7/061 ,  B05B7/062 ,  B05B12/00 ,  B05B12/04 ,  B05B14/00 ,  B05B15/555 ,  B05B16/20 ,  B08B3/02 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/6715 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67259 ,  H01L21/68764 ,  Y02P70/10

Abstract: An apparatus for performing liquid treatment for a substrate is provided. The apparatus for performing the liquid treatment for the substrate may include a housing having a treatment space, a substrate support unit to support and rotate the substrate in the treatment space, a liquid feeding unit including a nozzle device including a central exhaust port and multiple first outer exhaust ports, which are provided in a shape of a ring to form a concentric circle with the central exhaust port to feed mutually different treating liquids onto the substrate through respective exhaust ports, and a controller to control the liquid feeding unit.

公开(公告)号：US20230313791A1

公开(公告)日：2023-10-05

申请号：US18105878

申请日：2023-02-05

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin Jung ,  Woo Ram Lee ,  Byoung Doo Choi ,  Sung Chul Jung

IPC: F04B43/10 ,  F04B43/00 ,  B05B9/04

CPC classification number: F04B43/10 ,  F04B43/0072 ,  B05B9/0406

Abstract: Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.