公开(公告)号：US20170084417A1

公开(公告)日：2017-03-23

申请号：US15310627

申请日：2014-05-13

Applicant: Samsung Electronics Co., Ltd. ,  Kumoh National Institute of Technology Industry- Academic Cooperation Foundation

Inventor： Shanghyeun PARK ,  Donggu LEE ,  Ilhwan KIM ,  Jaekyung SUNG ,  Changsoo LEE ,  Dongsu KANG ,  Euna YU

IPC: H01J19/24 ,  H01J19/44 ,  H01J19/38 ,  H01J9/02 ,  H01J9/14

CPC classification number: H01J19/24 ,  H01J1/30 ,  H01J9/022 ,  H01J9/148 ,  H01J19/38 ,  H01J19/44 ,  H01J2209/022

Abstract: Disclosed are an electron emitting device using graphene and a method for manufacturing the same. The electron emitting device includes a metal holder having at least one slot, at least one emitter plate inserted into the slot to protrude from a first surface of the metal holder, and including an emitter supporting member and a graphene emitter attached onto the emitter supporting member, an insulation layer provided on the first surface of the metal holder, and a gate electrode provided on the insulation layer and including a gate supporting member and a graphene gate attached onto the gate supporting member.

公开(公告)号：US06827823B2

公开(公告)日：2004-12-07

申请号：US10094622

申请日：2002-03-12

Applicant: Hirofumi Takikawa ,  Yoshihiko Hibi ,  Shigeo Itoh

Inventor： Hirofumi Takikawa ,  Yoshihiko Hibi ,  Shigeo Itoh

IPC: B01J1908

CPC classification number: B82Y30/00 ,  B01J19/088 ,  B01J2219/082 ,  B01J2219/0839 ,  B01J2219/0869 ,  B01J2219/0875 ,  B01J2219/0879 ,  B01J2219/0892 ,  B01J2219/0894 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/152 ,  C01B32/162 ,  C01B2202/02 ,  H01J37/32055 ,  H01J2201/30469 ,  H01J2209/022 ,  H05H1/48 ,  H05H2001/483 ,  H05H2245/124 ,  Y10S977/844 ,  Y10T428/30

Abstract: Described herein is a method of preparing nano-carbon; a method of preparing an electron emitting source by supporting the soot; and an apparatus for preparing the same. A torch electrode 10 of an arc torch 1 as a first electrode is placed opposite to a material to be arced 2 using graphite as a second electrode. A voltage is applied between the torch electrode 10 and an edge portion of the material to be arced 2 to generate are discharge, to evaporate the edge portion of the material to be arced 2 exposed to the arc discharge, to generate soot. The soot thus generated is deposited on the surface of a substrate opposite to an arc discharge-generating area through a mask having a patterned opening.

Abstract translation: 本文描述了制备纳米碳的方法; 一种通过支持烟灰来制备电子发射源的方法; 及其制备装置。 作为第一电极的电弧焊炬1的焊炬电极10与使用石墨作为第二电极的待弧焊材料2相对放置。 在焊炬电极10和待弧形材料2的边缘部分之间施加电压以产生放电，以使待暴露于电弧放电的待蚀刻材料的边缘部分蒸发，以产生烟灰。 这样生成的烟炱通过具有图案化开口的掩模沉积在与电弧放电产生区域相对的基板的表面上。

公开(公告)号：US08367551B2

公开(公告)日：2013-02-05

申请号：US11388670

申请日：2006-03-23

Applicant: Steven Dale Ittel

Inventor： Steven Dale Ittel

IPC: H01L21/302 ,  H01L21/461

CPC classification number: H01L21/302 ,  C23F1/02 ,  C23F1/14 ,  C23F1/20 ,  C23F1/36 ,  H01J2209/022 ,  H01L51/0019 ,  H01L51/0021 ,  H01L51/0023 ,  H05B3/84 ,  H05B2203/017 ,  H05K3/067 ,  H05K2203/0126 ,  Y02E10/549

Abstract: The present invention is directed to processes for printing compositions containing etchants or modifiers onto surfaces by spinning a filament from a viscoelastic polymer solution containing an etchant or modifier. The present invention also relates to viscoelastic compositions used in the printing processes, and devices made therefrom.

Abstract translation: 本发明涉及通过从含有蚀刻剂或改性剂的粘弹性聚合物溶液中纺丝丝来将含有蚀刻剂或改性剂的组合物印刷在表面上的方法。 本发明还涉及用于印刷方法中的粘弹性组合物以及由其制成的装置。

公开(公告)号：US5965218A

公开(公告)日：1999-10-12

申请号：US819283

申请日：1997-03-18

Applicant: Subhas Bothra ,  Ling Q. Qian

Inventor： Subhas Bothra ,  Ling Q. Qian

IPC: G01Q70/06 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/14 ,  G01Q70/16 ,  B05D5/12 ,  H01J9/04 ,  H05H1/24

CPC classification number: G01Q60/16 ,  B82Y35/00 ,  G01Q60/38 ,  H01J2209/022

Abstract: A method for manufacturing probe tips suitable for use in an atomic force microscope (AFM) or scanning tunneling microscope (STM) begins by depositing a layer of a first material over a substrate and then patterning the layer of the first material to define apertures wherever probe tips are to be formed. Next, a layer of a second material is deposited using an unbiased high density plasma chemical vapor deposition (HDPCVD) process to form sharp probe tips in the apertures in the layer of the first material. The HDPCVD process also forms a sacrificial layer of the second material on top of the portions of the first material not removed by the patterning step. The sacrificial layer at least partially overhangs the apertures in the first material, forming a shadow mask during the deposition process which gives rise to a sharp probe profile. After the formation of the probe tips, the remaining portion of the layer of first material is removed using a wet chemical etchant that selectively etches the first material at a much higher rate than the second material. The removing step also removes the sacrificial layer of the second material because the sacrificial layer is lifted off the substrate when the underlying layer of first material is etched away. In one preferred embodiment, the first material is silicon nitride and the second material is silicon dioxide.

Abstract translation: 用于制造适于在原子力显微镜（AFM）或扫描隧道显微镜（STM）中使用的探针尖端的方法开始于在衬底上沉积第一材料层，然后对第一材料的层进行图案以在探针 要形成技巧。 接下来，使用无偏高密度等离子体化学气相沉积（HDPCVD）工艺沉积第二材料层，以在第一材料层中的孔中形成尖锐的探针尖端。 HDPCVD工艺还在未被图案化步骤去除的第一材料的部分的顶部上形成第二材料的牺牲层。 牺牲层至少部分地悬挂在第一材料中的孔中，在沉积过程期间形成荫罩，其产生尖锐的探针轮廓。 在形成探针尖端之后，使用湿化学蚀刻剂去除第一材料层的剩余部分，其以比第二材料高得多的速率选择性地蚀刻第一材料。 当第一材料的下层被蚀刻掉时，去除步骤也会去除第二材料的牺牲层，因为牺牲层被从衬底上提起。 在一个优选实施例中，第一材料是氮化硅，第二材料是二氧化硅。

公开(公告)号：US09991081B2

公开(公告)日：2018-06-05

申请号：US15310627

申请日：2014-05-13

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Kumoh National Institute of Technology Industry-Academic Cooperation Foundation

Inventor： Shanghyeun Park ,  Donggu Lee ,  Ilhwan Kim ,  Jaekyung Sung ,  Changsoo Lee ,  Dongsu Kang ,  Euna Yu

IPC: H01J19/24 ,  H01J19/44 ,  H01J19/38 ,  H01J9/02 ,  H01J1/30 ,  H01J9/14

CPC classification number: H01J19/24 ,  H01J1/30 ,  H01J9/022 ,  H01J9/148 ,  H01J19/38 ,  H01J19/44 ,  H01J2209/022

Abstract: Disclosed are an electron emitting device using graphene and a method for manufacturing the same. The electron emitting device includes a metal holder having at least one slot, at least one emitter plate inserted into the slot to protrude from a first surface of the metal holder, and including an emitter supporting member and a graphene emitter attached onto the emitter supporting member, an insulation layer provided on the first surface of the metal holder, and a gate electrode provided on the insulation layer and including a gate supporting member and a graphene gate attached onto the gate supporting member.

公开(公告)号：US20060264049A1

公开(公告)日：2006-11-23

申请号：US11388670

申请日：2006-03-23

Applicant: Steven Ittel

Inventor： Steven Ittel

IPC: H01L21/302

CPC classification number: H01L21/302 ,  C23F1/02 ,  C23F1/14 ,  C23F1/20 ,  C23F1/36 ,  H01J2209/022 ,  H01L51/0019 ,  H01L51/0021 ,  H01L51/0023 ,  H05B3/84 ,  H05B2203/017 ,  H05K3/067 ,  H05K2203/0126 ,  Y02E10/549

Abstract: The present invention is directed to processes for printing compositions containing etchants or modifiers onto surfaces by spinning a filament from a viscoelastic polymer solution containing an etchant or modifier. The present invention also relates to viscoelastic compositions used in the printing processes, and devices made therefrom.

公开(公告)号：US20020127351A1

公开(公告)日：2002-09-12

申请号：US10094622

申请日：2002-03-12

Applicant: Futaba Corporation

Inventor： Hirofumi Takikawa ,  Yoshihiko Hibi ,  Shigeo Itoh

IPC: H05H001/24 ,  B05D001/32

CPC classification number: B82Y30/00 ,  B01J19/088 ,  B01J2219/082 ,  B01J2219/0839 ,  B01J2219/0869 ,  B01J2219/0875 ,  B01J2219/0879 ,  B01J2219/0892 ,  B01J2219/0894 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/152 ,  C01B32/162 ,  C01B2202/02 ,  H01J37/32055 ,  H01J2201/30469 ,  H01J2209/022 ,  H05H1/48 ,  H05H2001/483 ,  H05H2245/124 ,  Y10S977/844 ,  Y10T428/30

Abstract: There are provided a method of preparing nano-carbon comprising evaporating a material to be arced containing carbon as a main component by means of arc discharge which does not necessarily require a process container and so on, but uses an apparatus having a welding arc torch or an analogous structure to generate soot, a method of preparing an electron emitting source by supporting the soot, and an apparatus for preparing the same. A torch electrode 10 of an arc torch 1 as a first electrode is placed opposite to a material to be arced 2 using graphite as a second electrode. A voltage is applied between the torch electrode 10 and an edge portion of the material to be arced 2 to generate arc discharge, to evaporate the edge portion of the material to be arced 2 exposed to the arc discharge, to generate soot. The soot thus generated is deposited on the surface of a substrate opposite to an arc discharge-generating area through a mask having a patterned opening.

Abstract translation: 提供了一种制备纳米碳的方法，其包括通过不需要处理容器等的电弧放电蒸发含有作为主要成分的碳的待煅烧材料，但是使用具有焊接电弧焊炬或 用于产生烟灰的类似结构，通过支持烟灰制备电子发射源的方法及其制备装置。 作为第一电极的电弧焊炬1的焊炬电极10与使用石墨作为第二电极的待弧焊材料2相对放置。 在焊炬电极10和待弧形材料2的边缘部分之间施加电压以产生电弧放电，以使待暴露于电弧放电的待蚀刻材料的边缘部分蒸发，以产生烟灰。 这样生成的烟炱通过具有图案化开口的掩模沉积在与电弧放电产生区域相对的基板的表面上。