摘要:
Systems and methods are described for addressable field emission array (AFEA) chips. A method of operating an addressable field-emission array, includes: generating a plurality of electron beams from a pluralitly of emitters that compose the addressable field-emission array; and focusing at least one of the plurality of electron beams with an on-chip electrostatic focusing stack. The systems and methods provide advantages including the avoidance of space-charge blow-up.
摘要:
The present invention provides for nanostructures grown on a conducting or insulating substrate, and a method of making the same. The nanostructures grown according to the claimed method are suitable for interconnects and/or as heat dissipators in electronic devices.
摘要:
The present invention provides for nanostructures grown on a conducting or insulating substrate, and a method of making the same. The nanostructures grown according to the claimed method are suitable for interconnects and/or as heat dissipators in electronic devices.
摘要:
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission from particular nanotips within the array. The nanotip array may be used to cure a resist, produce localized electrochemical reactions, establish localized electrostatic charge distributions, or perform other desirable coating or etching process steps so as to create nanoelectronic circuitry or to facilitate molecular or nanoscale processing.
摘要:
An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
摘要:
The present invention provides for an array of nanostructures grown on a conducting substrate. The array of nanostructures as provided herein is suitable for manufacturing electronic devices such as an electron beam writer, and a field emission device.
摘要:
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission from particular nanotips within the array. The nanotip array may be used to cure a resist, produce localized electrochemical reactions, establish localized electrostatic charge distributions, or perform other desirable coating or etching process steps so as to create nanoelectronic circuitry or to facilitate molecular or nanoscale processing.
摘要:
An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
摘要:
A digital electron lithography system includes a plurality of cathodes oriented in a plane and positioned substantially parallel to a substrate surface in a vacuum chamber. The substrate surface is coated with a layer of an electron resist material and, in operation, individual cathodes in the array are selectively activated to emit electrons which alter the resist material. In order to create a predetermined pattern on the substrate, a focusing magnet is provided to direct the electrons from the respective cathodes to be focused on the substrate surface along substantially parallel electron paths. Additionally, a steering magnet is provided to change electron path directions so that electrons are steered to sequentially affect a plurality of pixels in a pixel matrix on the substrate surface. To minimize ion damage to the cathodes the electron paths are oriented at an angle to the perpendicular direction between the plane of the array and the substrate surface. Further, to compensate for defective cathodes, a preprogrammed sequence of cathode activation is accomplished whereby active cathodes affect the pixel matrices of adjacent defective cathodes.
摘要:
A method of manufacturing an electron emission aperture of an electron beam generator using the associated electron beam generator and the cathode of the generator which emits electrons at a plurality of points, as well as aperture lenses, and employing electron projection lithography. The associated electron beams are used to burn the emission spot pattern of the associated cathode into an electron-sensitive layer of a blank of a perforated mask, through holes in the mask are produced by etching at the burn spots, individual aperture spots corresponding to the emission spot pattern are burned into an electron-sensitive layer of a blank of the aperture through the through holes using the perforated mask and the associated electron beams, and the blind holes near the spots are etched allowing their individual apertures and a supporting grid to remain.