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公开(公告)号：US20100091258A1
公开(公告)日：2010-04-15
申请号：US12574231
申请日：2009-10-06
CPC分类号： G03B27/32 , G03F7/70625 , G03F7/70633 , G03F7/7085
摘要： A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.
摘要翻译： 一种用于测量衬底特性的方法和装置。 在基板上存在靶，并且在基板的扫描运动期间进行测量。 基板的扫描运动是线性运动，并且测量包括使用脉冲光源获得目标的反射图像，单个光脉冲的持续时间小于100psec。 光刻设备包括这样的测量设备，并且包括这种测量方法的设备制造方法。
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92.发明授权Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus 有权测量散射仪中的不对称的方法，测量衬底中的重叠误差的方法和测量装置公开(公告)号：US07656518B2
公开(公告)日：2010-02-02
申请号：US11729962
申请日：2007-03-30
IPC分类号： G01N21/00
CPC分类号： G01N21/4785 , G03F7/70516 , G03F7/70616 , G03F7/70633
摘要： In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.
摘要翻译： 在测量散射仪中的不对称性的方法中，目标部分被照射两次，首先是基板旋转的0°，其次是基板旋转180°。 其中一个图像被旋转，然后从另一个图像中减去旋转的图像。 以这种方式，可以校正散射仪的不对称性。
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93.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method 有权检测方法和装置，光刻设备，光刻处理单元和装置方法公开(公告)号：US07589832B2
公开(公告)日：2009-09-15
申请号：US11501911
申请日：2006-08-10
IPC分类号： G01N21/00
CPC分类号： G02B27/58 , G01N21/4788 , G03F7/70633
摘要： In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control the spot size on the substrate. The field stop may be apodized, e.g. having a transmissivity in the form of a trapezium or a Gaussian shape.
摘要翻译： 在具有照明孔径光阑的散射测量装置中，在中间图像处设置场停止件，以控制衬底上的斑点尺寸。 野外停止可以变迹，例如 具有呈梯形或高斯形状的透射率。
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公开(公告)号：US07580131B2
公开(公告)日：2009-08-25
申请号：US11785426
申请日：2007-04-17
CPC分类号： G01N21/47 , G01N21/956 , G01N2021/95615
摘要： In an angularly resolved scatterometer, an aperture plate including at least one obscuration extending into the image of the pupil plane is provided. Defocus values of a target pattern are determined from the radial distance between the innermost point of the images of the obscurations and the nominal center if the pupil image. Defocus errors are compensated for by capturing a plurality of normalization images using a reference plate at a plurality of different defocus positions and subtracting a suitable normalization from the measurement spectrum of a target pattern.
摘要翻译： 在角度分辨的散射仪中，提供了包括延伸到瞳孔平面图像中的至少一个遮蔽物的孔板。 如果瞳孔图像，目标图案的散焦值从遮蔽图像的最内点与标称中心之间的径向距离确定。 通过使用多个不同散焦位置处的参考板捕获多个归一化图像并从目标图案的测量光谱中减去合适的归一化来补偿散焦误差。
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公开(公告)号：US07564534B2
公开(公告)日：2009-07-21
申请号：US11987325
申请日：2007-11-29
CPC分类号： G03F9/7088 , G03B27/32 , G03F9/7049 , G03F9/7076 , Y10T428/24802
摘要： An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
摘要翻译： 对准系统使用自参考干涉仪，其产生对准标记物的两个重叠且相对旋转的图像。 检测器检测在使图像的傅立叶变换被干扰的光瞳平面中的强度。 位置信息是从两个图像的衍射级之间的相位差导出的，其表现为受干扰顺序的强度变化。 也可以通过在衍射级的任一侧的两个位置处测量强度来测量不对称性。
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96.发明申请Lithographic Apparatus and Device Manufacturing Method with Reduced Scribe Lane Usage for Substrate Measurement 有权平版印刷设备和器件制造方法，具有减少的刻痕通道用于基板测量公开(公告)号：US20090027691A1
公开(公告)日：2009-01-29
申请号：US12141640
申请日：2008-06-18
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos
CPC分类号： G03F7/70433 , G03F7/70625 , G03F7/70633 , G03F9/7049 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： In a device manufacturing method and a metrology apparatus, metrology measurements are executed using radiation having a first wavelength. Subsequently a grid of conducting material is applied on the substrate, the grid having grid openings which in a first direction in the plane of the grid are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
摘要翻译： 在装置制造方法和计量装置中，使用具有第一波长的辐射来执行度量测量。 随后，将导电材料栅格施加在基板上，栅格具有在栅格平面中的第一方向上的栅格开口小于第一波长。 测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。
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97.发明授权Lithographic apparatus and device manufacturing method using overlay measurement quality indication 有权平版印刷设备和设备制造方法使用覆盖测量质量指示公开(公告)号：US07391513B2
公开(公告)日：2008-06-24
申请号：US11391690
申请日：2006-03-29
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
CPC分类号： G03F7/70633 , G03F7/70483
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.
摘要翻译： 布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个 相对于各个参考光栅的方向。 使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。 测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和 过程依赖值。
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98.发明申请公开(公告)号：US20080144036A1
公开(公告)日：2008-06-19
申请号：US11641124
申请日：2006-12-19
IPC分类号： G01N21/47
CPC分类号： G03F7/70633 , H01L22/12
摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.
摘要翻译： 检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。 第一辐射束被投影到第一目标上，并且检测到反射辐射A 1 +。 第一个目标包括两个相对于彼此具有偏压+ d的光栅。 第一辐射束也被投影到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射的辐射A 1 - 。 具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测并反射辐射A 2 + 2并将其投影到第二目标和反射辐射A 检测到<2> 。 检测到的辐射使用1 ，1 ，2 和A 2 - 来确定 重叠错误。
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公开(公告)号：US09535322B2
公开(公告)日：2017-01-03
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译： 一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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100.发明授权Level sensor arrangement in a lithographic apparatus for measuring multi-layer surfaces 有权用于测量多层表面的光刻设备中的液位传感器布置公开(公告)号：US09279657B2
公开(公告)日：2016-03-08
申请号：US13569680
申请日：2012-08-08
CPC分类号： G01B9/02007 , G01B9/02015 , G01B11/0675 , G03F9/7034
摘要： Disclosed is a method of measuring a position of at least one substantially reflective layer surface on a substrate in a lithographic apparatus, and associated level sensor and lithographic apparatuses. The method comprises performing at least two interferometrical measurements using a broadband light source. Between each measurement, the component wavelengths and/or intensity levels over the component wavelengths of the broadband source beam is varied such that, where it is only the intensity levels that are varied, the intensity variation is different for at least some of the beam's component wavelengths. Alternatively, a single measurement and subsequent processing of the measurement to obtain measurement data whereby the component wavelengths and/or intensity levels over the component wavelengths are different can be applied as well to obtain the position.
摘要翻译： 公开了一种测量光刻设备中的基板上的至少一个基本上反射层表面的位置的方法，以及相关联的液位传感器和光刻设备。 该方法包括使用宽带光源执行至少两个干涉测量。 在每个测量之间，宽带源光束的分量波长上的分量波长和/或强度水平是变化的，使得在仅仅是强度级别变化的情况下，强度变化对于至少一些光束的分量是不同的 波长。 或者，可以应用测量的单次测量和后续处理以获得测量数据，从而分量波长和/或分量波长上的分量波长和/或强度水平不同，以获得位置。
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