摘要:
A nonvolatile read-only memory device, wherein a word line is on a substrate and the word line includes a metal layer and a polysilicon line. A trapping layer is further located between the word line and the substrate. A polysilicon protection line is formed over the substrate and the polysilicon protection line connects the word line and a grounded doped region in the substrate, wherein the resistance of the polysilicon protection line is higher than that of the word line.
摘要:
A nonvolatile read-only memory device, wherein a word line is on a substrate and the word line includes a metal layer a polysilicon line. A trapping layer is further located between the word line and the substrate. A polysilicon protection line is formed over the substrate and the polysilicon protection line connects the word line and a grounded doped region in the substrate, wherein the resistance of the polysilicon protection line is higher than that of the word line.
摘要:
A method of forming an NROM comprising mixed-signal circuits is provided. The method starts by providing a semiconductor substrate having a memory area and a periphery area. The periphery area has a plurality of active areas isolated by an isolation layer. A bottom electrode of a capacitor is formed atop the isolation layer in the periphery area. An ONO(oxide-nitride-oxide) process is performed. A photolithography, an anisotropic etching, and an ion implantation process are performed in order to etch the ONO dielectric layer in a bit line region not protected by the first photolithography process, and to form a plurality of buried bit lines. A photolithography and an ion implantation process are performed in order to form at least one ion well. The surface of the active area in the periphery area is wet etched. An oxidation process is performed in order to simultaneously form at least one gate oxide layer with a specific thickness in the active area, and to form a thermal oxide layer atop each of the buried bit lines in the memory area. Each of the gates, the top electrode of the capacitor and the resistor are formed in the periphery area, and a word line is formed in the memory area.
摘要:
A fabrication method for a nonvolatile memory with a shallow junction is described. A gate structure, comprising an electron-trapping layer and a conductive layer, is formed on a substrate. A doped spacer is formed on the sidewall of the gate structure. Buried bit lines are further formed in the substrate beside the gate structure. Thereafter, thermal process is conducted to diffuse the dopants from the doped spacer into the substrate adjacent to the buried bit lines.
摘要:
An ONO dielectric layer is formed on the surface of a substrate, and then a plurality of bit lines are formed in the substrate by utilizing a photolithography and an ion implantation process. Thereafter the ONO dielectric layer in the periphery area is removed and the threshold voltage of the periphery transistor is adjusted. After the ONO dielectric layer in the read only memory area is removed, and a buried drain oxide layer and a plurality of gate oxide layers are formed atop each bit line and the surface of each device respectively. Then each word line in the memory area and each gate of each periphery transistor in the periphery area is formed so as to simultaneously form at least a nitride read only memory in the nitride read only memory area and a high, low threshold voltage device in the read only memory area. Finally the threshold voltage of the high threshold voltage device is adjusted by utilizing a ROM code implantation process.
摘要:
A method for detecting and removing scrolling texts comprising a step of using an adaptive transient difference processing of video communication to conduct frame calculation, wherein the adaptive transient difference processing takes first N frames fjkt−N and a current frame fjkt, and subtracts them to obtain a frame difference; and if the frame difference is greater than a threshold value, it is determined that the current frame fjkt has scrolling texts; and interpolates the first N frames before the current position of the scrolling texts to replace the current frame fjkt to achieve the goal of hiding the scrolling texts during video communication to enhance the viewing effect.
摘要:
An embodiment of the present invention provides an electronic device package, which includes a chip having a first surface and an opposite second surface and a trench extending into a body of the chip along a direction from the second surface to the first surface, wherein a bottom portion of the trench includes at least two contact holes.
摘要:
A method for detecting and removing scrolling texts comprising a step of using an adaptive transient difference processing of video communication to conduct frame calculation, wherein the adaptive transient difference processing takes first N frames fjkt−N and a current frame fjkt, and subtracts them to obtain a frame difference; and if the frame difference is greater than a threshold value, it is determined that the current frame fjkt has scrolling texts; and interpolates the first N frames before the current position of the scrolling texts to replace the current frame fjkt to achieve the goal of hiding the scrolling texts during video communication to enhance the viewing effect.
摘要:
An accessing device communicating with a host device and including a connector, a storage unit and a control unit is disclosed. The connector connects to the host device. The storage unit stores data. The control unit communicates with the storage unit according to a first communication protocol and communicates with the host device via the connector according to a second communication protocol. The control unit determines the kind of the second communication protocol according to selection information.
摘要:
The invention provides a chip package and fabrication method thereof. In one embodiment, the chip package includes: a semiconductor substrate having opposite first and second surfaces, at least one bond pad region and at least one device region; a plurality of conductive pad structures disposed on the bond pad region at the first surface of the semiconductor substrate; a plurality of heavily doped regions isolated from one another, underlying and electrically connected to the conductive pad structures; and a plurality of conductive bumps underlying the heavily doped regions and electrically connected to the conductive pad structures through the heavily-doped regions.