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112 条记录 (耗时 0.08 秒)

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    92.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US07375795B2

    公开(公告)日：2008-05-20

    申请号：US11018930

    申请日：2004-12-22

    申请人： Joeri Lof ,  Jeroen Fluit ,  Bernardus Antonius Johannes Luttikhuis ,  Peter Spit

    发明人： Joeri Lof ,  Jeroen Fluit ,  Bernardus Antonius Johannes Luttikhuis ,  Peter Spit

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70791 ,  G03F7/70291

    摘要： Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.

    摘要翻译： 基板处理装置包括光刻设备，该光刻设备包括用于提供投射辐射束的照明系统，用于使投影光束在其横截面上具有图案的独立可控元件的阵列，以及投影系统， 到基板的目标部分上。 处理装置还包括布置成输出至少一个不间断长度的基板的基板供给源，以及基板输送系统，其布置成将基板的每个输出的不间断长度从基板供给输送并经过投影系统，使得投影系统能够 沿着每个不间断长度的衬底将图案化的光束投影到一系列目标部分上。 在某些实施例中，长的基底是从卷筒供应的，但也可以提供一系列单独的片材。

    Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
    93.
    发明申请
    Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor 有权
    平版印刷设备和器件制造方法以及由此制造的器件用于校准具有传感器的成像系统

    公开(公告)号：US20060279719A1

    公开(公告)日：2006-12-14

    申请号：US11150882

    申请日：2005-06-13

    申请人： Willem Venema ,  Anastasius Bruinsma ,  Joeri Lof ,  Eduardus Boon

    发明人： Willem Venema ,  Anastasius Bruinsma ,  Joeri Lof ,  Eduardus Boon

    IPC分类号： G03B27/72

    CPC分类号： G03F7/7085 ,  G03F7/70291 ,  G03F7/70516

    摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.

    摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统，衬底台和传感器系统。 照明系统提供一束辐射。 独立可控元件的阵列使光束成像。 投影系统将图案化的光束投射到目标平面上，图案化的光束包括辐射点阵列。 衬底台支撑衬底，使得衬底的目标表面基本上与靶平面重合。 传感器系统包括被布置成接收至少一个斑点的检测器元件的阵列。 传感器系统测量该接收点或每个接收点的能量，并提供指示该或每个接收点的能量的输出信号。

    Methods and systems for lithographic gray scaling
    94.
    发明申请
    Methods and systems for lithographic gray scaling 有权
    光刻灰度法的方法和系统

    公开(公告)号：US20060139597A1

    公开(公告)日：2006-06-29

    申请号：US11024030

    申请日：2004-12-29

    申请人： Joeri Lof ,  Pieter De Jager ,  Joannes De Smit

    发明人： Joeri Lof ,  Pieter De Jager ,  Joannes De Smit

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70283

    摘要： Improved gray scaling imaging methods and systems include a group of elements within an array of individually controllable elements that project a part of a radiation beam onto a lens in an array of microlenses, and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale.

    摘要翻译： 改进的灰度成像方法和系统包括在独立可控元件阵列内的一组元件，其将辐射束的一部分投影到微透镜阵列中的透镜上，并且是可单独控制的，使得任何数量的独立可控元件可以 打开或关闭以生成灰度级。

    Lithographic apparatus and device manufacturing method
    96.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050286032A1

    公开(公告)日：2005-12-29

    申请号：US10873650

    申请日：2004-06-23

    申请人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

    发明人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

    IPC分类号： G03F7/20 ,  G03B27/42

    CPC分类号： G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。

    Calibration method for a lithographic apparatus and device manufacturing method
    97.
    发明申请
    Calibration method for a lithographic apparatus and device manufacturing method 有权
    光刻设备的校准方法及器件制造方法

    公开(公告)号：US20050024643A1

    公开(公告)日：2005-02-03

    申请号：US10871699

    申请日：2004-06-21

    申请人： Arno Bleeker ,  Henricus Van Buel ,  Joeri Lof

    发明人： Arno Bleeker ,  Henricus Van Buel ,  Joeri Lof

    IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G03C5/00

    CPC分类号： G03F9/7019 ,  G03F7/70291 ,  G03F9/7011

    摘要： A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

    摘要翻译： 一种校准方法，包括用独立可控元件的阵列生成图案，使用辐射来提供具有辐射传感器的衬底台，以在衬底台上产生图案的图像，移动所生成的图案和衬底台中的至少一个 相对于彼此相对于传感器移动图像，利用传感器检测辐射强度，并且计算建立单独可控元件的阵列的坐标系的坐标与坐标系的坐标之间的关系的校准 基于检测到的强度和单独可控元件阵列的位置和基板台。

    Individual wafer history storage for overlay corrections
    100.
    发明申请
    Individual wafer history storage for overlay corrections 有权
    单独的晶圆历史存储用于覆盖修正

    公开(公告)号：US20080030701A1

    公开(公告)日：2008-02-07

    申请号：US11498268

    申请日：2006-08-03

    申请人： Joeri Lof

    发明人： Joeri Lof

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70425 ,  G03F7/70525 ,  G03F7/70541 ,  G03F7/706 ,  G03F7/70633 ,  G03F9/7046

    摘要： The invention relates to a device manufacturing method comprising identifying a substrate to be processed, performing a manufacturing step of a patterned layer on the substrate, and storing a substrate process history for the substrate. The history may comprise a correction map comprising position errors caused by the manufacturing step. Identifying the substrate may be done by reading an identification sign present on the substrate or by reading an identification code of a lot comprising the substrate and determining a sequence number of the substrate in the lot. Alignment of the substrate with respect to a patterning device of a lithographic apparatus may be corrected using information of the substrate process history. Alternatively or additionally, measured overlay errors may be corrected per substrate using information of the substrate process history.

    摘要翻译： 本发明涉及一种器件制造方法，包括识别待处理的衬底，在衬底上执行图案化层的制造步骤，以及存储用于衬底的衬底工艺历史。 历史可以包括校正图，其包括由制造步骤引起的位置误差。 可以通过读取衬底上存在的识别符号或通过读取包括衬底的批次的识别码并确定批次中的衬底的序列号来进行衬底的识别。 可以使用衬底处理历史的信息来校正衬底相对于光刻设备的图案形成装置的对准。 或者或另外，可以使用衬底工艺历史的信息来校正每个衬底的测量重叠误差。