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    Substrate processing method
    94.
    发明申请
    Substrate processing method 审中-公开
    基板加工方法

    公开(公告)号：US20060231124A1

    公开(公告)日：2006-10-19

    申请号：US11433616

    申请日：2006-05-15

    申请人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

    发明人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

    IPC分类号： B08B3/00

    CPC分类号： H01L21/67086 ,  B08B3/10 ,  H05K3/26

    摘要： Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W−1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W−1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W−1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.

    摘要翻译： 提供了能够可靠地处理诸如沟槽，接触孔，深图案或多孔基材的孔的凹陷的内部的处理方法。 将化学溶液M供给到放置基板W的处理槽1中，并且处理槽1在低于大气压的压力下重复抽真空并加压数次。 使酒精X与基板W的表面接触并供给到凹部W-1中。 将化学溶液M供给到含有基板W的处理槽1中，直到化学溶液M达到浸渍基板W的水位，从而使化学溶液M进入凹部W-1。 从处理槽1排出化学溶液M，通过抽出处理槽1蒸发进入凹部W-1并与醇X混合的部分化学溶液M. 这个过程重复几次。

    Edge-emitting type semiconductor laser
    96.
    发明授权
    Edge-emitting type semiconductor laser 有权
    边缘发射型半导体激光器

    公开(公告)号：US07116691B2

    公开(公告)日：2006-10-03

    申请号：US10766035

    申请日：2004-01-29

    申请人： Masanobu Ando ,  Hiroshi Watanabe

    发明人： Masanobu Ando ,  Hiroshi Watanabe

    IPC分类号： H01S5/20

    CPC分类号： B82Y20/00 ,  H01S5/22 ,  H01S5/34 ,  H01S2301/18

    摘要： The interval Λ between each stripe of interference fringe generated in a conventional n-type contact layer is determined by a function (f(λ)=λ(n2−neq2)−1/2/2) wherein λ, n, and neq represent luminous wavelength λ of lights radiated from a light emitting part 104, refractive index n of the n-type contact layer, and equivalent refractive index neq of the n-type contact layer in guided wave mode, respectively. The remaining thickness δ of the n-type contact layer 102 at the concave part D which is formed at the back surface of the crystal growth substrate may be about Λ/2. When at least one portion of the n-type contact layer which is formed right beneath the laser cavity remains with about δ in thickness, the n-type contact layer arranged even right beneath the laser cavity can maintain excellent contact to a negative electrode. As a result, effective light confinement enables to adequately suppress ripples in FFP owing to lights leaked into the n-type contact layer, to thereby provide a semiconductor laser which oscillates stable lights.

    摘要翻译： 在常规n型接触层中产生的每条条纹干涉条纹之间的间隔Lλ由函数（f（λ）=λ（n≥0） 2/2）其中λ，n和n eq表示从发光部分辐射的光的发光波长λ 104，导向波模式中n型接触层的n型接触层的折射率n和等效折射率n eq eq 。 形成在晶体生长衬底的背面的凹部D处的n型接触层102的剩余厚度δ可以为约λ/ 2。 当在激光腔正下方形成的n型接触层的至少一部分保持厚度约为三角形时，即使在激光腔正下方布置的n型接触层可以保持与负电极的良好接触。 结果，有效的光限制能够充分地抑制由于光泄漏到n型接触层中的FFP中的波纹，从而提供振荡稳定的光的半导体激光器。

    Non-consumable electrode welding torch and welding head with the torch
    100.
    发明申请
    Non-consumable electrode welding torch and welding head with the torch 有权
    不消耗电极焊炬和焊炬用焊炬

    公开(公告)号：US20060076320A1

    公开(公告)日：2006-04-13

    申请号：US11225177

    申请日：2005-09-14

    申请人： Hiroshi Watanabe ,  Takashi Sato ,  Toshiharu Myoga ,  Koichi Mitsuhata ,  Masahiro Kanatani ,  Keiji Ueda ,  Seiji Kikuhara ,  Toshiharu Nagashima ,  Shigeru Fujimoto ,  Ryuichi Etoh

    发明人： Hiroshi Watanabe ,  Takashi Sato ,  Toshiharu Myoga ,  Koichi Mitsuhata ,  Masahiro Kanatani ,  Keiji Ueda ,  Seiji Kikuhara ,  Toshiharu Nagashima ,  Shigeru Fujimoto ,  Ryuichi Etoh

    IPC分类号： B23K9/167

    CPC分类号： B23K9/296 ,  B23K9/0213 ,  B23K2101/06

    摘要： An ultra-flat non-consumable electrode welding torch which allows performing a welding operation through a narrow gap between adjacent piping such as welding piping of a boiler panel, to be mounted on a compact automatic welding head, and a welding head provided with such a welding torch are to be provided. As a gas supply mechanism that supplies a shield gas to a welding section formed at the tip of the non-consumable electrode through inside of the torch body for the non-consumable electrode welding, a gas supply path is provided for supplying the shield gas from an outer gas space in a double ring shaped gas space provided around a non-consumable electrode and divided by a partition wall, to an inner gas space through a plurality of orifices provided at regular intervals in the partition wall, and the gas is blown from the inner gas space to the region around the non-consumable electrode through a metal mesh plate. A gas outlet opening provided in the inner gas space is oriented in a different direction from the gas blowing direction through the orifice.

    摘要翻译： 一种超扁平的非消耗性电极焊枪，其能够通过相邻配管（例如锅炉面板的焊接管道）之间的狭窄间隙进行焊接操作，以安装在紧凑型自动焊接头上，以及具有这样的焊接头 将提供焊炬。 作为通过用于非消耗性电极焊接的炬体内部的形成在不可消耗电极的前端的焊接部供给保护气体的气体供给机构，设置有用于将保护气体从 通过在分隔壁上以规则间隔设置的多个孔，将设置在非消耗性电极周围并被分隔壁分隔的双环形气体空间中的外部气体空间通过多个孔设置到内部气体空间， 内部气体空间通过金属网板到达非消耗性电极周围的区域。 设置在内部气体空间中的气体出口开口沿着通过孔口的气体吹送方向的不同方向定向。