公开(公告)号：US08624252B2

公开(公告)日：2014-01-07

申请号：US13612146

申请日：2012-09-12

申请人： Shinji Maekawa ,  Gen Fujii ,  Hiroko Shiroguchi ,  Masafumi Morisue

发明人： Shinji Maekawa ,  Gen Fujii ,  Hiroko Shiroguchi ,  Masafumi Morisue

IPC分类号： H01L29/04 ,  H01L29/10 ,  H01L31/00 ,  H01L27/14 ,  H01L29/15 ,  H01L31/036 ,  H01L27/12

CPC分类号： G02B5/201 ,  G03F7/0007 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3281 ,  H01L27/3295 ,  H01L29/66757 ,  H01L29/66765 ,  H01L51/56

摘要： The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.

摘要翻译： 本发明通过简单的步骤提供了具有包括绝缘膜，半导体膜，导电膜等的膜图案的基板的制造方法，以及低成本，高生产率的半导体器件的制造方法， 产量。 根据本发明，在形成在基材上具有低润湿性的第一保护膜之后，在第一掩模图案的外边缘上施加或排出具有高润湿性的材料，从而形成膜图案和具有膜图案的基板 形成。

公开(公告)号：US08461013B2

公开(公告)日：2013-06-11

申请号：US12776870

申请日：2010-05-10

申请人： Shinji Maekawa ,  Gen Fujii ,  Junya Maruyama ,  Toru Takayama ,  Yumiko Fukumoto ,  Yasuyuki Arai

发明人： Shinji Maekawa ,  Gen Fujii ,  Junya Maruyama ,  Toru Takayama ,  Yumiko Fukumoto ,  Yasuyuki Arai

IPC分类号： H01L21/76

CPC分类号： G06K19/07749 ,  H01L27/12 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/13 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/78684

摘要： An IC card is more expensive than a magnetic card, and an electronic tag is also more expensive as a substitute for bar codes. Therefore, the present invention provides an extremely thin integrated circuit that can be mass-produced at low cost unlike a chip of a conventional silicon wafer, and a manufacturing method thereof. One feature of the present invention is that a thin integrated circuit is formed by a formation method that can form a pattern selectively, on a glass substrate, a quartz substrate, a stainless substrate, a substrate made of synthetic resin having flexibility, such as acryl, or the like except for a bulk substrate. Further, another feature of the present invention is that an ID chip in which a thin film integrated circuit and an antenna according to the present invention are mounted is formed.

摘要翻译： IC卡比磁卡贵，电子标签也更昂贵代替条形码。 因此，本发明提供了与常规硅晶片的芯片相比可以以低成本批量生产的极薄的集成电路及其制造方法。 本发明的一个特征在于，通过可以在玻璃基板，石英基板，不锈钢基板，具有柔软性的合成树脂制成的基板（例如丙烯酸酯）上形成图案的形成方法形成薄的集成电路 ，或类似物，除了大量衬底。 此外，本发明的另一个特征是形成其中安装有根据本发明的薄膜集成电路和天线的ID芯片。

公开(公告)号：US08283216B2

公开(公告)日：2012-10-09

申请号：US13101766

申请日：2011-05-05

申请人： Shunpei Yamazaki ,  Shinji Maekawa ,  Gen Fujii ,  Hideaki Kuwabara

发明人： Shunpei Yamazaki ,  Shinji Maekawa ,  Gen Fujii ,  Hideaki Kuwabara

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： G02F1/13458 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/13415 ,  G02F2001/136295 ,  H01L27/1292

摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.

摘要翻译： 由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。 在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。 此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或 电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。

公开(公告)号：US08222636B2

公开(公告)日：2012-07-17

申请号：US12616491

申请日：2009-11-11

申请人： Gen Fujii

发明人： Gen Fujii

IPC分类号： H01L29/08 ,  H01L35/24 ,  H01L51/00

CPC分类号： H01L29/4908 ,  G03F7/0043 ,  G03F7/201 ,  H01L21/28008 ,  H01L21/32051 ,  H01L27/1285 ,  H01L27/1292 ,  H01L29/66765

摘要： To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.

摘要翻译： 提供一种能够通过简化的制造工艺在材料使用中以更高效率制造的显示装置，以及用于制造显示装置的方法。 另一个目的是提供一种技术，通过该技术可以以良好的控制将构成显示装置的布线图案形成为期望的形状。 在根据本发明的图案形成方法中，在透光性基板上形成掩模， 在基板和掩模上形成包括光催化剂的第一区域; 所述光催化剂用光照射通过所述基板以改变所述第一区域的一部分; 第二区域形成; 并且含有图案形成材料的组合物被排出到第二区域，因此形成图案。 面罩不透光。

公开(公告)号：US08083956B2

公开(公告)日：2011-12-27

申请号：US12246947

申请日：2008-10-07

申请人： Gen Fujii ,  Erika Takahashi ,  Erumu Kikuchi ,  Sachiko Kawakami

发明人： Gen Fujii ,  Erika Takahashi ,  Erumu Kikuchi ,  Sachiko Kawakami

IPC分类号： H01L21/302

CPC分类号： H01L51/0004 ,  H01L27/3246 ,  H01L27/3283

摘要： To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.

摘要翻译： 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层（例如着色层或像素电极层）通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成，该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度，从而可以选择性地形成疏液区域和亲液性区域。

公开(公告)号：US08017422B2

公开(公告)日：2011-09-13

申请号：US12135252

申请日：2008-06-09

申请人： Gen Fujii ,  Erika Takahashi

发明人： Gen Fujii ,  Erika Takahashi

IPC分类号： H01L33/00

CPC分类号： H01L51/0005 ,  H01L21/76825 ,  H01L21/76826 ,  H01L27/3246 ,  H01L27/3283 ,  H01L51/0545 ,  H01L51/56 ,  Y02P80/30

摘要： Oxidation treatment is performed to the surface of a substrate provided with a photocatalytic conductive film and an insulating film; treatment with a silane coupling agent is performed, so that a silane coupling agent film is formed and the surface of the substrate is modified to be liquid-repellent; and the surface of the substrate is irradiated with light of a wavelength (less than to equal to 390 nm) which has energy of greater than or equal to a band gap of a material for forming the photocatalytic conductive film, so that only the silane coupling agent film over the surface of the photocatalytic conductive film is decomposed and the surface of the photocatalytic conductive film can be modified to be lyophilic.

摘要翻译： 对设置有光催化性导电膜和绝缘膜的基板的表面进行氧化处理; 进行硅烷偶联剂的处理，形成硅烷偶联剂膜，将基材的表面改性为疏液性; 并且用能量大于或等于用于形成光催化性导电膜的材料的带隙的能量（小于等于390nm）的光照射衬底的表面，使得只有硅烷偶联 光催化性导电膜的表面上的试剂膜分解，光催化性导电膜的表面可以改性为亲液性的。

公开(公告)号：US08017186B2

公开(公告)日：2011-09-13

申请号：US11889683

申请日：2007-08-15

申请人： Gen Fujii

发明人： Gen Fujii

IPC分类号： B05B1/02 ,  B41J2/135

CPC分类号： H01L21/6715 ,  B41J2/04508 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/175 ,  B41J2/17509 ,  B41J2/19 ,  B41J2202/07

摘要： The present invention provides film forming method and a droplet discharge method for removing bubbles in a pressurizing chamber to prevent defective discharge without disposing a large amount of materials in a droplet discharging device. Before a material is discharged in the droplet discharging device, a step is provided in which reduced pressure is kept in a pressurizing chamber and a material supply portion, which are connected, to remove bubbles that exist in the pressurizing chamber. A flow path connected to the outside such as an opening of a nozzle surface of the pressurizing chamber or a material supply port of the material supply portion is sealed, and pressure in the pressurizing chamber and the material supply portion is reduced from an inlet and outlet connected to the material supply portion with the use of a reduced pressure means such as a pump.

摘要翻译： 本发明提供了一种用于去除加压室中的气泡的成膜方法和液滴喷射方法，以防止在不在液滴喷射装置中设置大量材料的情况下的不良排放。 在液滴排放装置中排出材料之前，提供了一个步骤，其中在加压室和连接的材料供应部分中保持减压以除去存在于加压室中的气泡。 连接到外部的流路，例如加压室的喷嘴表面的开口或材料供应部分的材料供给口被密封，并且加压室和材料供应部分中的压力从入口和出口 通过使用诸如泵的减压装置连接到材料供应部分。

公开(公告)号：US07985677B2

公开(公告)日：2011-07-26

申请号：US11283964

申请日：2005-11-22

申请人： Gen Fujii ,  Shunpei Yamazaki

发明人： Gen Fujii ,  Shunpei Yamazaki

IPC分类号： H01L21/4763

CPC分类号： H01L21/76879 ,  H01L21/288 ,  H01L27/3248 ,  H01L27/3276

摘要： One of methods of manufacturing a semiconductor device of the present invention is as follows: a first conductive layer is formed, a first insulating layer is formed over the first conductive layer, and a second insulating layer is formed over the first insulating layer; then, a first opening portion is formed in the first insulating layer and the second insulating layer to reach the first conductive layer; a mask layer having low wettability to a composition containing a conductive material is formed over the second insulating layer, and a second opening portion larger than the first opening portion is formed in the second insulating layer; subsequently, the first and second opening portions are filled with the composition containing a conductive material to form a second conductive layer.

摘要翻译： 制造本发明的半导体器件的方法之一如下：形成第一导电层，在第一导电层上形成第一绝缘层，在第一绝缘层上形成第二绝缘层; 然后，在第一绝缘层和第二绝缘层中形成第一开口部分以到达第一导电层; 在第二绝缘层上形成对包含导电材料的组合物具有低润湿性的掩模层，并且在第二绝缘层中形成大于第一开口部分的第二开口部分; 随后，第一和第二开口部分被含有导电材料的组合物填充以形成第二导电层。

公开(公告)号：US07977669B2

公开(公告)日：2011-07-12

申请号：US11884016

申请日：2006-02-07

申请人： Mikio Yukawa ,  Gen Fujii ,  Hironobu Shoji

发明人： Mikio Yukawa ,  Gen Fujii ,  Hironobu Shoji

IPC分类号： H01L35/24 ,  H01L51/00 ,  H01L47/00

CPC分类号： G11C13/0014 ,  G11C13/004 ,  G11C2013/0042 ,  G11C2213/77 ,  G11C2213/79 ,  H01L27/283

摘要： It is an object of the present invention to provide a high-performance and high reliable semiconductor device and to provide a technique of manufacturing the semiconductor device at low cost with high yield. The semiconductor device is manufactured by steps of forming a first conductive layer, forming a first liquid-repellent layer over the first conductive layer, discharging a composition containing a material for a mask layer over the first liquid-repellent layer to form a mask layer, processing the first liquid-repellent layer with the use of the mask layer, forming a second liquid-repellent layer, forming an insulating layer over the first conductive layer and the second conductive layer, and forming a second conductive layer over the insulating layer.

摘要翻译： 本发明的目的是提供一种高性能和高可靠性的半导体器件，并且以高成本提供低成本制造半导体器件的技术。 半导体器件通过以下步骤制造：形成第一导电层，在第一导电层上形成第一液体排斥层，在第一拒液层上排出含有掩模层的材料的组合物以形成掩模层， 使用掩模层处理第一液体排斥层，形成第二疏液层，在第一导电层和第二导电层上形成绝缘层，并在绝缘层上形成第二导电层。

公开(公告)号：US07670884B2

公开(公告)日：2010-03-02

申请号：US12268039

申请日：2008-11-10

申请人： Gen Fujii ,  Masafumi Morisue ,  Hironobu Shoji ,  Junya Maruyama ,  Kouji Dairiki ,  Tomoyuki Aoki

发明人： Gen Fujii ,  Masafumi Morisue ,  Hironobu Shoji ,  Junya Maruyama ,  Kouji Dairiki ,  Tomoyuki Aoki

IPC分类号： H01L21/00 ,  H01L21/24 ,  H01L21/20

CPC分类号： H01L27/12 ,  H01L23/48 ,  H01L23/5227 ,  H01L24/11 ,  H01L27/0629 ,  H01L27/1266 ,  H01L27/1292 ,  H01L27/13 ,  H01L28/10 ,  H01L29/78621 ,  H01L2224/0554 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2924/00014 ,  H01L2924/07811 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15788 ,  H01L2924/3011 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： The manufacturing method of a substrate having a conductive layer has the steps of: forming an inorganic insulating layer over a substrate; forming an organic resin layer with a desired shape over the inorganic insulating layer; forming a low wettability layer with respect to a composition containing conductive particles on a first exposed portion of the inorganic insulating layer; removing the organic resin layer; and coating a second exposed portion of the inorganic insulating layer with a composition containing conductive particles and baking, thereby forming a conductive layer.

摘要翻译： 具有导电层的基板的制造方法具有以下步骤：在基板上形成无机绝缘层; 在无机绝缘层上形成具有所需形状的有机树脂层; 在无机绝缘层的第一暴露部分上相对于含有导电颗粒的组合物形成低润湿性层; 去除有机树脂层; 并用含有导电颗粒的组合物涂覆无机绝缘层的第二暴露部分并进行烘烤，由此形成导电层。