公开(公告)号：US6107007A

公开(公告)日：2000-08-22

申请号：US15437

申请日：1993-02-09

申请人： Tadahiro Ohmi ,  Hisayuki Shimada ,  Shigeki Shimomura ,  Akiyoshi Suzuki ,  Mamoru Miyawaki ,  Miyoko Noguchi

发明人： Tadahiro Ohmi ,  Hisayuki Shimada ,  Shigeki Shimomura ,  Akiyoshi Suzuki ,  Mamoru Miyawaki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03F7/32 ,  G03C5/00

CPC分类号： G03F7/701 ,  G03F7/322

摘要： A lithography process for forming a pattern having different sizes or different shapes of pattern components, comprises steps of exposing a resist to a predetermined light pattern by modified illumination, and removing, at least one step of forming the resist pattern, a region of the resist by employing a lithography-developing solution containing a surfactant, the surfactant being capable of promoting dissolution of a smaller pattern component to be removed of the resist.The surfactant is represented by the general formula below:HO(CH.sub.2 CH.sub.2 O).sub.a (CH(CH.sub.3)CH.sub.2 O).sub.b (CH.sub.2 CH.sub.2 O).sub.c Hwhere a, b, and c are respectively an integer.The surfactant satisfies the relation:(A+C)/(A+B+C).ltoreq.0.3where A represents the molecular weight of HO(CH.sub.2 CH.sub.2 O).sub.a, B represents the molecular weight of (CH(CH.sub.3)CH.sub.2 O).sub.b, and C represents the molecular weight of (CH.sub.2 CH.sub.2 O).sub.c H.

摘要翻译： 用于形成具有不同尺寸或不同形状的图案部件的图案的光刻工艺包括以下步骤：通过改进的照明将抗蚀剂暴露于预定的光图案，以及去除形成抗蚀剂图案的至少一个步骤， 通过使用含有表面活性剂的光刻显影液，表面活性剂能够促进较小的图案成分的溶解，以除去抗蚀剂。 表面活性剂由以下通式表示：HO（CH 2 CH 2 O）a（CH（CH 3）CH 2 O）b（CH 2 CH 2 O）c H其中a，b和c分别为整数。 表面活性剂满足下列关系：（A + C）/（A + B + C）≤0.3其中A表示HO（CH 2 CH 2 O）a的分子量，B表示（CH（CH 3）CH 2 O）b的分子量 ，C表示（CH 2 CH 2 O）c H的分子量。

公开(公告)号：US6104472A

公开(公告)日：2000-08-15

申请号：US998708

申请日：1997-12-29

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70883

摘要： A projection exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate. The projection optical system includes a pair of aspherical members, at least one of which is displaceable in a direction orthogonal to an optical axis of the projection optical system. The aspherical members have aspherical surface shapes which are determined so that an optical characteristic of the aspherical members as a unit changes with a change in positional relationship between the aspherical surfaces of the aspherical members with respect to the orthogonal direction. Also, an optical characteristic of the projection optical system is adjustable in response to displacement of the at least one of the aspherical members in the direction orthogonal to the optical axis.

摘要翻译： 投影曝光装置包括用于将掩模的图案投影到基板上的投影光学系统。 投影光学系统包括一对非球面构件，其中的至少一个可在与投影光学系统的光轴正交的方向上移位。 非球面构件具有非球面形状，其被确定为使得作为一个单元的非球面构件的光学特性随着非球面构件的非球面之间的相对于正交方向的位置关系的变化而变化。 此外，投影光学系统的光学特性响应于至少一个非球面构件在与光轴正交的方向上的位移而是可调节的。

公开(公告)号：US5631773A

公开(公告)日：1997-05-20

申请号：US483866

申请日：1995-06-07

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/20 ,  H01L21/027 ,  G02B5/18 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70591 ,  G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70133 ,  G03F7/70283

摘要： An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

公开(公告)号：US5574492A

公开(公告)日：1996-11-12

申请号：US567719

申请日：1995-12-05

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  B41J15/16

CPC分类号： G03F7/70058 ,  G03F7/701

摘要： A method of imaging a fine pattern having a group of lines extending along orthogonal first and second directions and a group of lines extending along a third direction different from the first and second directions includes illuminating the pattern obliquely, to form an image of the line pattern. Illumination beams along the first, second and third directions, respectively, each has an intensity sufficiently lowered as compared with that of a particular illumination beam along a particular direction different from the first, second and third directions.

摘要翻译： 对具有沿着正交的第一和第二方向延伸的一组线的精细图案进行成像的方法和沿着与第一和第二方向不同的第三方向延伸的一组线包括倾斜地照射图案，以形成线图案的图像 。 与沿着与第一，第二和第三方向不同的特定方向的特定照明光束相比，分别具有沿着第一，第二和第三方向的照明光束的强度充分降低。

公开(公告)号：US5463497A

公开(公告)日：1995-10-31

申请号：US261229

申请日：1994-06-16

申请人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

发明人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

IPC分类号： G02B3/00 ,  G02B26/08 ,  G02B27/14 ,  G02B27/48 ,  G03F7/20 ,  G02B27/10 ,  F21K7/00

CPC分类号： G02B3/0056 ,  G02B26/0891 ,  G02B27/123 ,  G02B27/126 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70583 ,  G02B27/0961 ,  G02B3/0087

摘要： An illumination device includes a radiation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

摘要翻译： 照明装置包括辐射源; 光学积分器具有沿垂直于该装置的光轴的平面设置的透镜阵列; 第一光学系统，用于对来自辐射源的相干光束进行分频并产生彼此基本不相干的多个光束，第一光学系统还有效地将光束投影到不同方向的光学积分器并且叠加光束 在光学积分器上彼此相依; 以及第二光学系统，用于将光束从光学积分器的透镜引导到要被照射的表面，并且用于将光束彼此叠置在待照亮的表面上。

公开(公告)号：US5331371A

公开(公告)日：1994-07-19

申请号：US145656

申请日：1993-11-04

申请人： Tetsuya Mori ,  Akiyoshi Suzuki

发明人： Tetsuya Mori ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/70

摘要： A semiconductor device manufacturing exposure method for exposing different portions of a semiconductor wafer with radiation in a step-and-repeat manner includes the steps of: placing the wafer on a wafer chuck; detecting a first mark of the wafer, whereby a wafer mark signal is produced; controlling a rotational position of the wafer chuck on the basis of the wafer mark signal; printing an image of a second mark of a mask on a portion of a photosensitive material layer provided on a portion of the wafer chuck outside the wafer; photoelectrically detecting the image of the second mark of the mask printed on the photosensitive layer, whereby a mask mark signal is produced; producing data necessary for control of movement of the wafer chuck through a stage, by using the mask mark signal; effecting step-and-repeat exposure of the different portions of the wafer by using a radiation beam while controlling the movement of the wafer chuck through the stage on the basis of the produced data; and blocking a portion of the radiation beam with use of a blocking member disposed between a source of the radiation beam and the wafer to prevent exposure of the photosensitive material layer during the step-and-repeat exposure.

摘要翻译： 一种半导体器件制造曝光方法，用于以逐步重复的方式用辐射曝光半导体晶片的不同部分包括以下步骤：将晶片放置在晶片卡盘上; 检测晶片的第一标记，由此产生晶片标记信号; 基于晶片标记信号控制晶片卡盘的旋转位置; 在设置在所述晶片卡盘外部的所述晶片的一部分上的感光材料层的一部分上印刷掩模的第二标记的图像; 光电检测印刷在感光层上的掩模的第二标记的图像，从而产生掩模标记信号; 通过使用掩模标记信号产生控制晶片卡盘通过平台移动所需的数据; 通过使用辐射束对晶片的不同部分进行步进和重复曝光，同时基于产生的数据控制晶片卡盘通过平台的移动; 以及使用设置在辐射束的源和晶片之间的阻挡构件来阻挡辐射束的一部分，以防止在步进和重复曝光期间感光材料层的曝光。

公开(公告)号：US5160957A

公开(公告)日：1992-11-03

申请号：US795252

申请日：1991-11-19

申请人： Hideki Ina ,  Masao Kosugi ,  Akiyoshi Suzuki

发明人： Hideki Ina ,  Masao Kosugi ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68

CPC分类号： G03F9/70 ,  G03F7/2002

摘要： A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device including a portion for forming a photoprint of the alignment mark of the mask on the resist layer provided on the surface of the wafer, a portion for removing at least a portion of the resist layer adjacent to the alignment mark of the wafer, and a portion for detecting the alignment mark of the wafer and the photoprint of the alignment mark of the mask.

摘要翻译： 一种可用于对准和曝光装置的标记检测装置，用于将掩模的对准标记与晶片的对准标记对准，并且用于将设置在晶片表面上的抗蚀剂层暴露于具有辐射的掩模图案。 该装置包括用于在设置在晶片表面上的抗蚀剂层上形成掩模的对准标记的照相印刷部分，用于去除与晶片的对准标记相邻的抗蚀剂层的至少一部分的部分，以及 用于检测晶片的对准标记的部分和掩模的对准标记的照相印刷。

公开(公告)号：US5153773A

公开(公告)日：1992-10-06

申请号：US534246

申请日：1990-06-07

申请人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

发明人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

IPC分类号： G02B3/00 ,  G02B26/08 ,  G02B27/14 ,  G02B27/48 ,  G03F7/20

CPC分类号： G02B3/0056 ,  G02B26/0891 ,  G02B27/123 ,  G02B27/126 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70583 ,  G02B27/0961 ,  G02B3/0087

摘要： An illumination device includes a raidation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

摘要翻译： 照明装置包括突袭源; 光学积分器具有沿垂直于该装置的光轴的平面设置的透镜阵列; 第一光学系统，用于对来自辐射源的相干光束进行分频并产生彼此基本不相干的多个光束，第一光学系统还有效地将光束投影到不同方向的光学积分器并且叠加光束 在光学积分器上彼此相依; 以及第二光学系统，用于将光束从光学积分器的透镜引导到要被照射的表面，并且用于将光束彼此叠置在待照亮的表面上。

公开(公告)号：US5148214A

公开(公告)日：1992-09-15

申请号：US759953

申请日：1991-09-17

申请人： Masakatsu Ohta ,  Hideki Ina ,  Akiyoshi Suzuki

发明人： Masakatsu Ohta ,  Hideki Ina ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/70 ,  G03F7/2002

摘要： A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device includes a system for detecting light from the wafer, the detecting system including a photodetecting device for detecting light and a wavelength selecting element disposed in a path of light from the wafer to the photodetecting device so as to allow introduction of light of a predetermined wavelength into the light path from outside the light path to illuminate the wafer, and a portion for forming a photoprint of the alignment mark of the mask in the resist layer provided on the surface of the wafer, the photoprint forming portion being arranged, for the formation of the photoprint, to direct, to the wafer, the light of the predetermined wavelength from the outside of the light path and by way of the mask and the wavelength selecting element, wherein the photodetecting device is effective to detect the light from the wafer to detect the alignment mark of the wafer and the photoprint of the alignment mark of the mask.

摘要翻译： 一种可用于对准和曝光装置的标记检测装置，用于将掩模的对准标记与晶片的对准标记对准，并且用于将设置在晶片表面上的抗蚀剂层暴露于具有辐射的掩模图案。 该装置包括用于检测来自晶片的光的系统，所述检测系统包括用于检测光的光检测装置和布置在从晶片到光电检测装置的光的路径中的波长选择元件，以便允许引入预定的 波长从光路外部的光路径照射晶片，以及用于形成在设置在晶片表面上的抗蚀剂层中的掩模的对准标记的照相印记的部分，所述照相印刷形成部分被布置为 形成照相印记，从光路的外部引导预定波长的光，并通过掩模和波长选择元件引导到晶片，其中光检测器件有效地检测来自晶片的光 以检测晶片的对准标记和掩模的对准标记的照相印刷。

公开(公告)号：US5133603A

公开(公告)日：1992-07-28

申请号：US735692

申请日：1991-07-23

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F9/00

CPC分类号： G03F9/7065

摘要： An observation device for use in observation of a first object and a second object onto which a pattern of the first object is to be projected, the observation device includes a light source; a polarization beam splitter provided between the light source and the first object, for receiving light from the light source and for directing the same to the first and second objects; a first phase converting element provided between the first and second objects, for changing the state of polarization of the light from the light source as incident on the first phase converting element; and a second phase converting element provided to be disposed or to be selectively disposed between the first object and the polarization beam splitter, for changing the state of polarization of reflection light from the first object as incident on the second phase converting element; wherein the first and second objects can be observed by detecting, through the polarization beam splitter, reflection light reflected by the second object ane passing through the first object or by detecting the reflection light and reflection light from the first object.

摘要翻译： 一种用于观察要投射第一物体的图案的第一物体和第二物体的观察装置，所述观察装置包括光源; 设置在光源和第一物体之间的偏振光束分离器，用于从光源接收光并将其引导到第一和第二物体; 设置在第一和第二物体之间的第一相位转换元件，用于当入射在第一相位转换元件上时改变来自光源的光的偏振状态; 以及第二相位转换元件，被设置为选择性地设置在所述第一物体和所述偏振光束分离器之间，用于改变入射在所述第二相位转换元件上的来自所述第一物体的反射光的偏振状态; 其中可以通过偏振分束器检测由第二物体通过第一物体反射的反射光或通过检测来自第一物体的反射光和反射光来观察第一和第二物体。