摘要:
A system and software for improving the performance of processors by incorporating an execution unit operable to decode and execute single instructions specifying a data selection operand and a first and a second register providing a plurality of data elements, the data selection operand comprising a plurality of fields each selecting one of the plurality of data elements, the execution unit operable to provide the data element selected by each field of the data selection operand to a predetermined position in a catenated result.
摘要:
A non-blocking load buffer is provided for use in a high-speed microprocessor and memory system. The non-blocking load buffer interfaces a high-speed processor/cache bus, which connects a processor and a cache to the non-blocking load buffer, with a lower speed peripheral bus, which connects to peripheral devices. The non-blocking load buffer allows data to be retrieved from relatively low bandwidth peripheral devices directly from programmed I/O of the processor at the maximum rate of the peripherals so that the data may be processed and stored without unnecessarily idling the processor. I/O requests from several processors within a multiprocessor may simultaneously be buffered so that a plurality of non-blocking loads may be processed during the latency period of the device. As a result, a continuous maximum throughput from multiple I/O devices by the programmed I/O of the processor is achieved and the time required for completing tasks and processing data may be reduced. Also, a multiple priority non-blocking load buffer is provided for serving a multiprocessor running real-time processes of varying deadlines by prioritization-based scheduling of memory and peripheral accesses.
摘要:
Methods for depositing a nitride layer on a surface of an integrated circuit wafer for protecting against over etching during subsequent etching of overlying layers. A first nitride deposition method utilizes a chemical vapor deposition process having a variable ammonia flow rate. The ammonia flow rate is decreased during the chemical vapor deposition process. A second nitride deposition method produces an oxygen rich etch stop film on the surface of the nitride layer. The method comprises the application of an oxygen/argon plasma treatment to the surface of the nitride layer in a reactive ion etching process. A third nitride deposition method produces an oxygen rich etch stop film on the surface of the nitride layer. The method comprises the application of a nitrous oxide plasma treatment to the surface of the nitride layer in a chemical vapor deposition chamber.
摘要:
A non-blocking load buffer for use in a high-speed microprocessor and memory system. The non-blocking load buffer interfaces a high-speed processor/cache bus, which connects a processor and a cache to the non-blocking load buffer, with a lower speed peripheral bus, which connects to peripheral devices. The non-blocking load buffer allows data to be retrieved from relatively low bandwidth peripheral devices directly from programmed I/O of the processor at the maximum rate of the peripherals so that the data may be processed and stored without unnecessarily idling the processor. I/O requests from several processors within a multiprocessor may simultaneously be buffered so that a plurality of non-blocking loads may be processed during the latency period of the device. As a result, a continuous maximum throughput from multiple I/O devices by the programmed I/O of the processor is achieved and the time required for completing tasks and processing data may be reduced. Also, a multiple priority non-blocking load buffer is provided for serving a multiprocessor running real-time processes of varying deadlines by prioritization-based scheduling of memory and peripheral accesses.
摘要:
A method for synthesizing correction features for an entire mask pattern that initially divides mask pattern data into tiles of data--each tile representing an overlapping section of the original mask pattern. Each of the tiles of data is sequentially processed through correction feature synthesis phases--each phase synthesizing a different type of correction feature. All of the correction features are synthesized for a given tile before synthesizing the correction features for the next tile. Each correction feature synthesis phase formats the data stored in the tile into a representation that provides information needed to synthesize the correction feature for the given phase. Methods for implementing edge bar and serif correction features synthesis phases are also described. The method for synthesizing external type edge bars is performed by oversizing feature data in the tile by an amount equal to the desired spacing of the external edge bar, formatting the oversized data into an edge representation and expanding each of the edges in the edge representation of the oversized data into edge bars having a predetermined width. Internal type of edge bars for the tile are synthesized by initially inverting feature data and then performing the same steps as for generating the external edge bars. The method for serif synthesis is performed by initially formatting tile data into a vertex representation, eliminating certain of the vertices not requiring serifs, synthesizing a positive serif for each convex corner and a negative vertex for each concave corner, and eliminating any disallowed serifs. Internal bars and negative serifs are "cut-out" of original tile data by performing geometric Boolean operations and external bars and positive serifs are concatenated with the "cut-out" tile data, equivalent to performing a geometric OR operation.
摘要:
A controller for a synchronous DRAM is provided for maximizing throughput of memory requests to the synchronous DRAM. The controller maintains the spacing between the commands to conform with the specifications for the synchronous DRAMs while preventing gaps from occurring in the data slots to the synchronous DRAM. Furthermore, the controller allows memory requests and commands to be issued out of order so that the throughput may be maximized by overlapping required operations which do not specifically involve data transfer. To achieve this maximized throughput, memory requests are tagged for indicating a sending order. Thereafter, the memory requests may be arbitrated when conflicting memory requests are queued and this arbitration process is then decoded for simultaneously updating scheduling constraints. The memory requests may be further qualified based on the scheduling constraints and a command stack of memory request is then developed for modifying update queues. The controller also functions by receiving a controller clock signal and generating an SDRAM clock signal by dividing this controller clock signal.
摘要:
A current mode access BiCMOS memory cell is disclosed. The memory cell includes a CMOS storage cell for storing first and second CMOS voltage potentials, VDD and VSS, corresponding to first and second logic levels. The storage cell includes two CMOS inverters coupled between VDD and VSS. The storage cell is coupled to a conversion circuit. The conversion circuit is coupled between third and fourth ECL working potentials. It functions to convert the first and second CMOS voltage potentials into the third and fourth working potentials. The third and fourth voltage potentials are coupled to the bases of two bipolar signal converters. The emitters of the bipolar signal converters are coupled to a selectable current source and the collectors of the bipolar signal converters are coupled to complementary bit lines. The selectable current source is responsive to a read word signal. A differential current signal representing the data stored in the memory cell is established in the complementary bit lines when the current source is selected and current is allowed to flow through one of the bipolar signal converters. The third and fourth ECL voltage potentials are chosen such that they ensure that the bipolar signal converters are not driven into saturation. In this way, read times are optimized. In addition, read times are reduced since peak-to-peak voltage of the current mode differential signal established across the complementary bit lines are reduced.
摘要:
A two-stage flash analog-to-digital signal converter has a first stage voltage divider network and a set of amplifiers that perform an initial interpolation. The initial interpolation results are directly coupled, i.e. no resistive or capacitive elements, to a second stage comprising a set of comparators having multiple inputs. The multiple inputs of the second stage comparators are weightily coupled to the first stage amplifiers in a manner so as to cause the second stage comparators to generate a digital representation of the analog signal.
摘要:
A large burst mode memory accessing system includes N discrete sub-memories and three main I/O ports. Data is stored in the sub-memories so that the sub-memories are accessed depending on their proximity to the main I/O ports. Three parallel pipelines provide a data path to/from the main I/O ports and the sub-memories. The first pipeline functions to couple address/control signals to the memories such that adjacent sub-memories are accessed in half cycle intervals. The second pipeline functions to propagate accessed data from the sub-memories to the main I/O ports such that data is outputted from the main output port every successive clock cycle. The third pipeline propagates write data to the memories such that data presented at the input of the third pipeline on successive clock cycles is written into successive sub-memories. Redundancy circuits preserve data integrity without memory access interruption.
摘要:
A method for forming a BICMOS integrated circuit having MOS field-effect devices and bipolar junction transistors formed in a silicon substrate is disclosed. The process comprises the steps of first defining separate active areas in a substrate for each of the transistors. Next, a gate dielectric layer is formed over the surface of the wafer. Above the gate dielectric, a first layer of polysilicon is deposited. This first layer of polysilicon is then selectively etched to form a plurality of first polysilicon members each of which is equally-spaced apart from one another. The polysilicon members comprise the gates of the MOS transistors and the extrinsic base contacts of the NPN transistors. After the first polysilicon members have been defined, the base regions of the NPN transistors are formed. After insulating the first polysilicon members, an additional layer of polysilicon is deposited over the substrate to replanarize the entire wafer surface. The additional layer of polysilicon is then etched to form a plurality of second polysilicon members which are electrically isolated from the first polysilicon members. Impurities are diffused from the polysilicon members into the substrate to form the source/drain regions of the MOS transistors, and the extrinsic base and emitter regions of the NPN transistors. The final processing steps include those required for the interconnection of the MOS and NPN transistors.