公开(公告)号：US20070134566A1

公开(公告)日：2007-06-14

申请号：US11634270

申请日：2006-12-06

Applicant: Shigeru Maida ,  Motoyuki Yamada

Inventor： Shigeru Maida ,  Motoyuki Yamada

IPC: G02B6/42 ,  B32B15/00 ,  C03B37/018 ,  C03B8/00 ,  B32B17/06 ,  G03F1/00 ,  G02B6/26

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US07159418B2

公开(公告)日：2007-01-09

申请号：US09930693

申请日：2001-08-17

Applicant: Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

IPC: C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1453 ,  C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/64 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  C03C2203/54 ,  Y02P40/57

Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.

Abstract translation: 含氟合成石英玻璃是通过将二氧化硅形成材料，氢气和氧气从燃烧器送入反应区而产生的，火焰水解反应区中二氧化硅形成材料，形成二氧化硅颗粒，将二氧化硅颗粒沉积在 反应区中的可旋转基底，形成多孔二氧化硅基质，并在含氟化合物气体的气氛中加热和玻璃化多孔二氧化硅基质。 在形成多孔二氧化硅基体期间，将二氧化硅基体的中心轴线与来自燃烧器的形成二氧化硅的反应物火焰之间的角度调节至90-120°，使得多孔二氧化硅基质的密度为0.1-1.0g / cm 3，窄分布在0.1g / cm 3以内。 所得的石英玻璃对于低于200nm的真空紫外线区域的光具有高透射率。

公开(公告)号：US20060234848A1

公开(公告)日：2006-10-19

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 制造这种光学部件的方法包括以下步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与氧缺陷反应的试剂处理干燥的烟炱体 石英玻璃结构。

公开(公告)号：US07074731B2

公开(公告)日：2006-07-11

申请号：US10440429

申请日：2003-05-16

Applicant: Yasuo Ohama ,  Takayuki Togawa

Inventor： Yasuo Ohama ,  Takayuki Togawa

IPC: C03C3/06

CPC classification number: C03C1/026 ,  C03B19/095 ,  C03B19/1095 ,  C03B2201/21 ,  C03C2201/21 ,  C30B15/10 ,  Y10T117/10

Abstract: It is an object of the present invention to provide a hydrogen-doped silica powder that is useful in the formation of a quartz glass crucible that is capable of pulling a silicon single crystal without causing a state having dislocations in the silicon single crystal due to peeling of quartz glass segment. It is a further object of the invention to provide a quartz glass crucible for use in pulling a silicon single crystal whose inner surface is formed by use of the hydrogen-doped silica powder and a producing method of the silica powder.In order to achieve the objects above, the present invention provides a hydrogen-doped silica powder for use in producing a quartz glass crucible for use in pulling a silicon single crystal, wherein the silica powder is made of synthetic silica powder, natural silica powder or a mixture thereof, with a hydrogen concentration being in the range of 1×1017 to 5×1019 molecules/cm3, and a producing method thereof, and a quartz glass crucible for pulling a silicon single crystal whose inner surface is made of the silica powders.

Abstract translation: 本发明的目的是提供一种可用于形成石英玻璃坩埚的氢掺杂二氧化硅粉末，其能够拉伸硅单晶而不引起由于剥离而在硅单晶中具有位错的状态 的石英玻璃片段。 本发明的另一个目的是提供一种用于拉动其内表面使用掺氢二氧化硅粉末形成的硅单晶的石英玻璃坩埚和二氧化硅粉末的制造方法。 为了实现上述目的，本发明提供一种用于制造用于拉制硅单晶的石英玻璃坩埚的氢掺杂二氧化硅粉末，其中二氧化硅粉末由合成二氧化硅粉末，天然二氧化硅粉末或 其浓度在1×10 17至5×10 19分子/ cm 3的范围内的混合物及其制备方法， 以及用于拉出其内表面由二氧化硅粉末制成的单晶硅的石英玻璃坩埚。

公开(公告)号：US20060081008A1

公开(公告)日：2006-04-20

申请号：US11248185

申请日：2005-10-13

Applicant: Hiroyasu Hirata ,  Yuji Fukasawa ,  Masanobu Ezaki

Inventor： Hiroyasu Hirata ,  Yuji Fukasawa ,  Masanobu Ezaki

IPC: C03B32/00 ,  C03C17/00 ,  C03C23/00 ,  C03C15/00 ,  C03C19/00 ,  C03C21/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B25/025 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: The invention provides a method for efficiently manufacturing a synthetic silica glass substrate for photomasks excellent in light stability and capable of being applied to ArF-Wet photolithography with maximum birefringence of 1.4 nm/cm or less, homogeneity of diffractive index of 2×10−5 or less and an average content of hydrogen atoms of 1018 to 1019, comprising the steps of: forming a mask-plain substrate by slicing a block of a synthetic silica glass; heating each sheet of the mask-plain substrate at a temperature of 1100° C. or more; slowly cooling the substrate at a cooling rate of 0.01 to 0.8° C./min; and placing the substrate in a hydrogen gas atmosphere at least at the latter half of the slow cooling step or after the slow cooling step.

Abstract translation: 本发明提供了一种有效地制造光稳定性优异的光掩模用合成石英玻璃基板的方法，能够适用于1.4nm / cm以下的双折射最大双折射的ArF-Wet光刻法，2×10 -6的衍射指数的均匀性， 5或更低，氢原子的平均含量为10 18至10 19，包括以下步骤：通过切割块来形成掩模 - 平版底物 的合成石英玻璃; 在1100℃以上的温度下对每片掩模基片进行加热; 以0.01〜0.8℃/ min的冷却速度缓慢冷却基板; 以及至少在缓慢冷却步骤的后半段或缓慢冷却步骤之后将衬底放置在氢气气氛中。

公开(公告)号：US07002298B2

公开(公告)日：2006-02-21

申请号：US10775218

申请日：2004-02-11

Applicant: Kensuke Fukushima

Inventor： Kensuke Fukushima

IPC: H01J17/16

CPC classification number: H01J61/86 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/32 ,  H01J61/302 ,  H01J61/822

Abstract: An ultra-high pressure discharge lamp in which the disadvantage of the reduction of the illuminance maintenance factor due to formation of blackening and milky opacification in the discharge vessel and the disadvantage of formation of cracks in the discharge vessel is eliminated by the discharge vessel being made of a silica glass that contains 0.1 ppm by weight to 290 ppm by weight hydrogen. Further advantages are obtained by the silica glass having a content of OH radicals that is at most 1 ppm by weight and a content of aluminum in a range of 2 ppm by weight to 30 ppm by weight.

Abstract translation: 通过放电容器被消除，由于在放电容器中形成黑化和乳白色混浊而导致的照度维持系数降低的缺点和放电容器中形成裂缝的缺点的超高压放电灯 的含有0.1重量ppm至290重量ppm氢的二氧化硅玻璃。 通过具有至多1重量ppm的OH基含量的二氧化硅玻璃和在2重量ppm至30重量ppm的范围内的铝的含量可获得其它优点。

公开(公告)号：US20050187092A1

公开(公告)日：2005-08-25

申请号：US11064341

申请日：2005-02-22

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C21/00 ,  C03C23/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真（在633nm处），介于约-1.0和1.0nm / cm之间，并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平， SUP>分子/ cm 3，优选小于约2.0×10 17分子/ cm 3。

公开(公告)号：US06904772B2

公开(公告)日：2005-06-14

申请号：US10023291

申请日：2001-12-14

Applicant: George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Dale R. Powers

Inventor： George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Dale R. Powers

IPC: C03B37/014 ,  C03C13/04 ,  C03C25/60 ,  G02B6/02 ,  C03B37/027

CPC classification number: C03C25/607 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/01486 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.

Abstract translation: 具有低水峰的光波导纤维以及光波导纤维预制件以及制造出低水峰值和/或低氢老化衰减光波导纤维的光波导纤维预制棒的方法，包括通过OVD制造的光波导纤维和预制棒。 纤维可以是耐氢性的，即表现出低氢老化衰减。 公开了一种低水峰，耐氢光波导纤维，其在约1383nm的波长处表现出光衰减，其小于或等于在约1310nm的波长处显示的光衰减。

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

Applicant: Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC: C03C306

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06828262B2

公开(公告)日：2004-12-07

申请号：US10186123

申请日：2002-06-28

Applicant: Nicholas F. Borrelli ,  George B. Hares ,  Charlene M. Smith

Inventor： Nicholas F. Borrelli ,  George B. Hares ,  Charlene M. Smith

IPC: C03C400

CPC classification number: C03B19/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/31 ,  C03C3/064 ,  C03C3/091 ,  C03C4/0085 ,  C03C4/04 ,  C03C4/085 ,  C03C17/3411 ,  C03C23/00 ,  C03C23/002 ,  C03C2201/21 ,  C03C2203/54 ,  G02B6/02114 ,  G02B6/12007 ,  G02B6/124 ,  G02B6/125 ,  G02B2006/12147

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate and germanosilicate bulk glasses to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract translation: 本发明一般涉及UV（紫外线）感光体玻璃，特别涉及间歇可熔碱性硼硅酸铝硅酸盐和锗硅酸盐玻璃。 本发明的感光体玻璃显示对低于300nm的UV波长的光敏性。碱性硼硅酸铝硅酸盐和锗硅酸盐体玻璃对低于300nm的UV波长的光敏性提供了在玻璃中制备折射率图案。 在300nm以下的辐射源下，这种激光器在玻璃中形成折射率图案。 本发明的感光光学折射率图案形成块状玻璃允许在玻璃中形成图案并利用这种图案化玻璃的装置。