公开(公告)号：US20190035512A1

公开(公告)日：2019-01-31

申请号：US16050541

申请日：2018-07-31

申请人： Carl Zeiss SMT GmbH

发明人： Christian Grasse ,  Martin Hermann ,  Stephan Six ,  Joern WEBER ,  Ralf Winter ,  Oliver Dier ,  Vitaliy Shklover ,  Kerstin Hild ,  Sebastian Strobel

IPC分类号： G21K1/06 ,  G02B5/08 ,  G03F7/20 ,  G02B1/10

摘要： Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 μs and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.

公开(公告)号：US10156785B2

公开(公告)日：2018-12-18

申请号：US15177226

申请日：2016-06-08

申请人： Applied Materials Israel Ltd.

发明人： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

IPC分类号： G03F1/86 ,  H01J37/28 ,  G03F1/62 ,  G21K1/06

摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.

公开(公告)号：US10153061B2

公开(公告)日：2018-12-11

申请号：US15025174

申请日：2014-07-24

申请人： KONICA MINOLTA, INC.

发明人： Mitsuru Yokoyama

IPC分类号： A61B6/00 ,  G21K1/06 ,  G02B5/18 ,  G01N23/04 ,  G01N23/20

摘要： An X-ray metal grating structure of the present invention has a grating region in which a plurality of first structural portions are periodically provided, wherein an air gap is formed between each of the plurality of first structural portions and a second structural portion as a remaining part of the grating region other than the plurality of first structural portions. Thus, the X-ray metal grating structure of the present invention is formed as a grating structure having high flatness. A production method therefor comprises a step of forming the air gap between the first structural portion and the second structural portion. Thus, the production method makes it possible to produce an X-ray metal grating structure having high flatness. The present invention further provides an X-ray metal grating unit and an X-ray imaging device each comprising the X-ray metal grating structure.

公开(公告)号：US10141081B2

公开(公告)日：2018-11-27

申请号：US15027787

申请日：2014-09-26

申请人： SIEMENS HEALTHCARE GMBH

发明人： Oliver Preusche

IPC分类号： G21K1/00 ,  G21K1/06 ,  G02B5/18 ,  A61B6/00

摘要： A phase grating for a phase contrast X-ray imaging device has a transverse surface which is to be aligned substantially transversely with respect to a radiation incidence direction and which is spanned by an x-axis and a y-axis perpendicular thereto. The phase grating is formed from a multiplicity of grating webs composed of a basic material, which are arranged alternately with optically denser interspaces. The grating webs subdivide the transverse surface into grating strips which are in each case elongated in the y-direction and which are lined up parallel alongside one another in the x-direction. The phase grating has in each grating strip along a z-axis, which is perpendicular to the transverse plane, a homogeneous total thickness of the basic material which always differs between adjacent grating strips. At least one grating web extends within the transverse surface over a plurality of grating strips.

公开(公告)号：US20180329308A1

公开(公告)日：2018-11-15

申请号：US16042453

申请日：2018-07-23

申请人： Carl Zeiss SMT GmbH

发明人： Christoph Nottbohm

IPC分类号： G03F7/20 ,  G03F1/24 ,  G21K1/06 ,  G02B5/08

CPC分类号： G03F7/70316 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70216 ,  G03F7/70966 ,  G21K1/062 ,  G21K2201/067

摘要： A reflective optical element for the extreme ultraviolet (EUV) wavelength range having a multi-layer system extending over an area on a substrate. The system includes layers (54, 55′) made of at least two different materials with different real parts of the refractive index in the EUV arranged alternately. A layer of one of the two materials forms a stack with the layer or layers arranged between this layer and the nearest layer of the same material with increasing distance from the substrate. In at least one stack (53′), the material of the layer (55′) with the lower real part of the refractive index and/or the material of the layer (54) with the larger real part of the refractive index is a combination (551, 552) made of at least two substances.

公开(公告)号：US10102938B2

公开(公告)日：2018-10-16

申请号：US15953774

申请日：2018-04-16

申请人： Gigaphoton Inc.

发明人： Takayuki Yabu ,  Tamotsu Abe ,  Kenichi Miyao ,  Tooru Abe

IPC分类号： G21K1/06 ,  H05G2/00 ,  G03F7/00 ,  G03F7/20

摘要： An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.

公开(公告)号：US10099068B2

公开(公告)日：2018-10-16

申请号：US15414634

申请日：2017-01-25

申请人： CONVERGENT R.N.R LTD

发明人： Zeev Burshtein ,  Zeev Harel ,  Aharon Bar-David ,  Donald M. Korn

IPC分类号： G01N23/04 ,  A61N5/10 ,  A61B6/00 ,  A61B6/06 ,  G21K1/04 ,  G21K1/06

摘要： An X-ray system comprises: a source of an X-ray diverging beam having a central imaging portion and a peripheral treatment-portion; a lens transforming the peripheral treatment portion of the X-ray beam into a converging beam directed to a target; a shutter located between the X-ray source and the target in the central imaging portion of the X-ray radiation; and a detector of imaging radiation after interaction with the target and to provide imaging information of the target.

公开(公告)号：US20180259846A1

公开(公告)日：2018-09-13

申请号：US15974661

申请日：2018-05-08

申请人： ASML NETHERLANDS B.V.

发明人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC分类号： G03F1/64 ,  G03B27/54 ,  G02B5/20 ,  G02B27/00 ,  C01B32/20 ,  G03F7/20 ,  H01B1/24 ,  H01B1/04 ,  G21K1/06 ,  G03F1/24 ,  G02B5/08 ,  B82Y40/00 ,  B82Y10/00 ,  G03F1/62

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

公开(公告)号：US20180187294A1

公开(公告)日：2018-07-05

申请号：US15738929

申请日：2016-06-17

申请人： TOHOKU UNIVERSITY

发明人： Hidemi KATO ,  Wataru YASHIRO

IPC分类号： C22F1/00 ,  G01N23/20 ,  G21K1/06 ,  C22C45/00 ,  C22C28/00 ,  C22C5/04 ,  C22C30/02 ,  C22F1/14 ,  C22F1/16

CPC分类号： C22F1/002 ,  C22C5/04 ,  C22C28/00 ,  C22C30/02 ,  C22C45/00 ,  C22C45/003 ,  C22F1/00 ,  C22F1/10 ,  C22F1/14 ,  C22F1/16 ,  G01N23/20 ,  G21K1/06

摘要： A process for producing a molded material that can form metallic glass material in a state of lower viscosity, and can manufacture a small structure of several 10 μm or less in a comparatively short time while precisely controlling shape thereof, by the process comprising a heating step of heating supercooled state metallic glass material or a solid metallic glass material at a temperature increase rate of 0.5 K/s to a temperature at or higher than a temperature at which a crystallization process for a supercooled liquid of the metallic glass material begins, and a molding step of transfer molding the metallic glass material until the crystallization process for the supercooled liquid of the metallic glass material has been completed. In addition, the purpose is also to provide the molded material that has been formed by this process, a wavefront control element, and a diffraction grating.

公开(公告)号：US20180164690A1

公开(公告)日：2018-06-14

申请号：US15810735

申请日：2017-11-13

申请人： Carl Zeiss SMT GmbH

发明人： Johannes Ruoff ,  Josef Rapp

IPC分类号： G03F7/20 ,  G02B17/06 ,  G02B5/00 ,  G02B5/08 ,  G02B13/22 ,  G02B26/02 ,  G21K1/02 ,  G21K1/06

CPC分类号： G03F7/702 ,  G02B5/005 ,  G02B5/0891 ,  G02B13/22 ,  G02B17/0652 ,  G02B17/0663 ,  G02B26/02 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/7025 ,  G21K1/02 ,  G21K1/067

摘要： An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.