Laminated film for head applications
    101.
    发明申请
    Laminated film for head applications 有权
    用于头部应用的层压膜

    公开(公告)号:US20090009907A1

    公开(公告)日:2009-01-08

    申请号:US11825034

    申请日:2007-07-03

    CPC classification number: G11B5/3116 G11B5/1278

    Abstract: A laminated main pole layer is disclosed in which a non-AFC scheme is used to break the magnetic coupling between adjacent high moment layers and reduce remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. An amorphous material layer with a thickness of 3 to 20 Angstroms and made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, or Si is inserted between adjacent high moment stacks. The laminated structure also includes an alignment layer below each high moment layer within each stack. In one embodiment, a Ru coupling layer is inserted between two high moment layers in each stack to introduce an AFC scheme. An uppermost Ru layer is used as a CMP stop layer. A post annealing process may be employed to further reduce the anisotropy field (Hk).

    Abstract translation: 公开了一种层叠主极层,其中使用非AFC方案来破坏相邻的高力矩层之间的磁耦合,并且在保持高磁矩的同时降低硬轴方向的剩磁,并实现Hch,Hce和 Hk。 由Hf,Zr,Ta,Al,Mg,Zn或Si中的一种或多种的氧化物,氮化物或氧氮化物形成的厚度为3〜20埃的无定形材料层插入相邻的高强度叠层之间。 层叠结构还包括在每个堆叠内的每个高力矩层下面的对准层。 在一个实施例中,Ru耦合层插入每个堆叠中的两个高矩层之间以引入AFC方案。 使用最上层的Ru层作为CMP停止层。 可以采用后退火工艺来进一步降低各向异性场(Hk)。

    Method for making a perpendicular magnetic recording write head with a self aligned stitched write shield
    102.
    发明申请
    Method for making a perpendicular magnetic recording write head with a self aligned stitched write shield 失效
    一种具有自对准缝合写屏蔽的垂直磁记录写头的方法

    公开(公告)号:US20080094759A1

    公开(公告)日:2008-04-24

    申请号:US12001429

    申请日:2007-12-11

    Abstract: A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.

    Abstract translation: 一种制造具有单线圈或双线圈层的垂直磁记录(PMR)头和缝合在主写屏蔽上的小写保护层的方法。 拼接屏蔽允许主写柱产生垂直写入场,其尖锐的垂直梯度在写入极的两侧减小,从而消除相邻的轨迹擦除。 从制造的角度来看,使用单一光刻工艺,修剪掩模和CMP研磨工艺来限定和形成主极和缝合屏蔽物,使得主屏蔽可以缝合到自对准的主极和缝合屏蔽 。

    Electroplated magnetic film for read-write applications
    103.
    发明申请
    Electroplated magnetic film for read-write applications 有权
    用于读写应用的电镀磁膜

    公开(公告)号:US20070261967A1

    公开(公告)日:2007-11-15

    申请号:US11431261

    申请日:2006-05-10

    CPC classification number: C25D3/562 C25D5/18 G11B5/3163 H01F41/26

    Abstract: A process is described for the fabrication, through electrodeposition, of FexCoyNiz (x=60-71, y=25-35, z=0-5) films that have, in their as-deposited form, a saturation magnetization of at least 24 kG and a coercivity of less than 0.3 Oe. A key feature is the addition of aryl sulfinates to the plating bath along with a suitable seed layer.

    Abstract translation: 描述了通过电沉积制造Fe x Sb x Ni x Z x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x x(x = 35,z = 0-5)具有其沉积形式的至少24kG的饱和磁化强度和小于0.3Oe的矫顽力的膜。 一个关键的特征是在适当的种子层的同时向镀浴中加入芳基亚硫酸盐。

    ABS through aggressive stitching
    105.
    发明授权
    ABS through aggressive stitching 失效
    ABS通过积极的拼接

    公开(公告)号:US07251102B2

    公开(公告)日:2007-07-31

    申请号:US10782496

    申请日:2004-02-19

    Abstract: Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electro-plated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.

    Abstract translation: 积极(即紧公差)缝合为磁性写入头提供了几个优点,但是在极修整期间以一些损失为代价。 通过用一层电镀材料代替在修整期间用于保护缝合极的氧化铝填料层已经克服了这个问题。 由于与沉积电镀方法相关的优越的台阶覆盖,因此可以进行极细修剪,而不会在缝合极被修剪时引入应力。

    Robust protective layer for MTJ devices
    106.
    发明申请
    Robust protective layer for MTJ devices 审中-公开
    坚固的MTJ设备保护层

    公开(公告)号:US20070080381A1

    公开(公告)日:2007-04-12

    申请号:US11248965

    申请日:2005-10-12

    Abstract: MTJ devices commonly degrade when subjected to the heat treatments required by subsequent further processing. This problem has been overcome by protecting the MTJ's sidewalls with a two layer laminate. The first layer is laid down under oxygen-free conditions, no attempt being made to replace any oxygen that is lost during the deposition. This is followed immediately by the deposition of the second layer (usually, but not mandatorily, of the same material as the first layer) in the presence of some oxygen.

    Abstract translation: 当经过后续进一步处理所需的热处理时,MTJ装置通常会降解。 通过用双层层压板保护MTJ的侧壁已经克服了这个问题。 第一层被放置在无氧条件下,没有试图取代沉积过程中损失的任何氧气。 这是在存在一些氧气的情况下立即通过沉积第二层(通常但不强制地与第一层相同的材料)沉积。

    Method to make abutted junction GMR head without lead shunting
    107.
    发明授权
    Method to make abutted junction GMR head without lead shunting 失效
    在没有引线分流的情况下制造对接接头GMR头的方法

    公开(公告)号:US07196876B2

    公开(公告)日:2007-03-27

    申请号:US10236359

    申请日:2002-09-06

    Abstract: A method for forming an abutted junction GMR bottom spin valve sensor in which the free layer has a maximum effective length due to the elimination or minimization of bias layer and conducting lead layer overspreading onto the sensor element and the consequent reduction of current shunting. The overspreading is eliminated by forming a thin dielectric layer on the upper surface of the sensor element. When the biasing and conducting leads are formed on the abutted junction, they overspread onto this layer and the overspread can be removed by an ion-milling process during which the dielectric layer protects the sensor.

    Abstract translation: 用于形成邻接结GMR底部自旋阀传感器的方法,其中自由层由于偏置层的消除或最小化而导致最大有效长度,并且导致引线层过度传播到传感器元件上,从而减少了电流分流。 通过在传感器元件的上表面上形成薄的电介质层来消除超扩展。 当偏置和导电引线形成在邻接接头上时,它们被扩展到该层上,并且可以通过离子铣削工艺去除超扩展,其中电介质层保护传感器。

    Low DC coil resistance planar writer
    109.
    发明授权
    Low DC coil resistance planar writer 失效
    低直流线圈电阻平面写入器

    公开(公告)号:US07126789B2

    公开(公告)日:2006-10-24

    申请号:US10633133

    申请日:2003-08-01

    CPC classification number: G11B5/3103 Y10T29/49032

    Abstract: Present processes used for planarizing a cavity filled with a coil and hard baked photoresist require that a significant amount of the thickness of the coils be removed. This increases the DC resistance of the coil. In the present invention, CMP is terminated as soon as the coils are exposed, allowing their full thickness to be retained and resulting in minimum DC resistance. Application of this process to the manufacture of a planar magnetic write head is described.

    Abstract translation: 用于平坦化填充有线圈和硬烘烤光致抗蚀剂的空腔的现有方法需要去除大量的线圈厚度。 这增加了线圈的直流电阻。 在本发明中,一旦线圈暴露,CMP就终止,允许其保持其全部厚度并且导致最小的直流电阻。 描述了该方法在平面磁写头的制造中的应用。

Patent Agency Ranking