公开(公告)号：US07092072B2

公开(公告)日：2006-08-15

申请号：US10882684

申请日：2004-07-02

申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70558

摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

公开(公告)号：US07041989B1

公开(公告)日：2006-05-09

申请号：US10970733

申请日：2004-10-22

申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Le Kluse

发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Le Kluse

IPC分类号： G03B27/58 ,  G03B27/04 ,  G03B27/62 ,  H01L21/66

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

公开(公告)号：US08269179B2

公开(公告)日：2012-09-18

申请号：US12318291

申请日：2008-12-24

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B27/52 ,  G03B27/72 ,  G01J3/10

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07959310B2

公开(公告)日：2011-06-14

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G02B5/08 ,  G02B7/182 ,  G06K7/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US20110126406A1

公开(公告)日：2011-06-02

申请号：US13020399

申请日：2011-02-03

申请人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

发明人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

IPC分类号： H01B13/00

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

公开(公告)号：US20110090495A1

公开(公告)日：2011-04-21

申请号：US12935786

申请日：2009-03-27

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

IPC分类号： G01N21/17

CPC分类号： G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

摘要翻译： 光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。 该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。 光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。 偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

公开(公告)号：US20110013157A1

公开(公告)日：2011-01-20

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/32 ,  H01F7/02

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US07714306B2

公开(公告)日：2010-05-11

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US07485881B2

公开(公告)日：2009-02-03

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54 ,  G21G5/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US20080315134A1

公开(公告)日：2008-12-25

申请号：US11855849

申请日：2007-09-14

申请人： Dirk Heinrich EHM ,  Hermann Bieg ,  Hans-Juergen Mann ,  Stephan Muellender ,  Johannes Hubertus Josephina Moors ,  Bastian Theodor Wolschrijn

发明人： Dirk Heinrich EHM ,  Hermann Bieg ,  Hans-Juergen Mann ,  Stephan Muellender ,  Johannes Hubertus Josephina Moors ,  Bastian Theodor Wolschrijn

IPC分类号： A61N5/06 ,  G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/7085 ,  G03F7/70941

摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.

摘要翻译： 一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品 元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。 光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。