Method for fabricating semiconductor device
    101.
    发明申请
    Method for fabricating semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US20070293029A1

    公开(公告)日:2007-12-20

    申请号:US11594856

    申请日:2006-11-09

    IPC分类号: H01L21/8234

    摘要: The method for fabricating the semiconductor device includes the steps of: forming an insulating film 20, a conductive film 22 and an insulating film 24 over a semiconductor substrate 10 having a first to a third region; removing an insulating film 24, the conductive film 22 and an insulating film 20 formed in the second region and the third region; forming an insulating film 38 in the second region and the third region; removing the insulating film 24 in the first region and the insulating film 38 in the third region; forming an insulating film 44 in the third region; after a conductive film 52 has been formed, patterning the conductive films 22, 52 in the first region to form a gate electrode 58; and patterning the conductive film 52 to form gate electrodes 62 in the second region and the third region while removing the conductive film 52 over the gate electrode 58.

    摘要翻译: 制造半导体器件的方法包括以下步骤:在具有第一至第三区域的半导体衬底10上形成绝缘膜20,导电膜22和绝缘膜24; 去除绝缘膜24,导电膜22和形成在第二区域和第三区域中的绝缘膜20; 在第二区域和第三区域中形成绝缘膜38; 去除第一区域中的绝缘膜24和第三区域中的绝缘膜38; 在第三区域中形成绝缘膜44; 在形成导电膜52之后,在第一区域中图案化导电膜22,52以形成栅电极58; 以及图案化导电膜52以在第二区域和第三区域中形成栅极电极62,同时在栅极电极58上移除导电膜52。

    PROCESSING METHOD, PROCESSING APPARATUS, CRYSTALLIZATION METHOD AND CRYSTALLIZATION APPARATUS USING PULSED LASER BEAM
    102.
    发明申请
    PROCESSING METHOD, PROCESSING APPARATUS, CRYSTALLIZATION METHOD AND CRYSTALLIZATION APPARATUS USING PULSED LASER BEAM 失效
    处理方法,处理装置,结晶方法和使用脉冲激光束的结晶装置

    公开(公告)号:US20070141815A1

    公开(公告)日:2007-06-21

    申请号:US11679724

    申请日:2007-02-27

    IPC分类号: H01L21/268

    摘要: In a laser processing method and a laser processing apparatus which irradiate a processing target body with a laser beam pulse-oscillated from a laser beam source, a processing state is monitored by a photodetector, and the laser beam source is again subjected to oscillation control on the moment when erroneous laser irradiation is detected, thereby performing laser processing. Further, in a laser crystallization method and a laser crystallization apparatus using a pulse-oscillated excimer laser, a homogenizing optical system, an optical element and a half mirror are arranged in an optical path, light from the half mirror is detected by a photodetector, and a light intensity insufficient irradiation position is again irradiated with a laser beam to perform crystallization when the detection value does not fall within a range of a predetermined specified value.

    摘要翻译: 在激光加工方法和激光加工装置中,激光加工装置利用从激光束源脉冲振荡的激光束照射加工对象体,利用光电检测器对加工状态进行监视,再次对激光束源进行振荡控制 检测到错误的激光照射的时刻,进行激光加工。 此外,在激光结晶方法和使用脉冲振荡准分子激光器的激光结晶装置中,均匀化光学系统,光学元件和半反射镜被布置在光路中,来自半反射镜的光由光电检测器检测, 并且当检测值不在预定指定值的范围内时,用激光束再次照射光强度不足的照射位置,以进行结晶。

    Control apparatus for vehicle
    108.
    发明申请
    Control apparatus for vehicle 有权
    车辆控制装置

    公开(公告)号:US20060089234A1

    公开(公告)日:2006-04-27

    申请号:US11223968

    申请日:2005-09-13

    申请人: Hiroyuki Ogawa

    发明人: Hiroyuki Ogawa

    IPC分类号: B60K41/04

    摘要: An ECT_ECU executes a program including the step of identifying the drive mode, the step of determining whether the engine is in an idling state or not, the step of detecting the speed of an automatic transmission when not in an idling state, the step of detecting an accelerator press-down rate of change, the step of detecting vehicle speed, the step of calculating a target acceleration rate of change of the vehicle based on the drive mode, speed of the automatic transmission, accelerator press-down rate of change, and vehicle speed, and the step of calculating the target acceleration by integrating the calculated target acceleration rate of change with respect to time.

    摘要翻译: ECT_ECU执行包括识别驱动模式的步骤,确定发动机是否处于怠速状态的步骤的程序,在不处于怠速状态时检测自动变速器的速度的步骤,检测步骤 加速器按压变化率,车速检测步骤,基于驾驶模式,自动变速器的速度,加速器按压变化率等计算车辆的目标加速度变化的步骤,以及 以及通过将计算出的目标加速变化率相对于时间积分来计算目标加速度的步骤。

    Electrostatic discharge performance of a silicon structure and efficient use of area with electrostatic discharge protective device under the pad approach and adjustment of via configuration thereto to control drain junction resistance
    109.
    发明授权
    Electrostatic discharge performance of a silicon structure and efficient use of area with electrostatic discharge protective device under the pad approach and adjustment of via configuration thereto to control drain junction resistance 有权
    硅结构的静电放电性能,有效利用垫下方的静电放电保护装置的面积,调整通孔配置,以控制漏极结电阻

    公开(公告)号:US07019366B1

    公开(公告)日:2006-03-28

    申请号:US10758173

    申请日:2004-01-14

    IPC分类号: H01L23/62

    CPC分类号: H01L27/0251

    摘要: More efficient use of silicon area is achieved by incorporating an electrostatic discharge protective (ESDP) device beneath a pad area of a semiconductor structure. The pad area includes a substrate having a first metal layer above it. A second metal layer is above the first metal layer. The ESDP device resides in the substrate below the first metal layer. A layer of dielectric separates the first and second metal layers. A via within the dielectric layer electrically couples the first and second metal layers. A via connects to the ESDP component. Subsequent metal layers can be arranged between the first and second metal layers. The Ohmic value of the resistance component of the ESDP device can be set during fabrication by fixing a number of individual via components, arranged electrically in parallel, by fixing the cross sectional area of the via components, and/or by fixing the length of the via components.

    摘要翻译: 通过在半导体结构的焊盘区域的下方并入静电放电保护(ESDP)器件来实现硅面积的更有效的使用。 焊盘区域包括在其上方具有第一金属层的基板。 第二金属层位于第一金属层之上。 ESDP设备位于第一金属层下方的基板中。 电介质层分离第一和第二金属层。 电介质层内的通孔电耦合第一和第二金属层。 A通道连接到ESDP组件。 随后的金属层可以布置在第一和第二金属层之间。 ESDP装置的电阻部件的欧姆值可以在制造期间通过固定多个单独的通孔部件,通过固定通孔部件的横截面面积和/或固定长度 通过组件。

    Method for observing object by projection, method for detecting microorganisms and projection detecting system
    110.
    发明授权
    Method for observing object by projection, method for detecting microorganisms and projection detecting system 有权
    通过投影观察物体的方法,微生物检测方法和投影检测系统

    公开(公告)号:US07016523B1

    公开(公告)日:2006-03-21

    申请号:US09556824

    申请日:2000-04-21

    申请人: Hiroyuki Ogawa

    发明人: Hiroyuki Ogawa

    IPC分类号: G06K9/00

    摘要: Fast microbial detection is accomplished by identifying quantities of microorganisms accurately and easily.A cell 5 is placed on a loading portion. A coherent laser beam source 2 emits laser beam to a cell 5. A CCD area image sensor 4 is an array of light sensitive detectors. An image sensor 4 receives light projection image that passes through a cell 5 illuminated by the beam from a laser beam source 2, generating projection image signals on each light sensitive detectors. The projection image data is fed into a computer and analyzed.

    摘要翻译: 快速的微生物检测是通过准确,容易地识别微生物量来实现的。 电池5放置在装载部分上。 相干激光束源2向单元5发射激光束。 CCD区域图像传感器4是光敏检测器的阵列。 图像传感器4接收通过来自激光束源2的光束照射的单元5的光投影图像,在每个感光检测器上产生投影图像信号。 将投影图像数据馈送到计算机中并进行分析。